JPS58217901A - 透過型光学部材 - Google Patents

透過型光学部材

Info

Publication number
JPS58217901A
JPS58217901A JP57100789A JP10078982A JPS58217901A JP S58217901 A JPS58217901 A JP S58217901A JP 57100789 A JP57100789 A JP 57100789A JP 10078982 A JP10078982 A JP 10078982A JP S58217901 A JPS58217901 A JP S58217901A
Authority
JP
Japan
Prior art keywords
substrate
deposited
film
stress
internal stress
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57100789A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6218881B2 (enExample
Inventor
Norio Yamamura
山村　則夫
Masaaki Kaneko
正昭 金子
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp, Nippon Kogaku KK filed Critical Nikon Corp
Priority to JP57100789A priority Critical patent/JPS58217901A/ja
Publication of JPS58217901A publication Critical patent/JPS58217901A/ja
Publication of JPS6218881B2 publication Critical patent/JPS6218881B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
    • G02B5/0825—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only
    • G02B5/0833—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only comprising inorganic materials only

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Optical Filters (AREA)
  • Surface Treatment Of Optical Elements (AREA)
JP57100789A 1982-06-14 1982-06-14 透過型光学部材 Granted JPS58217901A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57100789A JPS58217901A (ja) 1982-06-14 1982-06-14 透過型光学部材

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57100789A JPS58217901A (ja) 1982-06-14 1982-06-14 透過型光学部材

Publications (2)

Publication Number Publication Date
JPS58217901A true JPS58217901A (ja) 1983-12-19
JPS6218881B2 JPS6218881B2 (enExample) 1987-04-24

Family

ID=14283201

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57100789A Granted JPS58217901A (ja) 1982-06-14 1982-06-14 透過型光学部材

Country Status (1)

Country Link
JP (1) JPS58217901A (enExample)

Cited By (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60189704A (ja) * 1984-03-09 1985-09-27 Univ Kyoto 周期性を有する酸化物多層膜
JPS61296306A (ja) * 1985-06-25 1986-12-27 Horiba Ltd 赤外線多層膜干渉フイルタ
DE3543812A1 (de) * 1985-12-12 1987-06-19 Leybold Heraeus Gmbh & Co Kg Verfahren zum herstellen eines teildurchlaessigen optischen koerpers und durch das verfahren hergestellter optischer koerper
JPS6349704A (ja) * 1986-08-20 1988-03-02 Fujitsu Ltd ダイクロイツクミラ−
JPS6382401A (ja) * 1986-09-27 1988-04-13 Dainippon Printing Co Ltd フレネルレンズシ−トの製造方法
JPS63182603A (ja) * 1987-01-24 1988-07-27 Matsushita Electric Works Ltd 紫外線カツトフイルタ
JPS6457207A (en) * 1987-08-28 1989-03-03 Hitachi Ltd Waveguide type optical device
JPH05127018A (ja) * 1991-11-02 1993-05-25 Koshin Kogaku:Kk 被蒸着基板の歪み除去方法及びフイルター
US5523862A (en) * 1993-04-23 1996-06-04 Ushiodenki Kabushiki Kaisha Parabolic dielectric multilayer reflector
US5786117A (en) * 1990-05-22 1998-07-28 Canon Kabushiki Kaisha Medium and related method and apparatus for recording and reproducing information in cells using multiple interference
EP0929827A4 (en) * 1996-09-30 2000-11-22 Corning Inc REINFORCED OPTICAL GLASS FILTER
JP2004303562A (ja) * 2003-03-31 2004-10-28 Dainippon Printing Co Ltd 有機エレクトロルミネッセント素子用基板
JP2004317834A (ja) * 2003-04-17 2004-11-11 Mitsubishi Electric Corp レーザ透過部材及びその製造方法
GB2393188B (en) * 2002-09-25 2006-01-04 Fujitsu Ltd Optical device
WO2006006363A1 (ja) * 2004-07-09 2006-01-19 Daishinku Corporation 光学フィルタおよび光学フィルタの製造方法
US7411729B2 (en) 2004-08-12 2008-08-12 Olympus Corporation Optical filter, method of manufacturing optical filter, optical system, and imaging apparatus
JP2008192280A (ja) * 2007-01-10 2008-08-21 Epson Toyocom Corp 開口フィルタ及び波長板機能付開口フィルタ
WO2009016658A1 (en) * 2007-07-27 2009-02-05 Galileo Avionica S.P.A. Preliminary controlled pre-deformation treatment for the production of mirrors
JP2009139885A (ja) * 2007-12-11 2009-06-25 Sony Corp ペリクルミラー及び撮像装置
CN103233200A (zh) * 2013-03-28 2013-08-07 同济大学 一种355nm高阈值高反膜的制备方法
JP2015068886A (ja) * 2013-09-27 2015-04-13 セイコーエプソン株式会社 干渉フィルター、光学フィルターデバイス、光学モジュール、及び電子機器
US9128279B2 (en) 2010-08-25 2015-09-08 Seiko Epson Corporation Wavelength-tunable interference filter, optical module, and optical analysis apparatus
US9557554B2 (en) 2010-08-25 2017-01-31 Seiko Epson Corporation Wavelength-variable interference filter, optical module, and optical analysis device
JP2017506363A (ja) * 2014-01-30 2017-03-02 カール・ツァイス・エスエムティー・ゲーエムベーハー ミラー素子を製造する方法
JP2022528601A (ja) * 2019-04-15 2022-06-15 ルーマス リミテッド 光ガイド光学素子を製造する方法
JP2022128715A (ja) * 2021-02-24 2022-09-05 東海光学株式会社 光学構造体の接合構造

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4760011B2 (ja) * 2004-12-24 2011-08-31 セイコーエプソン株式会社 光学部材
JP2009198756A (ja) * 2008-02-21 2009-09-03 Oki Semiconductor Co Ltd 光送受信モジュール及びこれに用いる波長分岐フィルタ

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5785972A (en) * 1980-11-17 1982-05-28 Anelva Corp Thin film former

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5785972A (en) * 1980-11-17 1982-05-28 Anelva Corp Thin film former

Cited By (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60189704A (ja) * 1984-03-09 1985-09-27 Univ Kyoto 周期性を有する酸化物多層膜
JPS61296306A (ja) * 1985-06-25 1986-12-27 Horiba Ltd 赤外線多層膜干渉フイルタ
DE3543812A1 (de) * 1985-12-12 1987-06-19 Leybold Heraeus Gmbh & Co Kg Verfahren zum herstellen eines teildurchlaessigen optischen koerpers und durch das verfahren hergestellter optischer koerper
JPS6349704A (ja) * 1986-08-20 1988-03-02 Fujitsu Ltd ダイクロイツクミラ−
JPS6382401A (ja) * 1986-09-27 1988-04-13 Dainippon Printing Co Ltd フレネルレンズシ−トの製造方法
JPS63182603A (ja) * 1987-01-24 1988-07-27 Matsushita Electric Works Ltd 紫外線カツトフイルタ
JPS6457207A (en) * 1987-08-28 1989-03-03 Hitachi Ltd Waveguide type optical device
US5786117A (en) * 1990-05-22 1998-07-28 Canon Kabushiki Kaisha Medium and related method and apparatus for recording and reproducing information in cells using multiple interference
JPH05127018A (ja) * 1991-11-02 1993-05-25 Koshin Kogaku:Kk 被蒸着基板の歪み除去方法及びフイルター
US5523862A (en) * 1993-04-23 1996-06-04 Ushiodenki Kabushiki Kaisha Parabolic dielectric multilayer reflector
EP0929827A4 (en) * 1996-09-30 2000-11-22 Corning Inc REINFORCED OPTICAL GLASS FILTER
GB2393188B (en) * 2002-09-25 2006-01-04 Fujitsu Ltd Optical device
JP2004303562A (ja) * 2003-03-31 2004-10-28 Dainippon Printing Co Ltd 有機エレクトロルミネッセント素子用基板
JP2004317834A (ja) * 2003-04-17 2004-11-11 Mitsubishi Electric Corp レーザ透過部材及びその製造方法
WO2006006363A1 (ja) * 2004-07-09 2006-01-19 Daishinku Corporation 光学フィルタおよび光学フィルタの製造方法
JPWO2006006363A1 (ja) * 2004-07-09 2008-04-24 株式会社大真空 光学フィルタおよび光学フィルタの製造方法
JP4692486B2 (ja) * 2004-07-09 2011-06-01 株式会社大真空 光学フィルタおよび光学フィルタの製造方法
US7411729B2 (en) 2004-08-12 2008-08-12 Olympus Corporation Optical filter, method of manufacturing optical filter, optical system, and imaging apparatus
JP2010153025A (ja) * 2007-01-10 2010-07-08 Epson Toyocom Corp 開口フィルタ及び波長板機能付開口フィルタ
JP2008192280A (ja) * 2007-01-10 2008-08-21 Epson Toyocom Corp 開口フィルタ及び波長板機能付開口フィルタ
WO2009016658A1 (en) * 2007-07-27 2009-02-05 Galileo Avionica S.P.A. Preliminary controlled pre-deformation treatment for the production of mirrors
JP2009139885A (ja) * 2007-12-11 2009-06-25 Sony Corp ペリクルミラー及び撮像装置
US9128279B2 (en) 2010-08-25 2015-09-08 Seiko Epson Corporation Wavelength-tunable interference filter, optical module, and optical analysis apparatus
US9557554B2 (en) 2010-08-25 2017-01-31 Seiko Epson Corporation Wavelength-variable interference filter, optical module, and optical analysis device
CN103233200A (zh) * 2013-03-28 2013-08-07 同济大学 一种355nm高阈值高反膜的制备方法
JP2015068886A (ja) * 2013-09-27 2015-04-13 セイコーエプソン株式会社 干渉フィルター、光学フィルターデバイス、光学モジュール、及び電子機器
JP2017506363A (ja) * 2014-01-30 2017-03-02 カール・ツァイス・エスエムティー・ゲーエムベーハー ミラー素子を製造する方法
US10423073B2 (en) 2014-01-30 2019-09-24 Carl Zeiss Smt Gmbh Method for producing a mirror element
JP2022528601A (ja) * 2019-04-15 2022-06-15 ルーマス リミテッド 光ガイド光学素子を製造する方法
JP2024124541A (ja) * 2019-04-15 2024-09-12 ルーマス リミテッド 光ガイド光学素子を製造する方法
US12135445B2 (en) 2019-04-15 2024-11-05 Lumus Ltd. Method of fabricating a light-guide optical element
JP2022128715A (ja) * 2021-02-24 2022-09-05 東海光学株式会社 光学構造体の接合構造

Also Published As

Publication number Publication date
JPS6218881B2 (enExample) 1987-04-24

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