JPS58217901A - Laminate vapor-deposited on both sides - Google Patents

Laminate vapor-deposited on both sides

Info

Publication number
JPS58217901A
JPS58217901A JP57100789A JP10078982A JPS58217901A JP S58217901 A JPS58217901 A JP S58217901A JP 57100789 A JP57100789 A JP 57100789A JP 10078982 A JP10078982 A JP 10078982A JP S58217901 A JPS58217901 A JP S58217901A
Authority
JP
Japan
Prior art keywords
film
vapor deposited
vapor
glass
deposited film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57100789A
Other versions
JPS6218881B2 (en
Inventor
Masaaki Kaneko
Norio Yamamura
Original Assignee
Nippon Kogaku Kk <Nikon>
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kogaku Kk <Nikon> filed Critical Nippon Kogaku Kk <Nikon>
Priority to JP57100789A priority Critical patent/JPS6218881B2/ja
Publication of JPS58217901A publication Critical patent/JPS58217901A/en
Publication of JPS6218881B2 publication Critical patent/JPS6218881B2/ja
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/08Mirrors
    • G02B5/0816Multilayer mirrors, i.e. having two or more reflecting layers
    • G02B5/0825Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only
    • G02B5/0833Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only comprising inorganic materials only

Abstract

PURPOSE:To easily obtain both side vapor deposition laminates free from strain without requiring any pretreatment or the like, by correcting strain produced in a base due to the first vapor deposited film formed on one side through formation of the second vapor deposited film on the other side. CONSTITUTION:For example, in forming a thin high-reflectance mirror material, a layer H of high refractive index material, such as TiO2, and a layer L of low index material, such as SiO2 are alternately laminated on the first free 31a of the base glass 31 to form a high-reflectance mirror 32, and MgF2 is vapor deposited onto the second face 31b of the glass 31 so as to form an MgF2 vapor deposited film 22, 23 as the second vapor deposited film also used as prevention of reflection having a thickenss thick enough to erase the strain of the glass 31 due to the formation of the mirror 32. Said example is the case of the base strained by the tensile stress of the first film, but when the first film generates compressive stress, a vapor deposition film exhibiting compressive stress, such as SiO2, may be used as the second vapor deposition film.
JP57100789A 1982-06-14 1982-06-14 Expired JPS6218881B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57100789A JPS6218881B2 (en) 1982-06-14 1982-06-14

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57100789A JPS6218881B2 (en) 1982-06-14 1982-06-14

Publications (2)

Publication Number Publication Date
JPS58217901A true JPS58217901A (en) 1983-12-19
JPS6218881B2 JPS6218881B2 (en) 1987-04-24

Family

ID=14283201

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57100789A Expired JPS6218881B2 (en) 1982-06-14 1982-06-14

Country Status (1)

Country Link
JP (1) JPS6218881B2 (en)

Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60189704A (en) * 1984-03-09 1985-09-27 Univ Kyoto Multi-layered oxide film having periodicity
JPS61296306A (en) * 1985-06-25 1986-12-27 Horiba Ltd Infrared interference filter made of multi-layered film
DE3543812A1 (en) * 1985-12-12 1987-06-19 Leybold Heraeus Gmbh & Co Kg A process for producing a partially transparent optical body and produced by the process of optical body
JPS6349704A (en) * 1986-08-20 1988-03-02 Fujitsu Ltd Dichroic mirror
JPS6382401A (en) * 1986-09-27 1988-04-13 Dainippon Printing Co Ltd Production of fresnel lens sheet
JPS63182603A (en) * 1987-01-24 1988-07-27 Matsushita Electric Works Ltd Ultraviolet cut filter
JPS6457207A (en) * 1987-08-28 1989-03-03 Hitachi Ltd Waveguide type optical device
JPH05127018A (en) * 1991-11-02 1993-05-25 Koshin Kogaku:Kk Strain removing method for substrate subjected to vapor deposition and filter
US5523862A (en) * 1993-04-23 1996-06-04 Ushiodenki Kabushiki Kaisha Parabolic dielectric multilayer reflector
US5786117A (en) * 1990-05-22 1998-07-28 Canon Kabushiki Kaisha Medium and related method and apparatus for recording and reproducing information in cells using multiple interference
EP0929827A1 (en) * 1996-09-30 1999-07-21 Corning Incorporated Strengthened optical glass filter
GB2393188B (en) * 2002-09-25 2006-01-04 Fujitsu Ltd Optical device
WO2006006363A1 (en) * 2004-07-09 2006-01-19 Daishinku Corporation Optical filter and method of manufacturing optical filter
US7411729B2 (en) 2004-08-12 2008-08-12 Olympus Corporation Optical filter, method of manufacturing optical filter, optical system, and imaging apparatus
JP2008192280A (en) * 2007-01-10 2008-08-21 Epson Toyocom Corp Aperture filter and aperture filter with wavelength plate function
WO2009016658A1 (en) * 2007-07-27 2009-02-05 Galileo Avionica S.P.A. Preliminary controlled pre-deformation treatment for the production of mirrors
JP2009139885A (en) * 2007-12-11 2009-06-25 Sony Corp Pellicle mirror and imaging apparatus
CN103233200A (en) * 2013-03-28 2013-08-07 同济大学 355 nm high threshold high reflection film preparation method
JP2015068886A (en) * 2013-09-27 2015-04-13 セイコーエプソン株式会社 Interference filter, optical filter device, optical module, and electronic equipment
US9128279B2 (en) 2010-08-25 2015-09-08 Seiko Epson Corporation Wavelength-tunable interference filter, optical module, and optical analysis apparatus
US9557554B2 (en) 2010-08-25 2017-01-31 Seiko Epson Corporation Wavelength-variable interference filter, optical module, and optical analysis device
JP2017506363A (en) * 2014-01-30 2017-03-02 カール・ツァイス・エスエムティー・ゲーエムベーハー Method for manufacturing a mirror element

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4760011B2 (en) * 2004-12-24 2011-08-31 セイコーエプソン株式会社 Optical member
JP2009198756A (en) * 2008-02-21 2009-09-03 Oki Semiconductor Co Ltd Optical transceiving module, and wavelength branching filter used therefor

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5785972A (en) * 1980-11-17 1982-05-28 Anelva Corp Thin film former

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5785972A (en) * 1980-11-17 1982-05-28 Anelva Corp Thin film former

Cited By (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60189704A (en) * 1984-03-09 1985-09-27 Univ Kyoto Multi-layered oxide film having periodicity
JPS61296306A (en) * 1985-06-25 1986-12-27 Horiba Ltd Infrared interference filter made of multi-layered film
DE3543812A1 (en) * 1985-12-12 1987-06-19 Leybold Heraeus Gmbh & Co Kg A process for producing a partially transparent optical body and produced by the process of optical body
JPS6349704A (en) * 1986-08-20 1988-03-02 Fujitsu Ltd Dichroic mirror
JPS6382401A (en) * 1986-09-27 1988-04-13 Dainippon Printing Co Ltd Production of fresnel lens sheet
JPS63182603A (en) * 1987-01-24 1988-07-27 Matsushita Electric Works Ltd Ultraviolet cut filter
JPS6457207A (en) * 1987-08-28 1989-03-03 Hitachi Ltd Waveguide type optical device
US5786117A (en) * 1990-05-22 1998-07-28 Canon Kabushiki Kaisha Medium and related method and apparatus for recording and reproducing information in cells using multiple interference
JPH05127018A (en) * 1991-11-02 1993-05-25 Koshin Kogaku:Kk Strain removing method for substrate subjected to vapor deposition and filter
US5523862A (en) * 1993-04-23 1996-06-04 Ushiodenki Kabushiki Kaisha Parabolic dielectric multilayer reflector
EP0929827A1 (en) * 1996-09-30 1999-07-21 Corning Incorporated Strengthened optical glass filter
EP0929827A4 (en) * 1996-09-30 2000-11-22 Corning Inc Strengthened optical glass filter
GB2393188B (en) * 2002-09-25 2006-01-04 Fujitsu Ltd Optical device
JP4692486B2 (en) * 2004-07-09 2011-06-01 株式会社大真空 Optical filter and optical filter manufacturing method
JPWO2006006363A1 (en) * 2004-07-09 2008-04-24 株式会社大真空 Optical filter and optical filter manufacturing method
WO2006006363A1 (en) * 2004-07-09 2006-01-19 Daishinku Corporation Optical filter and method of manufacturing optical filter
US7411729B2 (en) 2004-08-12 2008-08-12 Olympus Corporation Optical filter, method of manufacturing optical filter, optical system, and imaging apparatus
JP2008192280A (en) * 2007-01-10 2008-08-21 Epson Toyocom Corp Aperture filter and aperture filter with wavelength plate function
JP2010153025A (en) * 2007-01-10 2010-07-08 Epson Toyocom Corp Aperture filter, and aperture filter with wavelength plate function
WO2009016658A1 (en) * 2007-07-27 2009-02-05 Galileo Avionica S.P.A. Preliminary controlled pre-deformation treatment for the production of mirrors
JP2009139885A (en) * 2007-12-11 2009-06-25 Sony Corp Pellicle mirror and imaging apparatus
US9128279B2 (en) 2010-08-25 2015-09-08 Seiko Epson Corporation Wavelength-tunable interference filter, optical module, and optical analysis apparatus
US9557554B2 (en) 2010-08-25 2017-01-31 Seiko Epson Corporation Wavelength-variable interference filter, optical module, and optical analysis device
CN103233200A (en) * 2013-03-28 2013-08-07 同济大学 355 nm high threshold high reflection film preparation method
JP2015068886A (en) * 2013-09-27 2015-04-13 セイコーエプソン株式会社 Interference filter, optical filter device, optical module, and electronic equipment
JP2017506363A (en) * 2014-01-30 2017-03-02 カール・ツァイス・エスエムティー・ゲーエムベーハー Method for manufacturing a mirror element
US10423073B2 (en) 2014-01-30 2019-09-24 Carl Zeiss Smt Gmbh Method for producing a mirror element

Also Published As

Publication number Publication date
JPS6218881B2 (en) 1987-04-24

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