JPS6218881B2 - - Google Patents

Info

Publication number
JPS6218881B2
JPS6218881B2 JP57100789A JP10078982A JPS6218881B2 JP S6218881 B2 JPS6218881 B2 JP S6218881B2 JP 57100789 A JP57100789 A JP 57100789A JP 10078982 A JP10078982 A JP 10078982A JP S6218881 B2 JPS6218881 B2 JP S6218881B2
Authority
JP
Japan
Prior art keywords
substrate
film
deposited film
stress
deposited
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57100789A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58217901A (ja
Inventor
Norio Yamamura
Masaaki Kaneko
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kogaku KK filed Critical Nippon Kogaku KK
Priority to JP57100789A priority Critical patent/JPS58217901A/ja
Publication of JPS58217901A publication Critical patent/JPS58217901A/ja
Publication of JPS6218881B2 publication Critical patent/JPS6218881B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
    • G02B5/0825—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only
    • G02B5/0833—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only comprising inorganic materials only

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Optical Filters (AREA)
  • Surface Treatment Of Optical Elements (AREA)
JP57100789A 1982-06-14 1982-06-14 透過型光学部材 Granted JPS58217901A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57100789A JPS58217901A (ja) 1982-06-14 1982-06-14 透過型光学部材

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57100789A JPS58217901A (ja) 1982-06-14 1982-06-14 透過型光学部材

Publications (2)

Publication Number Publication Date
JPS58217901A JPS58217901A (ja) 1983-12-19
JPS6218881B2 true JPS6218881B2 (enExample) 1987-04-24

Family

ID=14283201

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57100789A Granted JPS58217901A (ja) 1982-06-14 1982-06-14 透過型光学部材

Country Status (1)

Country Link
JP (1) JPS58217901A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006178261A (ja) * 2004-12-24 2006-07-06 Seiko Epson Corp 誘電体多層膜フィルタ及び光学部材
JP2009198756A (ja) * 2008-02-21 2009-09-03 Oki Semiconductor Co Ltd 光送受信モジュール及びこれに用いる波長分岐フィルタ

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0672298B2 (ja) * 1984-03-09 1994-09-14 京都大学 周期性を有する酸化物多層膜
JPS61296306A (ja) * 1985-06-25 1986-12-27 Horiba Ltd 赤外線多層膜干渉フイルタ
DE3543812A1 (de) * 1985-12-12 1987-06-19 Leybold Heraeus Gmbh & Co Kg Verfahren zum herstellen eines teildurchlaessigen optischen koerpers und durch das verfahren hergestellter optischer koerper
JPS6349704A (ja) * 1986-08-20 1988-03-02 Fujitsu Ltd ダイクロイツクミラ−
JPH0795121B2 (ja) * 1986-09-27 1995-10-11 大日本印刷株式会社 フレネルレンズシートの製造方法
JPS63182603A (ja) * 1987-01-24 1988-07-27 Matsushita Electric Works Ltd 紫外線カツトフイルタ
JPS6457207A (en) * 1987-08-28 1989-03-03 Hitachi Ltd Waveguide type optical device
EP0458604B1 (en) * 1990-05-22 1997-08-27 Canon Kabushiki Kaisha Method and apparatus for recording and reproducing information in cells using multiple interference
JP3034668B2 (ja) * 1991-11-02 2000-04-17 有限会社光伸光学 干渉フィルター
JPH06308307A (ja) * 1993-04-23 1994-11-04 Ushio Inc 反射鏡
WO1998014801A1 (en) * 1996-09-30 1998-04-09 Corning Incorporated Strengthened optical glass filter
JP2004117747A (ja) * 2002-09-25 2004-04-15 Fujitsu Ltd 光装置
JP2004303562A (ja) * 2003-03-31 2004-10-28 Dainippon Printing Co Ltd 有機エレクトロルミネッセント素子用基板
JP4074217B2 (ja) * 2003-04-17 2008-04-09 三菱電機株式会社 レーザ加工機のレンズ保護部材及びその製造方法
JP4692486B2 (ja) * 2004-07-09 2011-06-01 株式会社大真空 光学フィルタおよび光学フィルタの製造方法
US7411729B2 (en) 2004-08-12 2008-08-12 Olympus Corporation Optical filter, method of manufacturing optical filter, optical system, and imaging apparatus
JP2008192280A (ja) * 2007-01-10 2008-08-21 Epson Toyocom Corp 開口フィルタ及び波長板機能付開口フィルタ
US20100246036A1 (en) * 2007-07-27 2010-09-30 Lagana Paolo Preliminary Controlled Pre-Deformation Treatment for the Production of Mirrors
JP2009139885A (ja) * 2007-12-11 2009-06-25 Sony Corp ペリクルミラー及び撮像装置
JP5779852B2 (ja) 2010-08-25 2015-09-16 セイコーエプソン株式会社 波長可変干渉フィルター、光モジュール、および光分析装置
JP5707780B2 (ja) 2010-08-25 2015-04-30 セイコーエプソン株式会社 波長可変干渉フィルター、光モジュール、及び光分析装置
CN103233200A (zh) * 2013-03-28 2013-08-07 同济大学 一种355nm高阈值高反膜的制备方法
JP6264810B2 (ja) * 2013-09-27 2018-01-24 セイコーエプソン株式会社 干渉フィルター、光学フィルターデバイス、光学モジュール、及び電子機器
DE102014201622A1 (de) 2014-01-30 2015-08-20 Carl Zeiss Smt Gmbh Verfahren zum Herstellen eines Spiegelelements
CN113661359A (zh) 2019-04-15 2021-11-16 鲁姆斯有限公司 制造光导光学元件的方法
JP2022128715A (ja) * 2021-02-24 2022-09-05 東海光学株式会社 光学構造体の接合構造

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5785972A (en) * 1980-11-17 1982-05-28 Anelva Corp Thin film former

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006178261A (ja) * 2004-12-24 2006-07-06 Seiko Epson Corp 誘電体多層膜フィルタ及び光学部材
JP2009198756A (ja) * 2008-02-21 2009-09-03 Oki Semiconductor Co Ltd 光送受信モジュール及びこれに用いる波長分岐フィルタ

Also Published As

Publication number Publication date
JPS58217901A (ja) 1983-12-19

Similar Documents

Publication Publication Date Title
JPS6218881B2 (enExample)
US3853386A (en) Low-loss, highly reflective multilayer coating system formed of alternate highly refractive and low-refractive oxide layers
US5993898A (en) Fabrication method and structure for multilayer optical anti-reflection coating, and optical component and optical system using multilayer optical anti-reflection coating
EP1597614B1 (en) High precision mirror, and a method of making it
WO2018110499A1 (ja) 誘電体多層膜付きガラス板及びその製造方法
US20070211344A1 (en) Half mirror
JPH03109503A (ja) プラスチック製光学部品の反射防止膜とその形成方法
CN112764135A (zh) 一种极低残余反射的窄带减反射膜
US3578848A (en) Method of making an interference filter
JP2007171735A (ja) 広帯域反射防止膜
CN100580485C (zh) 光学滤波器和光学滤波器的制造方法
GB2138966A (en) An arrangement of thin layers
JPS6051081B2 (ja) 非球面反射防止膜
CN112095083A (zh) 一种低面形光学薄膜的制备方法
JPS58223101A (ja) 多面鏡の製造方法
CN117418196A (zh) 一种大角度范围入射红外高反射率的膜系设计及制备方法
JPH0985874A (ja) 光学薄膜およびその製造方法
US20050271883A1 (en) Light-transmitting element and method for making same
US6256147B1 (en) Compensating layer to reduce wavefront errors in coatings on mirrors for optical systems
JPH07280999A (ja) Ｘ線多層膜反射鏡
WO2022124030A1 (ja) 光学フィルタ
US6940650B2 (en) Diffraction optical element and transfer mold therefor
CN115685406B (zh) 应用在偏振阵列式波导片的分光膜镀膜片及其镀膜工艺
JPH01286476A (ja) 狭い波長帯域で平坦な分光特性を有するレーザーミラー
JP2782559B2 (ja) 装飾品用代用品