JPS58196971A - サンドブラスト用マスクの製造方法 - Google Patents

サンドブラスト用マスクの製造方法

Info

Publication number
JPS58196971A
JPS58196971A JP57079184A JP7918482A JPS58196971A JP S58196971 A JPS58196971 A JP S58196971A JP 57079184 A JP57079184 A JP 57079184A JP 7918482 A JP7918482 A JP 7918482A JP S58196971 A JPS58196971 A JP S58196971A
Authority
JP
Japan
Prior art keywords
film
mask
thickness
protective film
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57079184A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0260468B2 (enExample
Inventor
Shohei Nakamura
中村　庄平
Yoshimasa Tsuji
辻　義正
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Kasei Corp
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Asahi Kasei Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd, Asahi Kasei Kogyo KK filed Critical Asahi Chemical Industry Co Ltd
Priority to JP57079184A priority Critical patent/JPS58196971A/ja
Priority to US06/493,909 priority patent/US4456680A/en
Priority to JP21347283A priority patent/JPS60104938A/ja
Publication of JPS58196971A publication Critical patent/JPS58196971A/ja
Priority to US06/601,825 priority patent/US4587186A/en
Publication of JPH0260468B2 publication Critical patent/JPH0260468B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C1/00—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods
    • B24C1/04—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods for treating only selected parts of a surface, e.g. for carving stone or glass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0044—Mechanical working of the substrate, e.g. drilling or punching
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0079—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the method of application or removal of the mask

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Laminated Bodies (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP57079184A 1982-05-13 1982-05-13 サンドブラスト用マスクの製造方法 Granted JPS58196971A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP57079184A JPS58196971A (ja) 1982-05-13 1982-05-13 サンドブラスト用マスクの製造方法
US06/493,909 US4456680A (en) 1982-05-13 1983-05-12 Process for preparing a mask for sandblasting
JP21347283A JPS60104938A (ja) 1982-05-13 1983-11-14 固体表面加工用マスク転写材
US06/601,825 US4587186A (en) 1982-05-13 1984-04-19 Mask element for selective sandblasting and a method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57079184A JPS58196971A (ja) 1982-05-13 1982-05-13 サンドブラスト用マスクの製造方法

Publications (2)

Publication Number Publication Date
JPS58196971A true JPS58196971A (ja) 1983-11-16
JPH0260468B2 JPH0260468B2 (enExample) 1990-12-17

Family

ID=13682886

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57079184A Granted JPS58196971A (ja) 1982-05-13 1982-05-13 サンドブラスト用マスクの製造方法

Country Status (2)

Country Link
US (1) US4456680A (enExample)
JP (1) JPS58196971A (enExample)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0269754A (ja) * 1988-09-06 1990-03-08 Aisero Kagaku Kk 彫食刻マスク用感光性積層フイルム
WO1992007303A1 (fr) * 1990-10-22 1992-04-30 Aicello Chemical Co., Ltd. Procede de gravure avec masque a image, et film stratifie photosensible pour ledit masque
US5347766A (en) * 1991-07-18 1994-09-20 Mitsui Toatsu Chemicals, Inc. Method for polishing surface of transparent substrate layer of color filter unit
US5518857A (en) * 1991-03-28 1996-05-21 Aicello Chemical Co., Ltd. Image-carrying mask photo-sensitive laminate film for use in making an image carry mask
US5629132A (en) * 1991-03-28 1997-05-13 Aicello Chemical Co., Ltd. Method for engraving and/or etching with image-carrying mask and photo-sensitive laminate film for use in making the mask
CN102321892A (zh) * 2011-09-09 2012-01-18 重庆大学 一种复合型活性阴极的制备方法

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4727013A (en) * 1985-09-18 1988-02-23 Vacuum Applied Coatings Corp. Method for creating a design in relief in a hard smooth substrate and apparatus for use in the method
US4652513A (en) * 1985-09-18 1987-03-24 Vacuum Applied Coatings Corp. Method for creating a design in relief in a hard smooth substrate and apparatus for use in the method
US4764449A (en) * 1985-11-01 1988-08-16 The Chromaline Corporation Adherent sandblast photoresist laminate
US4834833A (en) * 1987-12-02 1989-05-30 Palmer Alan K Mask for etching, and method of making mask and using same
FR2627433B1 (fr) * 1988-02-19 1990-09-21 Longeron Alain Procede de confection de masques et caches resistant a la gravure profonde par jet de particules abrasives
WO1992021065A1 (en) * 1991-04-19 1992-11-26 Birkholm James G Process for preparing electromagnetic radiation imaged material
US5270147A (en) * 1991-07-12 1993-12-14 Agfa-Gevaert N.V. Stripping film material
US5989689A (en) * 1991-12-11 1999-11-23 The Chromaline Corporation Sandblast mask laminate with blastable pressure sensitive adhesive
US5672225A (en) * 1995-07-27 1997-09-30 Cowan; John R. Method for engraving three dimensional images
US7074358B2 (en) * 2001-12-13 2006-07-11 Alexander Sergeievich Gybin Polymer casting method and apparatus
US7964335B2 (en) 2002-01-30 2011-06-21 Ikonics Corporation Ink receptive photosensitive laminate
US20040062896A1 (en) * 2002-09-26 2004-04-01 Picone Terrence F. Fractionally-releasable bonding layer for use in photo-sensitive laminate films
GB0307198D0 (en) * 2003-03-28 2003-04-30 3M Innovative Properties Co Rigid air ducting for respirator hoods and helmets
CN102686057A (zh) * 2011-03-18 2012-09-19 深圳富泰宏精密工业有限公司 电子装置壳体及其制作方法
CN102352517B (zh) * 2011-10-21 2014-04-30 重庆大学 一种高活性阴极及其制备方法
CN116072518B (zh) * 2022-12-30 2025-08-08 天通凯巨科技有限公司 一种超薄钽酸锂晶片的保护膜及脱膜方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2678510A (en) * 1952-03-20 1954-05-18 Printing Die Company Method of making relief printing plate matrices and article
CA1099435A (en) * 1971-04-01 1981-04-14 Gwendyline Y. Y. T. Chen Photosensitive block copolymer composition and elements
CH612729A5 (en) * 1976-07-12 1979-08-15 Sulzer Ag Device for controlling the speed of a crankshaft of an internal combustion engine, especially a diesel engine
JPS5420719A (en) * 1977-07-15 1979-02-16 Fuji Photo Film Co Ltd Photosensitive material for image formation and image formation method
DE2758575A1 (de) * 1977-12-29 1979-07-05 Hoechst Ag Lichtempfindliches schichtuebertragungsmaterial
GB2047909B (en) * 1978-12-25 1982-10-06 Karpov V D Dry film photoresist
JPS5719416A (en) * 1980-07-09 1982-02-01 Mitsubishi Heavy Ind Ltd Vessel for improving deep poor ground

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0269754A (ja) * 1988-09-06 1990-03-08 Aisero Kagaku Kk 彫食刻マスク用感光性積層フイルム
WO1992007303A1 (fr) * 1990-10-22 1992-04-30 Aicello Chemical Co., Ltd. Procede de gravure avec masque a image, et film stratifie photosensible pour ledit masque
US5427890A (en) * 1990-10-22 1995-06-27 Aicello Chemical Co., Ltd. Photo-sensitive laminate film for use in making the mask comprising a supporting sheet, an image mask protection layer which is water insoluble and a water soluble image mask forming composition
US5518857A (en) * 1991-03-28 1996-05-21 Aicello Chemical Co., Ltd. Image-carrying mask photo-sensitive laminate film for use in making an image carry mask
US5629132A (en) * 1991-03-28 1997-05-13 Aicello Chemical Co., Ltd. Method for engraving and/or etching with image-carrying mask and photo-sensitive laminate film for use in making the mask
US5347766A (en) * 1991-07-18 1994-09-20 Mitsui Toatsu Chemicals, Inc. Method for polishing surface of transparent substrate layer of color filter unit
CN102321892A (zh) * 2011-09-09 2012-01-18 重庆大学 一种复合型活性阴极的制备方法

Also Published As

Publication number Publication date
JPH0260468B2 (enExample) 1990-12-17
US4456680A (en) 1984-06-26

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