JPS58125834A - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法Info
- Publication number
- JPS58125834A JPS58125834A JP57008431A JP843182A JPS58125834A JP S58125834 A JPS58125834 A JP S58125834A JP 57008431 A JP57008431 A JP 57008431A JP 843182 A JP843182 A JP 843182A JP S58125834 A JPS58125834 A JP S58125834A
- Authority
- JP
- Japan
- Prior art keywords
- film
- wiring
- heat treatment
- cracks
- silica film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H10P14/60—
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Formation Of Insulating Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57008431A JPS58125834A (ja) | 1982-01-22 | 1982-01-22 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57008431A JPS58125834A (ja) | 1982-01-22 | 1982-01-22 | 半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58125834A true JPS58125834A (ja) | 1983-07-27 |
| JPS6342408B2 JPS6342408B2 (cg-RX-API-DMAC10.html) | 1988-08-23 |
Family
ID=11692930
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57008431A Granted JPS58125834A (ja) | 1982-01-22 | 1982-01-22 | 半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58125834A (cg-RX-API-DMAC10.html) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6230335A (ja) * | 1985-07-31 | 1987-02-09 | Fujitsu Ltd | 半導体装置の製造方法 |
-
1982
- 1982-01-22 JP JP57008431A patent/JPS58125834A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6230335A (ja) * | 1985-07-31 | 1987-02-09 | Fujitsu Ltd | 半導体装置の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6342408B2 (cg-RX-API-DMAC10.html) | 1988-08-23 |
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