JPS5799753A - Manufacture of semiconductor integrated circuit - Google Patents
Manufacture of semiconductor integrated circuitInfo
- Publication number
- JPS5799753A JPS5799753A JP17529280A JP17529280A JPS5799753A JP S5799753 A JPS5799753 A JP S5799753A JP 17529280 A JP17529280 A JP 17529280A JP 17529280 A JP17529280 A JP 17529280A JP S5799753 A JPS5799753 A JP S5799753A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- sio2
- poly
- grooves
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 10
- 229910052681 coesite Inorganic materials 0.000 abstract 5
- 229910052906 cristobalite Inorganic materials 0.000 abstract 5
- 239000000377 silicon dioxide Substances 0.000 abstract 5
- 235000012239 silicon dioxide Nutrition 0.000 abstract 5
- 229910052682 stishovite Inorganic materials 0.000 abstract 5
- 229910052905 tridymite Inorganic materials 0.000 abstract 5
- 229910021420 polycrystalline silicon Inorganic materials 0.000 abstract 4
- 238000005530 etching Methods 0.000 abstract 3
- 239000000758 substrate Substances 0.000 abstract 3
- 101000617721 Homo sapiens Pregnancy-specific beta-1-glycoprotein 6 Proteins 0.000 abstract 2
- 102100022026 Pregnancy-specific beta-1-glycoprotein 6 Human genes 0.000 abstract 2
- 229910052581 Si3N4 Inorganic materials 0.000 abstract 2
- 238000000926 separation method Methods 0.000 abstract 2
- 239000012535 impurity Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 238000001020 plasma etching Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/763—Polycrystalline semiconductor regions
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Element Separation (AREA)
- Weting (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17529280A JPS5799753A (en) | 1980-12-12 | 1980-12-12 | Manufacture of semiconductor integrated circuit |
DE19813129558 DE3129558A1 (de) | 1980-07-28 | 1981-07-27 | Verfahren zur herstellung einer integrierten halbleiterschaltung |
US06/507,557 US4507849A (en) | 1980-07-28 | 1983-06-24 | Method of making isolation grooves by over-filling with polycrystalline silicon having a difference in impurity concentration inside the grooves followed by etching off the overfill based upon this difference |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17529280A JPS5799753A (en) | 1980-12-12 | 1980-12-12 | Manufacture of semiconductor integrated circuit |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5799753A true JPS5799753A (en) | 1982-06-21 |
JPS628024B2 JPS628024B2 (enrdf_load_stackoverflow) | 1987-02-20 |
Family
ID=15993558
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17529280A Granted JPS5799753A (en) | 1980-07-28 | 1980-12-12 | Manufacture of semiconductor integrated circuit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5799753A (enrdf_load_stackoverflow) |
-
1980
- 1980-12-12 JP JP17529280A patent/JPS5799753A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS628024B2 (enrdf_load_stackoverflow) | 1987-02-20 |
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