JPS5793572A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS5793572A
JPS5793572A JP55170408A JP17040880A JPS5793572A JP S5793572 A JPS5793572 A JP S5793572A JP 55170408 A JP55170408 A JP 55170408A JP 17040880 A JP17040880 A JP 17040880A JP S5793572 A JPS5793572 A JP S5793572A
Authority
JP
Japan
Prior art keywords
film
oxidized
silicon
layer
diffused
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP55170408A
Other languages
English (en)
Japanese (ja)
Other versions
JPH022298B2 (enrdf_load_stackoverflow
Inventor
Takeo Fujii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP55170408A priority Critical patent/JPS5793572A/ja
Publication of JPS5793572A publication Critical patent/JPS5793572A/ja
Publication of JPH022298B2 publication Critical patent/JPH022298B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B12/00—Dynamic random access memory [DRAM] devices
    • H10B12/01—Manufacture or treatment

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Semiconductor Memories (AREA)
JP55170408A 1980-12-03 1980-12-03 Manufacture of semiconductor device Granted JPS5793572A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55170408A JPS5793572A (en) 1980-12-03 1980-12-03 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55170408A JPS5793572A (en) 1980-12-03 1980-12-03 Manufacture of semiconductor device

Publications (2)

Publication Number Publication Date
JPS5793572A true JPS5793572A (en) 1982-06-10
JPH022298B2 JPH022298B2 (enrdf_load_stackoverflow) 1990-01-17

Family

ID=15904362

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55170408A Granted JPS5793572A (en) 1980-12-03 1980-12-03 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5793572A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59113659A (ja) * 1982-12-20 1984-06-30 Toshiba Corp Ｍｏｓダイナミツクメモリ
JPS6185857A (ja) * 1984-10-04 1986-05-01 Oki Electric Ind Co Ltd 半導体メモリ素子の製造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5534500A (en) * 1978-08-30 1980-03-11 Siemens Ag Integrated mos semiconductor memory and method of manufacturing same
JPS5588368A (en) * 1978-12-26 1980-07-04 Chiyou Lsi Gijutsu Kenkyu Kumiai Preparation of semiconductor device
JPS5591158A (en) * 1978-12-26 1980-07-10 Ibm Method of fabricating semiconductor device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5534500A (en) * 1978-08-30 1980-03-11 Siemens Ag Integrated mos semiconductor memory and method of manufacturing same
JPS5588368A (en) * 1978-12-26 1980-07-04 Chiyou Lsi Gijutsu Kenkyu Kumiai Preparation of semiconductor device
JPS5591158A (en) * 1978-12-26 1980-07-10 Ibm Method of fabricating semiconductor device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59113659A (ja) * 1982-12-20 1984-06-30 Toshiba Corp Ｍｏｓダイナミツクメモリ
JPS6185857A (ja) * 1984-10-04 1986-05-01 Oki Electric Ind Co Ltd 半導体メモリ素子の製造方法

Also Published As

Publication number Publication date
JPH022298B2 (enrdf_load_stackoverflow) 1990-01-17

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