JPS5556660A - Manufacture of charge-coupled device - Google Patents
Manufacture of charge-coupled deviceInfo
- Publication number
- JPS5556660A JPS5556660A JP13018078A JP13018078A JPS5556660A JP S5556660 A JPS5556660 A JP S5556660A JP 13018078 A JP13018078 A JP 13018078A JP 13018078 A JP13018078 A JP 13018078A JP S5556660 A JPS5556660 A JP S5556660A
- Authority
- JP
- Japan
- Prior art keywords
- transfer electrodes
- breaking
- film
- charge
- manufacture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/823406—Combination of charge coupled devices, i.e. CCD, or BBD
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Solid State Image Pick-Up Elements (AREA)
Abstract
PURPOSE:To prevent the formation of difference in level and the breaking of wire by forming second transfer electrodes on a second flat insulating film. CONSTITUTION:A group of recesses having a depth of about 3,000Angstrom and width of about 10mu is provided in an n-type Si substrate 10 and covered by a heat oxidized film 12. First transfer electrodes 13 made of poly Si of about 3,000Angstrom are provided to burry the recesses. After a heat oxidized film 14 is formed on all over the surface, second transfer electrodes 15 made of Al and the like of about 3,000Angstrom are made on the film 14. If necessary, a CVD oxidized layer with the thickness of about 1,000Angstrom is stacked on it. In this constitution, the breaking of wire is not resulted in the second transfer electrodes and also the breaking of the conductors on the protective surface is not resulted.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13018078A JPS5556660A (en) | 1978-10-20 | 1978-10-20 | Manufacture of charge-coupled device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13018078A JPS5556660A (en) | 1978-10-20 | 1978-10-20 | Manufacture of charge-coupled device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5556660A true JPS5556660A (en) | 1980-04-25 |
JPS6115592B2 JPS6115592B2 (en) | 1986-04-24 |
Family
ID=15027959
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13018078A Granted JPS5556660A (en) | 1978-10-20 | 1978-10-20 | Manufacture of charge-coupled device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5556660A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5173756A (en) * | 1990-01-05 | 1992-12-22 | International Business Machines Corporation | Trench charge-coupled device |
US5334868A (en) * | 1991-02-08 | 1994-08-02 | International Business Machines Corporation | Sidewall charge-coupled device with trench isolation |
US8448716B2 (en) | 2007-10-19 | 2013-05-28 | Hideo Yoshida | Fire extinguisher gas ejector |
-
1978
- 1978-10-20 JP JP13018078A patent/JPS5556660A/en active Granted
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5173756A (en) * | 1990-01-05 | 1992-12-22 | International Business Machines Corporation | Trench charge-coupled device |
US5334868A (en) * | 1991-02-08 | 1994-08-02 | International Business Machines Corporation | Sidewall charge-coupled device with trench isolation |
US8448716B2 (en) | 2007-10-19 | 2013-05-28 | Hideo Yoshida | Fire extinguisher gas ejector |
Also Published As
Publication number | Publication date |
---|---|
JPS6115592B2 (en) | 1986-04-24 |
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