JPS5784160A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS5784160A JPS5784160A JP55160221A JP16022180A JPS5784160A JP S5784160 A JPS5784160 A JP S5784160A JP 55160221 A JP55160221 A JP 55160221A JP 16022180 A JP16022180 A JP 16022180A JP S5784160 A JPS5784160 A JP S5784160A
- Authority
- JP
- Japan
- Prior art keywords
- region
- epitaxial layer
- series resistance
- type
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/082—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including bipolar components only
- H01L27/0823—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including bipolar components only including vertical bipolar transistors only
- H01L27/0825—Combination of vertical direct transistors of the same conductivity type having different characteristics,(e.g. Darlington transistors)
Abstract
PURPOSE:To obtain good reproducibility of characteristics needed for each element and improve degree of integration in a semiconductor device having a high withstand voltage element and an element of a low series resistance in a mixed state in the same semiconductor substrate. CONSTITUTION:After an n<-> type epitaxial layer 21 are formed on a p<-> type Si substrate 1 which is provided with an n<+> type buried layer 2, an element isolation area 3 and a collector connecting region 22 are built, and a boose region 4, an emitter area 5 and an insulation film 6 are formed. Subsequently an openings 71, 72 are bored selectively on an insulation film 6 where there is need for lowering a series resistance such as a region of a Schottky barrier diode and a region in correspondence with a transistor containing a Schottky barrier diode, and etching by necessary quantity on the epitaxial layer 21 is performed. By this constitution, through etching of the silicon epitaxial layer 21 in a region containing an element of low series resistance element, it is placed shallower than the epitaxial layer 21 containing a high withstand voltage element.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55160221A JPS5784160A (en) | 1980-11-14 | 1980-11-14 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55160221A JPS5784160A (en) | 1980-11-14 | 1980-11-14 | Semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5784160A true JPS5784160A (en) | 1982-05-26 |
Family
ID=15710334
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55160221A Pending JPS5784160A (en) | 1980-11-14 | 1980-11-14 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5784160A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10528900B2 (en) | 2016-01-28 | 2020-01-07 | Walmart Apollo, Llc | Cargo unloading apparatus and method |
-
1980
- 1980-11-14 JP JP55160221A patent/JPS5784160A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10528900B2 (en) | 2016-01-28 | 2020-01-07 | Walmart Apollo, Llc | Cargo unloading apparatus and method |
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