JPS5710968A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS5710968A JPS5710968A JP8578780A JP8578780A JPS5710968A JP S5710968 A JPS5710968 A JP S5710968A JP 8578780 A JP8578780 A JP 8578780A JP 8578780 A JP8578780 A JP 8578780A JP S5710968 A JPS5710968 A JP S5710968A
- Authority
- JP
- Japan
- Prior art keywords
- type
- layer
- base
- diffused
- emitter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 abstract 3
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
Abstract
PURPOSE:To readily form a base-emitter resistor of small area in a transistor using as a base the P type layer laminated on an N type substrate, by forming a depletion type N channel MOST between the emitter and base. CONSTITUTION:In a P type epitaxial layer 2 laminated on an N type semiconductor substrate 1, a P type diffused layer 4 and N type diffused layers 3 and 6 are provided, the substrate 1 being defined as a collector region while the layer 3 as an emitter region. In addition, a proper distance is provided between the diffused layers 3 and 6, and the diffused layer 4 is positioned so as to be outer than the diffused layer 6 with respect to the diffused layer 3. The N<+> diffused layer 6 is connected to the P<+> type diffused layer 4 through wiring 7. The pinchoff resistance due to the N type region 6 becomes the base input resistance between a base input terminal 4 and the emitter region 3, and from the regions 3 and 6 and P type layer 2, an N type MOST is formed to be an emitter-base resistance.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8578780A JPS5710968A (en) | 1980-06-23 | 1980-06-23 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8578780A JPS5710968A (en) | 1980-06-23 | 1980-06-23 | Semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5710968A true JPS5710968A (en) | 1982-01-20 |
JPS6349912B2 JPS6349912B2 (en) | 1988-10-06 |
Family
ID=13868591
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8578780A Granted JPS5710968A (en) | 1980-06-23 | 1980-06-23 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5710968A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05206160A (en) * | 1992-09-17 | 1993-08-13 | Rohm Co Ltd | Transistor containing resistor |
JP2015228496A (en) * | 2014-05-08 | 2015-12-17 | 三菱電機株式会社 | Semiconductor device |
-
1980
- 1980-06-23 JP JP8578780A patent/JPS5710968A/en active Granted
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05206160A (en) * | 1992-09-17 | 1993-08-13 | Rohm Co Ltd | Transistor containing resistor |
JPH0722164B2 (en) * | 1992-09-17 | 1995-03-08 | ローム株式会社 | Transistor with built-in resistor |
JP2015228496A (en) * | 2014-05-08 | 2015-12-17 | 三菱電機株式会社 | Semiconductor device |
Also Published As
Publication number | Publication date |
---|---|
JPS6349912B2 (en) | 1988-10-06 |
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