JPS5735366A - Semiconductor integrated circuit device - Google Patents
Semiconductor integrated circuit deviceInfo
- Publication number
- JPS5735366A JPS5735366A JP9090780A JP9090780A JPS5735366A JP S5735366 A JPS5735366 A JP S5735366A JP 9090780 A JP9090780 A JP 9090780A JP 9090780 A JP9090780 A JP 9090780A JP S5735366 A JPS5735366 A JP S5735366A
- Authority
- JP
- Japan
- Prior art keywords
- region
- transistor
- type
- base
- epitaxial
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0214—Particular design considerations for integrated circuits for internal polarisation, e.g. I2L
- H01L27/0229—Particular design considerations for integrated circuits for internal polarisation, e.g. I2L of bipolar structures
- H01L27/0233—Integrated injection logic structures [I2L]
Abstract
PURPOSE:To increase current amplification factor of a reverse direction transistor by removing a base region of a lateral direction transistor as a minority carrier injection element, and forming a longitudinal direction transistor provided in a high concentration diffused region in an epitaxial region. CONSTITUTION:A high concentration, N type, diffused region 13 is formed in an N type epitaxial region 11 in an emitter region of the reverse direction switchg transistor. In the meantime, a base region is formed by a low concentration epitaxial region 11 in the lateral direction PNP transistor as the carrier injection element. In a bipolar NPN transistor formed by a base region 5 and an emitter region 6, a P type base is formed in the low concentration, N type, epitaxial region 11.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9090780A JPS5735366A (en) | 1980-07-03 | 1980-07-03 | Semiconductor integrated circuit device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9090780A JPS5735366A (en) | 1980-07-03 | 1980-07-03 | Semiconductor integrated circuit device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5735366A true JPS5735366A (en) | 1982-02-25 |
Family
ID=14011468
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9090780A Pending JPS5735366A (en) | 1980-07-03 | 1980-07-03 | Semiconductor integrated circuit device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5735366A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59205510A (en) * | 1983-04-22 | 1984-11-21 | コンバツシヨン・エンヂニアリング・インコ−ポレ−テツド | Nozzle chip for burner |
JPS6043807U (en) * | 1983-09-05 | 1985-03-28 | バブコツク日立株式会社 | Pulverized coal combustion equipment |
-
1980
- 1980-07-03 JP JP9090780A patent/JPS5735366A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59205510A (en) * | 1983-04-22 | 1984-11-21 | コンバツシヨン・エンヂニアリング・インコ−ポレ−テツド | Nozzle chip for burner |
JPH0225086B2 (en) * | 1983-04-22 | 1990-05-31 | Combustion Eng | |
JPS6043807U (en) * | 1983-09-05 | 1985-03-28 | バブコツク日立株式会社 | Pulverized coal combustion equipment |
JPH0318808Y2 (en) * | 1983-09-05 | 1991-04-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5735366A (en) | Semiconductor integrated circuit device | |
JPS5365675A (en) | Semiconductor device | |
JPS55153367A (en) | Semiconductor device | |
JPS56108255A (en) | Semiconductor integrated circuit | |
JPS5635455A (en) | Semiconductor device | |
JPS5615068A (en) | Semiconductor device and manufacture thereof | |
JPS5687360A (en) | Transistor device | |
JPS5762552A (en) | Manufacture of semiconductor device | |
JPS5260078A (en) | Pnp type transistor for semiconductor integrated circuit | |
JPS5617067A (en) | Semiconductor switch | |
JPS5261978A (en) | Semiconductor integrated circuit device and its production | |
JPS5710968A (en) | Semiconductor device | |
JPS5710964A (en) | Manufacture of semiconductor device | |
JPS5382276A (en) | Production of semiconductor device | |
JPS5533007A (en) | Semiconductor intergated circuit | |
JPS561567A (en) | Manufacture of semiconductor device | |
JPS5617055A (en) | Semiconductor integrated circuit device and manufacture thereof | |
JPS5715456A (en) | Semiconductor integrated circuit device | |
JPS6435951A (en) | Semiconductor device | |
JPS52106278A (en) | Manufacture of bipolar cmos semiconductor device | |
JPS57198657A (en) | Semiconductor device | |
JPS56126958A (en) | Semiconductor circuit element | |
JPS5383584A (en) | Semiconductor logic element | |
JPS5710963A (en) | Semiconductor device and manufacture thereof | |
JPS5715466A (en) | Semiconductor device |