JPS5771168A - Semiconductor integrated circuit device - Google Patents
Semiconductor integrated circuit deviceInfo
- Publication number
- JPS5771168A JPS5771168A JP55146959A JP14695980A JPS5771168A JP S5771168 A JPS5771168 A JP S5771168A JP 55146959 A JP55146959 A JP 55146959A JP 14695980 A JP14695980 A JP 14695980A JP S5771168 A JPS5771168 A JP S5771168A
- Authority
- JP
- Japan
- Prior art keywords
- regions
- region
- type
- deep
- layers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0214—Particular design considerations for integrated circuits for internal polarisation, e.g. I2L
- H01L27/0229—Particular design considerations for integrated circuits for internal polarisation, e.g. I2L of bipolar structures
- H01L27/0233—Integrated injection logic structures [I2L]
- H01L27/0244—I2L structures integrated in combination with analog structures
Abstract
PURPOSE:To obtain a device permitting a variety of circuit operation by a method wherein a semiconductor layer is split into three regions and same conductivity type regions with deep high impurity concentration are provided in the first and the second regions and an I<2>L element is formed in the first region and bipolar transistors are formed in the second region and the third region having no deep region respectively. CONSTITUTION:Three N<+> type buried regions 2 are diffused are formed on a P type semiconductor substrate 1 to epitaxially grow N<-> type layers 3 on the whole surface including the regions 2 and the whole surface is covered with SiO2 films 16 to provide corresponding openings 27-29 between the respective region 2 and P type impurities 30 are adhered to the opening 27-29. Next, big openings 31 and 32 are perforated through the film 16, corresponding to the regions 2 located at the oposite sides, and N type impurity ion implantation layers 33 are formed in the openings 31 and 32 to generate P type isolation regions 4 reaching the substrate 1 between each region 2 and deep N type well regions 5 and 9 reaching the regions 2 on the opposite side regions 2 are made by thermal treatment. In this way, the epitaxial layer 3 is split into three and an I<2>L element is formed in a region 5 and bipolar transistors are formed in the layers 3 located at the region 9 and between the regions 9 and 5 respectively.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55146959A JPS5771168A (en) | 1980-10-22 | 1980-10-22 | Semiconductor integrated circuit device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55146959A JPS5771168A (en) | 1980-10-22 | 1980-10-22 | Semiconductor integrated circuit device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5771168A true JPS5771168A (en) | 1982-05-01 |
Family
ID=15419444
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55146959A Pending JPS5771168A (en) | 1980-10-22 | 1980-10-22 | Semiconductor integrated circuit device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5771168A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1990008421A1 (en) * | 1989-01-17 | 1990-07-26 | Motorola, Inc. | Vibrator |
-
1980
- 1980-10-22 JP JP55146959A patent/JPS5771168A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1990008421A1 (en) * | 1989-01-17 | 1990-07-26 | Motorola, Inc. | Vibrator |
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