JPS576848A - Photomask and its preparation - Google Patents

Photomask and its preparation

Info

Publication number
JPS576848A
JPS576848A JP8059780A JP8059780A JPS576848A JP S576848 A JPS576848 A JP S576848A JP 8059780 A JP8059780 A JP 8059780A JP 8059780 A JP8059780 A JP 8059780A JP S576848 A JPS576848 A JP S576848A
Authority
JP
Japan
Prior art keywords
film
resist pattern
polycrystalline silicon
pattern
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8059780A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6223861B2 (enrdf_load_stackoverflow
Inventor
Kazuhiko Tsuji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP8059780A priority Critical patent/JPS576848A/ja
Publication of JPS576848A publication Critical patent/JPS576848A/ja
Publication of JPS6223861B2 publication Critical patent/JPS6223861B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP8059780A 1980-06-13 1980-06-13 Photomask and its preparation Granted JPS576848A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8059780A JPS576848A (en) 1980-06-13 1980-06-13 Photomask and its preparation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8059780A JPS576848A (en) 1980-06-13 1980-06-13 Photomask and its preparation

Publications (2)

Publication Number Publication Date
JPS576848A true JPS576848A (en) 1982-01-13
JPS6223861B2 JPS6223861B2 (enrdf_load_stackoverflow) 1987-05-26

Family

ID=13722732

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8059780A Granted JPS576848A (en) 1980-06-13 1980-06-13 Photomask and its preparation

Country Status (1)

Country Link
JP (1) JPS576848A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58173744A (ja) * 1982-04-05 1983-10-12 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション マスク
JPS5979254A (ja) * 1982-09-27 1984-05-08 ウエスターン　エレクトリック　カムパニー，インコーポレーテツド フオトマスク

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56168654A (en) * 1980-05-30 1981-12-24 Fujitsu Ltd Photomask

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56168654A (en) * 1980-05-30 1981-12-24 Fujitsu Ltd Photomask

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58173744A (ja) * 1982-04-05 1983-10-12 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション マスク
JPS5979254A (ja) * 1982-09-27 1984-05-08 ウエスターン　エレクトリック　カムパニー，インコーポレーテツド フオトマスク

Also Published As

Publication number Publication date
JPS6223861B2 (enrdf_load_stackoverflow) 1987-05-26

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