JPS6223861B2 - - Google Patents

Info

Publication number
JPS6223861B2
JPS6223861B2 JP55080597A JP8059780A JPS6223861B2 JP S6223861 B2 JPS6223861 B2 JP S6223861B2 JP 55080597 A JP55080597 A JP 55080597A JP 8059780 A JP8059780 A JP 8059780A JP S6223861 B2 JPS6223861 B2 JP S6223861B2
Authority
JP
Japan
Prior art keywords
film
light
photomask
pattern
polycrystalline silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55080597A
Other languages
English (en)
Japanese (ja)
Other versions
JPS576848A (en
Inventor
Kazuhiko Tsuji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP8059780A priority Critical patent/JPS576848A/ja
Publication of JPS576848A publication Critical patent/JPS576848A/ja
Publication of JPS6223861B2 publication Critical patent/JPS6223861B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP8059780A 1980-06-13 1980-06-13 Photomask and its preparation Granted JPS576848A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8059780A JPS576848A (en) 1980-06-13 1980-06-13 Photomask and its preparation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8059780A JPS576848A (en) 1980-06-13 1980-06-13 Photomask and its preparation

Publications (2)

Publication Number Publication Date
JPS576848A JPS576848A (en) 1982-01-13
JPS6223861B2 true JPS6223861B2 (enrdf_load_stackoverflow) 1987-05-26

Family

ID=13722732

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8059780A Granted JPS576848A (en) 1980-06-13 1980-06-13 Photomask and its preparation

Country Status (1)

Country Link
JP (1) JPS576848A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3374452D1 (en) * 1982-04-05 1987-12-17 Ibm Method of increasing the image resolution of a transmitting mask and improved masks for performing the method
JPS5979254A (ja) * 1982-09-27 1984-05-08 ウエスターン　エレクトリック　カムパニー，インコーポレーテツド フオトマスク

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56168654A (en) * 1980-05-30 1981-12-24 Fujitsu Ltd Photomask

Also Published As

Publication number Publication date
JPS576848A (en) 1982-01-13

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