JPS5753933A - Handotaisoshinoseizohoho - Google Patents

Handotaisoshinoseizohoho

Info

Publication number
JPS5753933A
JPS5753933A JP12852780A JP12852780A JPS5753933A JP S5753933 A JPS5753933 A JP S5753933A JP 12852780 A JP12852780 A JP 12852780A JP 12852780 A JP12852780 A JP 12852780A JP S5753933 A JPS5753933 A JP S5753933A
Authority
JP
Japan
Prior art keywords
wafer
improving agent
container
resist
side wall
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12852780A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0214772B2 (enrdf_load_stackoverflow
Inventor
Toshihiro Abe
Masatoshi Matsushita
Kensho Kyoto
Terumi Rokushiya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP12852780A priority Critical patent/JPS5753933A/ja
Publication of JPS5753933A publication Critical patent/JPS5753933A/ja
Publication of JPH0214772B2 publication Critical patent/JPH0214772B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP12852780A 1980-09-18 1980-09-18 Handotaisoshinoseizohoho Granted JPS5753933A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12852780A JPS5753933A (ja) 1980-09-18 1980-09-18 Handotaisoshinoseizohoho

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12852780A JPS5753933A (ja) 1980-09-18 1980-09-18 Handotaisoshinoseizohoho

Publications (2)

Publication Number Publication Date
JPS5753933A true JPS5753933A (ja) 1982-03-31
JPH0214772B2 JPH0214772B2 (enrdf_load_stackoverflow) 1990-04-10

Family

ID=14986946

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12852780A Granted JPS5753933A (ja) 1980-09-18 1980-09-18 Handotaisoshinoseizohoho

Country Status (1)

Country Link
JP (1) JPS5753933A (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58190027A (ja) * 1982-04-30 1983-11-05 Nec Kyushu Ltd 半導体基板有機処理装置
JPS59175122A (ja) * 1983-03-23 1984-10-03 Nec Corp 半導体基板塗布前処理装置
JPS6284517A (ja) * 1985-10-08 1987-04-18 Kuretsuku Syst:Kk 感光剤塗布処理装置
JPS62211643A (ja) * 1986-03-12 1987-09-17 Mitsubishi Electric Corp 密着強化剤塗布方法
JPS63199423A (ja) * 1987-02-16 1988-08-17 Toshiba Corp 半導体基板表面処理方法
JPS6425535A (en) * 1987-07-22 1989-01-27 Matsushita Electronics Corp Treatment of substrate for forming resist film

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5489477A (en) * 1977-12-27 1979-07-16 Toshiba Corp Production of semiconductor device
JPS5543844A (en) * 1978-09-25 1980-03-27 Hitachi Ltd Method and apparatus for photoresist sensitizing process

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5489477A (en) * 1977-12-27 1979-07-16 Toshiba Corp Production of semiconductor device
JPS5543844A (en) * 1978-09-25 1980-03-27 Hitachi Ltd Method and apparatus for photoresist sensitizing process

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58190027A (ja) * 1982-04-30 1983-11-05 Nec Kyushu Ltd 半導体基板有機処理装置
JPS59175122A (ja) * 1983-03-23 1984-10-03 Nec Corp 半導体基板塗布前処理装置
JPS6284517A (ja) * 1985-10-08 1987-04-18 Kuretsuku Syst:Kk 感光剤塗布処理装置
JPS62211643A (ja) * 1986-03-12 1987-09-17 Mitsubishi Electric Corp 密着強化剤塗布方法
JPS63199423A (ja) * 1987-02-16 1988-08-17 Toshiba Corp 半導体基板表面処理方法
JPS6425535A (en) * 1987-07-22 1989-01-27 Matsushita Electronics Corp Treatment of substrate for forming resist film

Also Published As

Publication number Publication date
JPH0214772B2 (enrdf_load_stackoverflow) 1990-04-10

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