JPH0214772B2 - - Google Patents

Info

Publication number
JPH0214772B2
JPH0214772B2 JP55128527A JP12852780A JPH0214772B2 JP H0214772 B2 JPH0214772 B2 JP H0214772B2 JP 55128527 A JP55128527 A JP 55128527A JP 12852780 A JP12852780 A JP 12852780A JP H0214772 B2 JPH0214772 B2 JP H0214772B2
Authority
JP
Japan
Prior art keywords
wafer
container
semiconductor
surface modification
sealed container
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP55128527A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5753933A (ja
Inventor
Toshihiro Abe
Masatoshi Matsushita
Kensho Kyoto
Terumi Rokusha
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP12852780A priority Critical patent/JPS5753933A/ja
Publication of JPS5753933A publication Critical patent/JPS5753933A/ja
Publication of JPH0214772B2 publication Critical patent/JPH0214772B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP12852780A 1980-09-18 1980-09-18 Handotaisoshinoseizohoho Granted JPS5753933A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12852780A JPS5753933A (ja) 1980-09-18 1980-09-18 Handotaisoshinoseizohoho

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12852780A JPS5753933A (ja) 1980-09-18 1980-09-18 Handotaisoshinoseizohoho

Publications (2)

Publication Number Publication Date
JPS5753933A JPS5753933A (ja) 1982-03-31
JPH0214772B2 true JPH0214772B2 (enrdf_load_stackoverflow) 1990-04-10

Family

ID=14986946

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12852780A Granted JPS5753933A (ja) 1980-09-18 1980-09-18 Handotaisoshinoseizohoho

Country Status (1)

Country Link
JP (1) JPS5753933A (enrdf_load_stackoverflow)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58190027A (ja) * 1982-04-30 1983-11-05 Nec Kyushu Ltd 半導体基板有機処理装置
JPS59175122A (ja) * 1983-03-23 1984-10-03 Nec Corp 半導体基板塗布前処理装置
JPS6284517A (ja) * 1985-10-08 1987-04-18 Kuretsuku Syst:Kk 感光剤塗布処理装置
JPS62211643A (ja) * 1986-03-12 1987-09-17 Mitsubishi Electric Corp 密着強化剤塗布方法
JPS63199423A (ja) * 1987-02-16 1988-08-17 Toshiba Corp 半導体基板表面処理方法
JPH0793254B2 (ja) * 1987-07-22 1995-10-09 松下電子工業株式会社 レジスト膜形成用基板の処理方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5489477A (en) * 1977-12-27 1979-07-16 Toshiba Corp Production of semiconductor device
JPS5543844A (en) * 1978-09-25 1980-03-27 Hitachi Ltd Method and apparatus for photoresist sensitizing process

Also Published As

Publication number Publication date
JPS5753933A (ja) 1982-03-31

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