JPS5750434A - Plasma etching method - Google Patents

Plasma etching method

Info

Publication number
JPS5750434A
JPS5750434A JP55126332A JP12633280A JPS5750434A JP S5750434 A JPS5750434 A JP S5750434A JP 55126332 A JP55126332 A JP 55126332A JP 12633280 A JP12633280 A JP 12633280A JP S5750434 A JPS5750434 A JP S5750434A
Authority
JP
Japan
Prior art keywords
film
aluminum
aluminum film
oxidation
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP55126332A
Other languages
English (en)
Inventor
Takashi Yamazaki
Tetsuo Kurisaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Tokuda Seisakusho Co Ltd
Original Assignee
Toshiba Corp
Tokuda Seisakusho Co Ltd
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokuda Seisakusho Co Ltd, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP55126332A priority Critical patent/JPS5750434A/ja
Publication of JPS5750434A publication Critical patent/JPS5750434A/ja
Pending legal-status Critical Current

Links

Classifications

    • H10P50/00—

Landscapes

  • Drying Of Semiconductors (AREA)
JP55126332A 1980-09-11 1980-09-11 Plasma etching method Pending JPS5750434A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55126332A JPS5750434A (en) 1980-09-11 1980-09-11 Plasma etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55126332A JPS5750434A (en) 1980-09-11 1980-09-11 Plasma etching method

Publications (1)

Publication Number Publication Date
JPS5750434A true JPS5750434A (en) 1982-03-24

Family

ID=14932556

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55126332A Pending JPS5750434A (en) 1980-09-11 1980-09-11 Plasma etching method

Country Status (1)

Country Link
JP (1) JPS5750434A (ja)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5165582A (ja) * 1974-12-04 1976-06-07 Hitachi Ltd Denkyokuhaisensokeiseihoho
JPS5519873A (en) * 1978-07-28 1980-02-12 Mitsubishi Electric Corp Forming method of metallic layer pattern for semiconductor

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5165582A (ja) * 1974-12-04 1976-06-07 Hitachi Ltd Denkyokuhaisensokeiseihoho
JPS5519873A (en) * 1978-07-28 1980-02-12 Mitsubishi Electric Corp Forming method of metallic layer pattern for semiconductor

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