JPS57164982A - Etching method - Google Patents
Etching methodInfo
- Publication number
- JPS57164982A JPS57164982A JP4961881A JP4961881A JPS57164982A JP S57164982 A JPS57164982 A JP S57164982A JP 4961881 A JP4961881 A JP 4961881A JP 4961881 A JP4961881 A JP 4961881A JP S57164982 A JPS57164982 A JP S57164982A
- Authority
- JP
- Japan
- Prior art keywords
- etching
- layer
- sputtering
- copper
- color
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Abstract
PURPOSE: To perform accurate etching visually in removing of etching on a coating layer formed on a conductive material layer of which the hue is changed by the film formed on the surface by discriminating etching condition from the change in the hue.
CONSTITUTION: For example, a copper layer 2 is deposited on a substrate 1 by vapor deposition or sputtering, after which it is heat-treated in air. Right after sputtering, said layer forms a metallic copper color but after the heat treatment, the copper surface is oxidize to form an oxidized film 3, thereby forming a reddish brown color. An Al2O3 layer 4 is deposited by vapor deposition or sputtering thereon, and is formed with required resist patterns by using a photoresist 5. This sample is immersed in a heated phosphoric acid, whereby Al2O3 is etched. The etching ends at the point of the time when the Al2O3 is etched and the copper surface of the reddish brown color changes to a metallic copper color.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4961881A JPS57164982A (en) | 1981-04-02 | 1981-04-02 | Etching method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4961881A JPS57164982A (en) | 1981-04-02 | 1981-04-02 | Etching method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57164982A true JPS57164982A (en) | 1982-10-09 |
Family
ID=12836215
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4961881A Pending JPS57164982A (en) | 1981-04-02 | 1981-04-02 | Etching method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57164982A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0331487A (en) * | 1989-06-26 | 1991-02-12 | Hon Chen Ron | Labeled development |
JPH0738172A (en) * | 1993-06-28 | 1995-02-07 | Nec Corp | Magnetoresistance device |
-
1981
- 1981-04-02 JP JP4961881A patent/JPS57164982A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0331487A (en) * | 1989-06-26 | 1991-02-12 | Hon Chen Ron | Labeled development |
JPH0738172A (en) * | 1993-06-28 | 1995-02-07 | Nec Corp | Magnetoresistance device |
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