JPS5696079A - Formation of metallic mask for ion etching - Google Patents
Formation of metallic mask for ion etchingInfo
- Publication number
- JPS5696079A JPS5696079A JP17100479A JP17100479A JPS5696079A JP S5696079 A JPS5696079 A JP S5696079A JP 17100479 A JP17100479 A JP 17100479A JP 17100479 A JP17100479 A JP 17100479A JP S5696079 A JPS5696079 A JP S5696079A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- worked
- coating
- resist pattern
- formation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- ing And Chemical Polishing (AREA)
- Magnetic Heads (AREA)
Abstract
PURPOSE: To form easily titled mask excellent in peeling resistance, by forming Cu layer, Ti layer successively on the adhered metallic layer formed on the material to be worked, and by forming resist pattern on the Ti layer, then by etching the Ti layer.
CONSTITUTION: Adhered layer 2 contg. Al or Cr is formed on the material 1 to be worked. Then Cu coating 3, Ti coating 4 are formed successively. After formation of a photoresist layer by painting photoresist agent on the Ti coating 4, the material 1 to be worked is treated by well known processes including exposure, development to form resist pattern 5, it is then immersed into an etching fluid contg. hydrofluoric acid so as to etch the Ti layer 4 along the resist pattern 5. The Cu coating 3 remains without being etched and protects the adhered layer 2 and the material 1 to be worked. When the pattern 5 is removed, metallic mask 4 for ion etching is formed.
COPYRIGHT: (C)1981,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17100479A JPS5696079A (en) | 1979-12-28 | 1979-12-28 | Formation of metallic mask for ion etching |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17100479A JPS5696079A (en) | 1979-12-28 | 1979-12-28 | Formation of metallic mask for ion etching |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5696079A true JPS5696079A (en) | 1981-08-03 |
Family
ID=15915313
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17100479A Pending JPS5696079A (en) | 1979-12-28 | 1979-12-28 | Formation of metallic mask for ion etching |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5696079A (en) |
-
1979
- 1979-12-28 JP JP17100479A patent/JPS5696079A/en active Pending
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