JPS5696080A - Formation of metallic mask for ion etching - Google Patents
Formation of metallic mask for ion etchingInfo
- Publication number
- JPS5696080A JPS5696080A JP17100679A JP17100679A JPS5696080A JP S5696080 A JPS5696080 A JP S5696080A JP 17100679 A JP17100679 A JP 17100679A JP 17100679 A JP17100679 A JP 17100679A JP S5696080 A JPS5696080 A JP S5696080A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- alloy
- layer
- ion etching
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Magnetic Heads (AREA)
- ing And Chemical Polishing (AREA)
- Adjustment Of The Magnetic Head Position Track Following On Tapes (AREA)
Abstract
PURPOSE: To form easily titled mask excellent in peeling resistance, by forming adhered layer of Al (or its alloy) or Cr, Ni-Fe alloy layer successively on the material to be worked made of metallic oxide, then by forming Ti coating of desired shape.
CONSTITUTION: The material 1 to be worked made of photoceram, barium titanate, ferrite etc. is coated with an adhered layer 3 made of Al, Al alloy, or Cr, then it is coated with a protecting layer 3 made of Ni-Fe alloy. The layer 3 is painted with photoresist agent, and is treated by well known processes including exposure, development to form a resist pattern 4. Ti coatings 5, 5a which are a little thinner than the pattern 4 are formed on the pattern 4. The Ti coatings 5 and 5a are discontinuous, hence the removal of the pattern 4 by dissolution removes the Ti coating 5 together with pattern 4, hereby Ti mask 5a for ion etching is formed.
COPYRIGHT: (C)1981,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17100679A JPS5696080A (en) | 1979-12-28 | 1979-12-28 | Formation of metallic mask for ion etching |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17100679A JPS5696080A (en) | 1979-12-28 | 1979-12-28 | Formation of metallic mask for ion etching |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5696080A true JPS5696080A (en) | 1981-08-03 |
JPS627273B2 JPS627273B2 (en) | 1987-02-16 |
Family
ID=15915348
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17100679A Granted JPS5696080A (en) | 1979-12-28 | 1979-12-28 | Formation of metallic mask for ion etching |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5696080A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0583889A2 (en) * | 1992-07-22 | 1994-02-23 | Ngk Insulators, Ltd. | Method of etching sendust and method of pattern-etching sendust and chromium films |
-
1979
- 1979-12-28 JP JP17100679A patent/JPS5696080A/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0583889A2 (en) * | 1992-07-22 | 1994-02-23 | Ngk Insulators, Ltd. | Method of etching sendust and method of pattern-etching sendust and chromium films |
EP0583889A3 (en) * | 1992-07-22 | 1994-10-12 | Ngk Insulators Ltd | Method of etching sendust and method of pattern-etching sendust and chromium films. |
Also Published As
Publication number | Publication date |
---|---|
JPS627273B2 (en) | 1987-02-16 |
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