JPS5749233A - Laminar structure resist and forming method for pattern thereof - Google Patents

Laminar structure resist and forming method for pattern thereof

Info

Publication number
JPS5749233A
JPS5749233A JP12570480A JP12570480A JPS5749233A JP S5749233 A JPS5749233 A JP S5749233A JP 12570480 A JP12570480 A JP 12570480A JP 12570480 A JP12570480 A JP 12570480A JP S5749233 A JPS5749233 A JP S5749233A
Authority
JP
Japan
Prior art keywords
layer
resist
laminar structure
coated
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12570480A
Other languages
English (en)
Inventor
Hideo Saeki
Jun Uno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP12570480A priority Critical patent/JPS5749233A/ja
Publication of JPS5749233A publication Critical patent/JPS5749233A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0272—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers for lift-off processes

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Electron Beam Exposure (AREA)
  • Drying Of Semiconductors (AREA)
JP12570480A 1980-09-08 1980-09-08 Laminar structure resist and forming method for pattern thereof Pending JPS5749233A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12570480A JPS5749233A (en) 1980-09-08 1980-09-08 Laminar structure resist and forming method for pattern thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12570480A JPS5749233A (en) 1980-09-08 1980-09-08 Laminar structure resist and forming method for pattern thereof

Publications (1)

Publication Number Publication Date
JPS5749233A true JPS5749233A (en) 1982-03-23

Family

ID=14916652

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12570480A Pending JPS5749233A (en) 1980-09-08 1980-09-08 Laminar structure resist and forming method for pattern thereof

Country Status (1)

Country Link
JP (1) JPS5749233A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6113628A (ja) * 1984-06-27 1986-01-21 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション リフト・オフ・マスクの形成方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6113628A (ja) * 1984-06-27 1986-01-21 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション リフト・オフ・マスクの形成方法
JPH0562815B2 (ja) * 1984-06-27 1993-09-09 Ibm

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