JPS5724580A - Manufacture of infrared ray detecting element - Google Patents
Manufacture of infrared ray detecting elementInfo
- Publication number
- JPS5724580A JPS5724580A JP9917080A JP9917080A JPS5724580A JP S5724580 A JPS5724580 A JP S5724580A JP 9917080 A JP9917080 A JP 9917080A JP 9917080 A JP9917080 A JP 9917080A JP S5724580 A JPS5724580 A JP S5724580A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- infrared ray
- detecting element
- semiconductor substrate
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 abstract 5
- 239000004065 semiconductor Substances 0.000 abstract 4
- 239000013078 crystal Substances 0.000 abstract 2
- 229910052793 cadmium Inorganic materials 0.000 abstract 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 abstract 1
- 238000005530 etching Methods 0.000 abstract 1
- 230000008020 evaporation Effects 0.000 abstract 1
- 238000001704 evaporation Methods 0.000 abstract 1
- 239000012535 impurity Substances 0.000 abstract 1
- 238000004943 liquid phase epitaxy Methods 0.000 abstract 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 1
- 229910052714 tellurium Inorganic materials 0.000 abstract 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14643—Photodiode arrays; MOS imagers
- H01L27/14649—Infrared imagers
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Light Receiving Elements (AREA)
Abstract
PURPOSE:To make it possible to easily obtain a multiplex semiconductor substrate, which is thin and uniform, by growing epitaxially a multiplex semiconductor crystal on a semiconductor substrate of high specific resistance, and then performing etching to the substrate. CONSTITUTION:On a high specific resistance semiconductor substrate 21 of cadmium.tellurium (CdTe) or the like having no impurity added, a crystal layer 22 of Hg1-xCdxTe is grown by liquid phase epitaxy. The layer 22 epitaxially grown is etched to the substrate 21 by using as a mask a photoresist film 23A formed into a predetermined pattern. Then, In is deposited by evaporation at both the ends of the layer 22 to form an infrared ray detecting element 24, an electrode region 25, and a light receiver 26.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9917080A JPS5724580A (en) | 1980-07-18 | 1980-07-18 | Manufacture of infrared ray detecting element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9917080A JPS5724580A (en) | 1980-07-18 | 1980-07-18 | Manufacture of infrared ray detecting element |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5724580A true JPS5724580A (en) | 1982-02-09 |
JPS6310910B2 JPS6310910B2 (en) | 1988-03-10 |
Family
ID=14240169
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9917080A Granted JPS5724580A (en) | 1980-07-18 | 1980-07-18 | Manufacture of infrared ray detecting element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5724580A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4880979A (en) * | 1987-02-27 | 1989-11-14 | Mitisubishi Denki Kabushiki Kaisha | Infrared ray detector |
US6766459B2 (en) | 1999-12-27 | 2004-07-20 | Seiko Epson Corporation | Time keeping apparatus and method for controlling the same |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5491196A (en) * | 1977-12-28 | 1979-07-19 | Toshiba Corp | Production of photoconductive array-shaped infrared detector |
-
1980
- 1980-07-18 JP JP9917080A patent/JPS5724580A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5491196A (en) * | 1977-12-28 | 1979-07-19 | Toshiba Corp | Production of photoconductive array-shaped infrared detector |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4880979A (en) * | 1987-02-27 | 1989-11-14 | Mitisubishi Denki Kabushiki Kaisha | Infrared ray detector |
US6766459B2 (en) | 1999-12-27 | 2004-07-20 | Seiko Epson Corporation | Time keeping apparatus and method for controlling the same |
Also Published As
Publication number | Publication date |
---|---|
JPS6310910B2 (en) | 1988-03-10 |
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