JPS5282087A - Production of solar cell - Google Patents
Production of solar cellInfo
- Publication number
- JPS5282087A JPS5282087A JP6420676A JP6420676A JPS5282087A JP S5282087 A JPS5282087 A JP S5282087A JP 6420676 A JP6420676 A JP 6420676A JP 6420676 A JP6420676 A JP 6420676A JP S5282087 A JPS5282087 A JP S5282087A
- Authority
- JP
- Japan
- Prior art keywords
- solar cell
- production
- substrate
- junction
- separating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/546—Polycrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
Abstract
PURPOSE: To produce an Si solar cell of a low cost by forming a pn junction through epitaxial growth on an Si single crystal substrate and separating this thin epitaxial layer from the substrate by electrolytic etching.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6420676A JPS5282087A (en) | 1976-06-02 | 1976-06-02 | Production of solar cell |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6420676A JPS5282087A (en) | 1976-06-02 | 1976-06-02 | Production of solar cell |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50156763A Division JPS5280776A (en) | 1975-12-27 | 1975-12-27 | Preparation of thin film silicon single crystal plate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5282087A true JPS5282087A (en) | 1977-07-08 |
Family
ID=13251359
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6420676A Pending JPS5282087A (en) | 1976-06-02 | 1976-06-02 | Production of solar cell |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5282087A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5559784A (en) * | 1978-10-23 | 1980-05-06 | Hezel Rudolf | Soalr battery |
JPS6489568A (en) * | 1987-09-30 | 1989-04-04 | Sharp Kk | Manufacture of semiconductor device |
CN110137307A (en) * | 2019-05-13 | 2019-08-16 | 浙江贝盛光伏股份有限公司 | A kind of high uniformity shallow junction diffusion technique under environment under low pressure |
-
1976
- 1976-06-02 JP JP6420676A patent/JPS5282087A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5559784A (en) * | 1978-10-23 | 1980-05-06 | Hezel Rudolf | Soalr battery |
JPH0147025B2 (en) * | 1978-10-23 | 1989-10-12 | Nukem Gmbh | |
JPS6489568A (en) * | 1987-09-30 | 1989-04-04 | Sharp Kk | Manufacture of semiconductor device |
CN110137307A (en) * | 2019-05-13 | 2019-08-16 | 浙江贝盛光伏股份有限公司 | A kind of high uniformity shallow junction diffusion technique under environment under low pressure |
CN110137307B (en) * | 2019-05-13 | 2021-10-22 | 浙江贝盛光伏股份有限公司 | High-uniformity shallow junction diffusion process in low-pressure environment |
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