JPS6489568A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS6489568A JPS6489568A JP62247624A JP24762487A JPS6489568A JP S6489568 A JPS6489568 A JP S6489568A JP 62247624 A JP62247624 A JP 62247624A JP 24762487 A JP24762487 A JP 24762487A JP S6489568 A JPS6489568 A JP S6489568A
- Authority
- JP
- Japan
- Prior art keywords
- low
- circuit
- semiconductor
- cvd method
- pressure cvd
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Photovoltaic Devices (AREA)
Abstract
PURPOSE:To improve open-circuit voltage and short-circuit characteristics of a semiconductor device by forming a P-N junction and pasivation simultaneously in such a manner that material gases are changed in a vapor phase atmosphere to coat one surface of a semiconductor substrate of a first conductivity type with a semiconductor of a second conductivity type and then with an oxide. CONSTITUTION:A P-type silicon substrate 22 is etched at its surface and placed in a low-pressure CVD chamber. An N<+> polysilicon layer 23 is deposited by a low-pressure CVD method using SiH4 or PH3 gas. The N<+> polysilicon layer 23 is coated with silicon dioxide 24 by a low-pressure CVD method using SiH4 or O2 gas. The temperature for the CVD method is low enough to prevent thermal diffusion and thermal oxidation, so that semiconductor characteristics of the substrate will not be degraded. The doped polysilicon 23 provides high open-circuit voltage, while the silicon dioxide film 24 provides good open-circuit and short-circuit characteristics.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62247624A JPS6489568A (en) | 1987-09-30 | 1987-09-30 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62247624A JPS6489568A (en) | 1987-09-30 | 1987-09-30 | Manufacture of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6489568A true JPS6489568A (en) | 1989-04-04 |
Family
ID=17166276
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62247624A Pending JPS6489568A (en) | 1987-09-30 | 1987-09-30 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6489568A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2009131111A1 (en) * | 2008-04-25 | 2009-10-29 | 株式会社アルバック | Solar cell manufacturing method, solar cell manufacturing apparatus, and solar cell |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5282087A (en) * | 1976-06-02 | 1977-07-08 | Seiko Epson Corp | Production of solar cell |
JPS55160475A (en) * | 1979-05-31 | 1980-12-13 | Sharp Corp | Amorphous thin film solar battery |
JPS5651878A (en) * | 1979-10-04 | 1981-05-09 | Fuji Electric Co Ltd | Manufacture of mis composition amorphous silicon solar cell |
JPS5789270A (en) * | 1980-09-26 | 1982-06-03 | Unisearch Ltd | Solar battery and method of producing same |
JPS6145869A (en) * | 1984-08-08 | 1986-03-05 | Teijin Ltd | Yarn switching method for winder of spindle drive type |
-
1987
- 1987-09-30 JP JP62247624A patent/JPS6489568A/en active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5282087A (en) * | 1976-06-02 | 1977-07-08 | Seiko Epson Corp | Production of solar cell |
JPS55160475A (en) * | 1979-05-31 | 1980-12-13 | Sharp Corp | Amorphous thin film solar battery |
JPS5651878A (en) * | 1979-10-04 | 1981-05-09 | Fuji Electric Co Ltd | Manufacture of mis composition amorphous silicon solar cell |
JPS5789270A (en) * | 1980-09-26 | 1982-06-03 | Unisearch Ltd | Solar battery and method of producing same |
JPS6145869A (en) * | 1984-08-08 | 1986-03-05 | Teijin Ltd | Yarn switching method for winder of spindle drive type |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2009131111A1 (en) * | 2008-04-25 | 2009-10-29 | 株式会社アルバック | Solar cell manufacturing method, solar cell manufacturing apparatus, and solar cell |
JPWO2009131111A1 (en) * | 2008-04-25 | 2011-08-18 | 株式会社アルバック | SOLAR CELL MANUFACTURING METHOD, SOLAR CELL MANUFACTURING DEVICE, AND SOLAR CELL |
US8198115B2 (en) | 2008-04-25 | 2012-06-12 | Ulvac, Inc. | Solar cell, and method and apparatus for manufacturing the same |
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