JPS57195218A - Non-linear element - Google Patents

Non-linear element

Info

Publication number
JPS57195218A
JPS57195218A JP56080243A JP8024381A JPS57195218A JP S57195218 A JPS57195218 A JP S57195218A JP 56080243 A JP56080243 A JP 56080243A JP 8024381 A JP8024381 A JP 8024381A JP S57195218 A JPS57195218 A JP S57195218A
Authority
JP
Japan
Prior art keywords
film
metal
linear element
subsequently
metallic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56080243A
Other languages
Japanese (ja)
Other versions
JPH0210923B2 (en
Inventor
Shinji Morozumi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Suwa Seikosha KK
Original Assignee
Seiko Epson Corp
Suwa Seikosha KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp, Suwa Seikosha KK filed Critical Seiko Epson Corp
Priority to JP56080243A priority Critical patent/JPS57195218A/en
Publication of JPS57195218A publication Critical patent/JPS57195218A/en
Publication of JPH0210923B2 publication Critical patent/JPH0210923B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colourĀ 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colourĀ  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/1365Active matrix addressed cells in which the switching element is a two-electrode device

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Liquid Crystal (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

PURPOSE:To improve a driving duty of a non-linear element, by forming an insulating film in the non-linear element consisting of a metal-an insulating film-a metal, with an Si oxide film obtained by oxidizing an Si layer. CONSTITUTION:An island 51 of a metallic film of Ta, etc. is formed on a glass substrate 50. Subsequently, an Si film 52 of about 100-300Angstrom is formed by low temperature deposition of the spatter and plasma CVD method, and after that, this Si film 52 is oxidized. As for the oxidizing method, for instance, oxidation is performed in a plasma state by leading O2 gas of about 0.1-10Torrs into a vacuum chamber. As for other method, anodic oxidation can be executed by applying voltage of about 100V in a solution of citric acid, etc. Subsequently, a metallic layer 54 of the upper part is formed, and a non-linear element consisting of a metal-an insulating film-a metal is obtained. In this way, an Si film is formed on the metallic fil of Ta, etc. at first, and subsequently, this Si film is oxidized, by which an Si oxide film which is excellent in its film quality is obtained.
JP56080243A 1981-05-27 1981-05-27 Non-linear element Granted JPS57195218A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56080243A JPS57195218A (en) 1981-05-27 1981-05-27 Non-linear element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56080243A JPS57195218A (en) 1981-05-27 1981-05-27 Non-linear element

Publications (2)

Publication Number Publication Date
JPS57195218A true JPS57195218A (en) 1982-11-30
JPH0210923B2 JPH0210923B2 (en) 1990-03-12

Family

ID=13712878

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56080243A Granted JPS57195218A (en) 1981-05-27 1981-05-27 Non-linear element

Country Status (1)

Country Link
JP (1) JPS57195218A (en)

Also Published As

Publication number Publication date
JPH0210923B2 (en) 1990-03-12

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