JPH06330349A - Colored ti plated material - Google Patents

Colored ti plated material

Info

Publication number
JPH06330349A
JPH06330349A JP11609693A JP11609693A JPH06330349A JP H06330349 A JPH06330349 A JP H06330349A JP 11609693 A JP11609693 A JP 11609693A JP 11609693 A JP11609693 A JP 11609693A JP H06330349 A JPH06330349 A JP H06330349A
Authority
JP
Japan
Prior art keywords
plating
plating layer
colored
layer
color
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP11609693A
Other languages
Japanese (ja)
Inventor
Makoto Terada
誠 寺田
Atsushi Kato
淳 加藤
Atsushi Kihara
敦史 木原
Kuniyasu Araga
邦康 荒賀
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kobe Steel Ltd
Original Assignee
Kobe Steel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kobe Steel Ltd filed Critical Kobe Steel Ltd
Priority to JP11609693A priority Critical patent/JPH06330349A/en
Publication of JPH06330349A publication Critical patent/JPH06330349A/en
Withdrawn legal-status Critical Current

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  • Physical Vapour Deposition (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)

Abstract

PURPOSE:To color a Ti plated material with excellent designability by successively forming an insulating layer and a Ti plating layer on a metallic substrate and allowing the surface of the Ti plating layer to develop a color by anodic oxidation. CONSTITUTION:An insulating layer 2 and a Ti plating layer 3 are successively formed on a metallic substrate 1. The surface of the Ti plating layer 3 is anodically oxidized to form an oxidized film 4 and a color is developed. Any layer capable of inhibiting the transfer of electrons between the plating layer 3 and the substrate 1 may be used as the insulating layer 2. The pref. thickness of the Ti plating layer 3 is >=0.1mum. The metallic substrate 1 is not subjected to restriction at all. At the time of the anodic oxidation, corrosion can be inhibited.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は意匠性に優れた着色Ti
めっき材に関するものであり、本発明に係る着色Tiめ
っき材は、装飾品、建築材料、家庭用電化製品など広範
な用途に使用可能である。
BACKGROUND OF THE INVENTION The present invention relates to a colored Ti excellent in designability.
The present invention relates to a plated material, and the colored Ti plated material according to the present invention can be used in a wide range of applications such as ornaments, building materials, and household electric appliances.

【0002】[0002]

【従来の技術】Tiは軽く、強く、錆びにくいという特
性を有していることから、航空機器やエレクトロニクス
機器等の工業的製品ばかりでなく、装飾品、建築材料、
家電製品、スポーツ用品などの一般民生用製品等にも利
用されている。またTiは、表面を着色させることによ
って一層高い意匠性を付与することが可能であり、その
色は他の着色金属材に比べて極めて彩度が高く、色調が
豊富であるため、更に利用範囲が拡大している。Tiの
着色法としては、陽極酸化法、大気酸化法及び酸化性浴
への浸漬法等がある。
2. Description of the Related Art Since Ti is light, strong and resistant to rust, it can be used not only in industrial products such as aviation equipment and electronic equipment, but also in ornaments, building materials,
It is also used for consumer products such as home appliances and sports equipment. Further, Ti can be given a higher design property by coloring the surface, and its color is extremely high in saturation and rich in color tone compared to other colored metal materials, so the range of use is further Is expanding. Examples of the Ti coloring method include an anodic oxidation method, an atmospheric oxidation method, and an immersion method in an oxidizing bath.

【0003】陽極酸化法はTiを陽極にして、硝酸又は
リン酸浴中で定電圧電解することによって酸化皮膜を生
成させる方法であり、色調の種類や彩やかさ(高彩度)
及び色調制御の容易性などの点から最も汎用されている
方法である。更には陽極酸化法は常温で電解することが
可能であるため熱による材質等の劣化が少なく、基板の
種類に制限がないという利点がある。
The anodic oxidation method is a method in which Ti is used as an anode and a constant voltage electrolysis is carried out in a nitric acid or phosphoric acid bath to form an oxide film, and the kind of color tone and colorfulness (high saturation) are obtained.
It is the most widely used method in terms of easiness of color tone control. Further, the anodic oxidation method has advantages that it is possible to electrolyze at room temperature, so that deterioration of materials and the like due to heat is small and there is no limitation on the type of substrate.

【0004】一方、大気酸化法及び酸化性浴への浸漬法
は酸化性雰囲気でTiの酸化皮膜を生成させる方法であ
るが、この方法は熱による材質等の劣化が懸念され、ま
た色調の多様性、彩やかさ、色調制御の容易性などの点
で陽極酸化法に劣る。さらに表面処理によって意匠性を
付与する方法として、TiCやTiCNといった有色め
っきを基板上に析出させるイオンプレーティング法等が
あるが、色が金色やブロンズ色に限定され、陽極酸化法
で得られる様な色調の種類が得られない。
On the other hand, the atmospheric oxidation method and the immersion method in an oxidizing bath are methods of forming a Ti oxide film in an oxidizing atmosphere. However, this method is concerned about deterioration of the material due to heat and has a variety of color tones. It is inferior to the anodic oxidation method in terms of properties, color and opacity, and easy control of color tone. Further, as a method of imparting a design property by surface treatment, there is an ion plating method or the like in which a colored plating such as TiC or TiCN is deposited on a substrate, but the color is limited to gold or bronze, and it can be obtained by an anodizing method I can't get different kinds of colors.

【0005】次に一般的な陽極酸化法について説明す
る。図2は代表的な陽極酸化法によるTiの着色フロー
を示す図である。まずTi板を脱脂して圧延油を除去し
た後、酸洗を行う。この酸洗は2回に分けて実施し、一
次酸洗は弗酸水溶液、二次酸洗は弗酸・過酸化水素混合
溶液を使用する。
Next, a general anodic oxidation method will be described. FIG. 2 is a diagram showing a Ti coloring flow by a typical anodic oxidation method. First, the Ti plate is degreased to remove rolling oil, and then pickled. This pickling is carried out in two steps. A hydrofluoric acid aqueous solution is used for the primary pickling, and a hydrofluoric acid / hydrogen peroxide mixed solution is used for the secondary pickling.

【0006】続いて、陽極酸化によりTiを着色する。
陽極酸化では電解液に1wt%リン酸水溶液を使用し、
Al板を陰極、Ti板を陽極として定電圧電解を行い、
これによりTi表面に酸化皮膜を成長させる。このとき
の電解電圧の上昇に伴って酸化皮膜の膜厚が厚くなる。
即ち膜厚は、電圧により制御できる。
Then, Ti is colored by anodic oxidation.
In anodic oxidation, a 1 wt% phosphoric acid aqueous solution is used as the electrolyte,
Constant voltage electrolysis was performed using the Al plate as the cathode and the Ti plate as the anode.
Thereby, an oxide film is grown on the Ti surface. At this time, the film thickness of the oxide film increases as the electrolytic voltage increases.
That is, the film thickness can be controlled by the voltage.

【0007】Tiの発色は酸化皮膜表面における干渉作
用によって起こり、その酸化皮膜の膜厚に対応して黄金
色,茶色,青色,黄色,紫色,緑色,黄緑色,桃色等、
多彩な色を発色する。この様にTiの色調は、酸化皮膜
の厚さ、即ち陽極酸化電圧によって決定されるため、色
調の制御が容易である。
The coloration of Ti occurs due to the interference effect on the surface of the oxide film, which corresponds to the thickness of the oxide film, such as golden, brown, blue, yellow, purple, green, yellow-green, and pink.
It produces a wide variety of colors. As described above, the color tone of Ti is determined by the thickness of the oxide film, that is, the anodic oxidation voltage, so that the color tone can be easily controlled.

【0008】ところで、Tiは高価な素材であるため、
近年は基材として安価な材料を用いてその表面にTiめ
っきおよび着色処理を施すことにより、着色Tiの有す
る耐食性,耐摩耗性,意匠性等を活かしつつ、製品価格
を下げたTiめっき材の製造が望まれている。
By the way, since Ti is an expensive material,
In recent years, by using an inexpensive material as a base material and subjecting its surface to Ti plating and coloring treatment, it is possible to make use of the corrosion resistance, abrasion resistance, designability, etc. of colored Ti while reducing the product price of Ti plated materials. Manufacturing is desired.

【0009】Tiめっきの一般的な方法としては、真空
蒸着法、イオンプレーティング法、スパッタリング法、
CVD法などのいわゆる蒸着法、言いかえればドライコ
ーティング法が用いられている。他に、常温あるいは高
温のTi溶融浴中で電解することによっても得られる
が、このTiの溶融浴では、不活性ガス中で処理しなけ
れば酸化されるため、処理浴雰囲気を不活性ガスで置換
する必要がある。従って大面積の処理を行うことができ
ないという問題、あるいは処理速度が遅いため生産性に
劣る等の問題があり、あまり採用されていない。尚、通
常の水溶液からの電気めっきではTiを被処理体に析出
できない。
As a general method of Ti plating, a vacuum deposition method, an ion plating method, a sputtering method,
A so-called vapor deposition method such as a CVD method, in other words, a dry coating method is used. Alternatively, it can be obtained by electrolysis in a Ti molten bath at room temperature or high temperature. However, in this Ti molten bath, if it is not treated in an inert gas, it will be oxidized. Need to be replaced. Therefore, there is a problem that processing of a large area cannot be performed, or a problem that productivity is poor due to a slow processing speed, and it is not often adopted. Incidentally, Ti cannot be deposited on the object to be treated by electroplating from a normal aqueous solution.

【0010】[0010]

【発明が解決しようとする課題】ところで、上記蒸着法
によって得られためっき層には、基板にまで通じるピン
ホールが不可避的に存在する。そしてこのめっき層上
に、前記陽極酸化法による処理を行った場合、定電圧電
解の際にこのピンホール部において基板が腐食し、良好
な外観が得られないという問題があった。尚このめっき
層のピンホールを蒸着法によって完全になくすことは不
可能である。
By the way, in the plating layer obtained by the vapor deposition method, there is inevitably a pinhole which extends to the substrate. When the anodizing method is applied to the plated layer, the substrate is corroded in the pinhole portion during constant voltage electrolysis, and a good appearance cannot be obtained. Incidentally, it is impossible to completely eliminate the pinholes in this plating layer by the vapor deposition method.

【0011】この発明は以上の様な事情に鑑みてなされ
たものであって、耐食性、耐摩耗性を有する安価なTi
めっき材に腐食なく陽極酸化を施して、多彩な色調を有
する着色Tiめっき材を得ることを目的とする。
The present invention has been made in view of the above circumstances, and is inexpensive Ti having corrosion resistance and wear resistance.
The purpose is to obtain a colored Ti plated material having various color tones by subjecting the plated material to anodization without corrosion.

【0012】[0012]

【課題を解決するための手段】本発明に係る着色Tiめ
っき材は、金属基体とTiめっき層の間に絶縁体を配
し、これを陽極酸化法にて着色したものである。
The colored Ti plating material according to the present invention is one in which an insulator is arranged between a metal base and a Ti plating layer, and this is colored by an anodic oxidation method.

【0013】[0013]

【作用】以下、本発明を作用と共に詳述する。例えば冷
延鋼板にTiを蒸着し、これに陽極酸化を施すと、Ti
めっき層にピンホールがあるため、ここから基板がアノ
ード腐食し、素地鋼板の腐食が促進される。そこで本願
発明者らはTiめっき層と金属基体との間に、電子の移
動を抑える皮膜(絶縁体)を設けるたところ、アノード
腐食の抑制に顕著な効果があることを見い出し、本発明
に至った。
The operation of the present invention will be described in detail below. For example, if Ti is vapor-deposited on a cold-rolled steel sheet and anodized, Ti
Since there are pinholes in the plating layer, the substrate undergoes anodic corrosion from here, which promotes the corrosion of the base steel sheet. Therefore, the inventors of the present application found that a film (insulator) that suppresses the movement of electrons was provided between the Ti plating layer and the metal substrate, and that it had a remarkable effect on the suppression of anodic corrosion, leading to the present invention. It was

【0014】図1は本発明に係る着色Tiめっき材を示
す断面図の例であり、金属基体1上に絶縁層2を配し、
その上にTiめっき層3を形成し、陽極酸化を行って酸
化皮膜4を形成して発色させている。上記絶縁層2とし
ては、めっき層3と金属基体1との間の電子の移動を抑
制できるものであれば何でもよく、有機質絶縁層、無機
質絶縁層の如何を問わない。また有機質絶縁層のひとつ
である有機質塗膜中に各種顔料を含有させたものであっ
てもよい。
FIG. 1 is an example of a sectional view showing a colored Ti plating material according to the present invention, in which an insulating layer 2 is arranged on a metal substrate 1,
A Ti plating layer 3 is formed thereon, and anodic oxidation is performed to form an oxide film 4 for color development. The insulating layer 2 may be anything as long as it can suppress the movement of electrons between the plating layer 3 and the metal substrate 1, and may be an organic insulating layer or an inorganic insulating layer. Further, an organic coating film, which is one of the organic insulating layers, may contain various pigments.

【0015】有機質絶縁層を配する方法としては、基板
上への塗布により塗膜を形成する方法や、樹脂フィルム
を積層する方法等がある。無機質絶縁層としてはセラミ
ックス層等がよく、無機質絶縁層を配する方法として
は、例えば、水ガラスを塗布、乾燥させてSiO2 層を
形成させる方法等がある。絶縁層2の厚さとしては、T
iめっき層3のピンホールを通じて素地が露出すること
を防止するために、0.2μm以上であることが望まし
い。
As a method of disposing the organic insulating layer, there are a method of forming a coating film by coating on a substrate, a method of laminating a resin film, and the like. As the inorganic insulating layer, a ceramic layer or the like is preferable, and as a method of disposing the inorganic insulating layer, for example, there is a method of forming water glass to form a SiO 2 layer. The thickness of the insulating layer 2 is T
The thickness is preferably 0.2 μm or more in order to prevent the base material from being exposed through the pinholes in the i-plated layer 3.

【0016】なお、Tiめっき層3の厚さは、基板表面
を十分被覆して、かつ酸洗、陽極酸化によっても被覆が
損なわれないために、0.1μm以上であることが好ま
しく、より好ましくは0.5μm以上である。上限は、
応力増大に起因するめっき密着性の劣化を防止するた
め、10μm以下が好ましく、またいたずらに厚いTi
層3を付与することは経済性を悪化させるのみである。
The thickness of the Ti plating layer 3 is preferably 0.1 μm or more, more preferably 0.1 μm or more so that the surface of the substrate is sufficiently covered and the coating is not damaged by pickling and anodic oxidation. Is 0.5 μm or more. The upper limit is
In order to prevent the deterioration of the plating adhesion caused by the increase in stress, the thickness is preferably 10 μm or less, and is unnecessarily thick
Providing layer 3 only worsens economics.

【0017】また、Tiめっき層3を形成する方法とし
ては、生産性の観点から、高エネルギーの電子ビームを
使用したドライコーティング法が望ましい。この方法
は、Ti原料をるつぼ内に入れ、表面を電子線で加熱し
て蒸発させ基板上に蒸着させるものであり、この電子線
の出力をコントロールすることにより、Tiの蒸着速度
及び蒸着厚さを変更することが可能である。
As a method for forming the Ti plating layer 3, a dry coating method using a high energy electron beam is desirable from the viewpoint of productivity. In this method, a Ti raw material is placed in a crucible, the surface is heated by an electron beam to be evaporated and vapor-deposited on a substrate. By controlling the output of this electron beam, the vapor deposition rate and vapor deposition thickness of Ti Can be changed.

【0018】金属基体1の材料としては、何等限定され
るものではなく、軟鋼、ステンレス鋼、Al、Al合
金、Cu、Cu合金等が挙げられ、その表面にZn、Z
n−Ni等のめっきが施されたものであってもよい。ま
た金属基体1の形状は、板、棒、型材等、何等制限され
るものではない。
The material of the metal substrate 1 is not particularly limited, and examples thereof include mild steel, stainless steel, Al, Al alloys, Cu, Cu alloys, and the like, and Zn, Z on the surface thereof.
It may be plated with n-Ni or the like. Further, the shape of the metal substrate 1 is not limited to a plate, a rod, a mold material, or the like.

【0019】陽極酸化法によりTiを着色するに当って
は、Tiめっき層3と金属基体1との間が絶縁されてい
るため、通電はTiめっき層3に行うとよい。また本発
明の着色Tiめっき材の着色層表面に、更に疵付防止等
の目的でクリアー塗装を行ってもよい。
When Ti is colored by the anodic oxidation method, the Ti plating layer 3 and the metal substrate 1 are electrically insulated from each other, so that the Ti plating layer 3 is preferably energized. Further, the surface of the colored layer of the colored Ti-plated product of the present invention may be subjected to clear coating for the purpose of preventing scratches.

【0020】[0020]

【実施例】以下に本発明の実施例を示すが、下記実施例
は本発明を制限するものではなく、前後記の趣旨の範囲
内で変更することは全て本発明の技術範囲に包含され
る。
EXAMPLES Examples of the present invention will be shown below, but the following examples are not intended to limit the present invention, and all modifications within the scope of the spirit of the invention are included in the technical scope of the present invention. .

【0021】金属基体1として市販の鋼板を用いた。該
鋼板は厚さ0.5mmのAlキルド鋼板に電気Znめっき
を目付量20g/m2 で施したものである。この表面に
絶縁層2として高加工用塗料を下記の条件でダブルコー
トした。
A commercially available steel plate was used as the metal substrate 1. The steel sheet is an Al-killed steel sheet having a thickness of 0.5 mm and electro-Zn plated at a basis weight of 20 g / m 2 . A coating for high processing was double-coated on this surface as an insulating layer 2 under the following conditions.

【0022】下塗り・ポリエステル系塗料(日本油脂株
式会社製の「4130NUプライマー」) ・ドライ膜厚…5μm ・焼付け条件…488K×40s 上塗り・ポリエステル系塗料(日本油脂株式会社製の
「4130ホワイト」) ・ドライ膜厚…17μm ・焼付け条件…503K×60s
Undercoat-Polyester paint ("4130NU Primer" manufactured by NOF Corporation) -Dry film thickness ... 5μm-Baking conditions ... 488K x 40s Topcoat-Polyester paint ("4130 White" manufactured by NOF Corporation)・ Dry film thickness… 17μm ・ Baking conditions… 503K × 60s

【0023】次に上記コートを形成した鋼板を幅150
mm×長さ150mmのサイズに切断してこれをめっき基板
とし、真空蒸着法にてTiをめっきした。この真空蒸着
法においては、バッチ式の真空蒸着装置を用い、圧力約
5×10-3Paの真空中で、赤外線加熱により予め37
3Kに上記めっき基板を昇温させておき、そしてるつぼ
に入れたTi原料を電子線照射することにより気化させ
て、めっき基板に蒸着させた。めっき膜厚は、0.5μ
m:一定として、めっき基板の隣接部に水晶振動子を用
いた膜厚センサーを設けてモニターし、めっき時間で制
御した。
Next, the steel sheet having the above-mentioned coating is applied to a width of 150.
mm was cut into a size of 150 mm in length, and this was used as a plating substrate, and Ti was plated by a vacuum deposition method. In this vacuum vapor deposition method, a batch type vacuum vapor deposition apparatus is used, and the temperature is set to 37 in advance by infrared heating in a vacuum having a pressure of about 5 × 10 −3 Pa.
The temperature of the plated substrate was raised to 3K, and the Ti raw material placed in the crucible was irradiated with an electron beam to be vaporized and vapor-deposited on the plated substrate. Plating film thickness is 0.5μ
m: With a constant value, a film thickness sensor using a crystal oscillator was provided in the adjacent portion of the plating substrate for monitoring, and the plating time was controlled.

【0024】一方、比較例としてAlキルド鋼板および
SUS304に、Tiを直接蒸着しためっき鋼板を供試
した。めっき鋼板を作製する際には、めっき密着性を確
保するために、めっき前板温を573Kの高温に設定
し、他は上記と同様にしてめっきを施した。
On the other hand, as a comparative example, an Al killed steel sheet and a SUS304 plated steel sheet in which Ti was directly vapor deposited were tested. When producing a plated steel sheet, the plate temperature before plating was set to a high temperature of 573K in order to secure the plating adhesion, and the plating was performed in the same manner as above.

【0025】次に上記実施例および比較例の各供試材に
着色を行った。着色法としては、まず上記各供試材の端
面および裏面をテフロンテープでシールすることにより
絶縁し、その後、室温の0.6vol%HF+10vo
l%H22 中で3分酸洗した。そしてイオン交換水で
水洗し、乾燥した。その後、20℃±2℃の1wt%H
3 PO4 浴中で、アルミニウム板を陰極、供試材を陽極
として、0.5A/dm2 以下で定電圧電解した。尚所
定の色になるように、下記表1に示す電圧に各々調整し
た。
Next, each of the test materials of the above Examples and Comparative Examples was colored. As the coloring method, first, the end face and the back face of each of the above-mentioned test materials are insulated by sealing with Teflon tape, and then 0.6 vol% HF + 10 vo at room temperature.
It was pickled in 1% H 2 O 2 for 3 minutes. Then, it was washed with ion-exchanged water and dried. After that, 1 wt% H at 20 ° C ± 2 ° C
In a 3 PO 4 bath, constant voltage electrolysis was performed at 0.5 A / dm 2 or less using an aluminum plate as a cathode and a test material as an anode. The voltages were adjusted to the voltages shown in Table 1 below so as to obtain a predetermined color.

【0026】得られた供試材について目視により点状錆
の個数を測定し、また外観色を目視観察した。この評価
結果を表1に示す。尚、表中 ○:目視による点状錆の個数が1個/dm2 未満 △:目視による点状錆の個数が1個/dm2 以上50個
/dm2 未満 ×:目視による点状錆の個数が50個/dm2 以上 である。
The number of spot rust was visually determined on the obtained test material, and the appearance color was visually observed. The evaluation results are shown in Table 1. In the table, ◯: The number of visually spotted rusts is less than 1 / dm 2 Δ: The number of visually spotted rusts is 1 / dm 2 or more and less than 50 / dm 2 ×: Of visually spotted rust The number is 50 / dm 2 or more.

【0027】[0027]

【表1】 [Table 1]

【0028】表1から明らかなように、本発明の規定条
件を満たす実施例(No. 1,2,3)では、いずれの供
試材も優れた外観および意匠性が得られた。これに対
し、比較例であるAlキルド鋼板(No. 4,5,6,
7)は点状錆の個数が多く、錆が全面を覆っていた。S
US304(No. 8,9,10,11)も点状錆が多か
った。通常同じ電圧では、同じ色が得られるはずである
が、点状錆の発生により、同じ電圧でも色が異なり、茶
色がかった色になった。また、鶯色を得るためには、茶
色や黄色が得られる酸化皮膜厚さよりも厚くする必要が
あるが、電解電圧を上げることが必要となるが、比較例
では電解電圧の高まりによって点状錆がサンプル全体を
覆うようになり、意匠性が大幅に劣るものとなった。
As is clear from Table 1, in the examples (Nos. 1, 2, 3) satisfying the specified conditions of the present invention, all the test materials had excellent appearance and design. On the other hand, an Al killed steel sheet (No. 4, 5, 6, 6) which is a comparative example.
In 7), the number of point rusts was large, and the rust covered the entire surface. S
US304 (No. 8, 9, 10, 11) also had many point rusts. Normally, the same color should be obtained at the same voltage, but due to the generation of spot-like rust, the color was different even at the same voltage, resulting in a brownish color. Further, in order to obtain a rainbow color, it is necessary to make the oxide film thicker than brown or yellow, but it is necessary to increase the electrolysis voltage. Became to cover the entire sample, and the designability was greatly deteriorated.

【0029】[0029]

【発明の効果】本発明は以上の様にTiめっき層と金属
基体との間に、塗装あるいは樹脂フィルム等の絶縁層を
設けたので、陽極酸化時の腐食が抑えられることとな
り、安価なTiめっき材に優れた意匠性を有する着色を
施すことができるという効果がある。
As described above, according to the present invention, since an insulating layer such as a coating or a resin film is provided between the Ti plating layer and the metal substrate, corrosion at the time of anodic oxidation can be suppressed, and inexpensive Ti can be obtained. There is an effect that the plated material can be colored with excellent design.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に係る着色Tiめっき材の例を示す断面
図。
FIG. 1 is a sectional view showing an example of a colored Ti plated material according to the present invention.

【図2】代表的な陽極酸化法によるTiの着色フローを
示す図。
FIG. 2 is a diagram showing a Ti coloring flow by a typical anodizing method.

【符号の説明】[Explanation of symbols]

1 金属基体 2 絶縁層 3 Tiめっき層 4 酸化皮膜 1 Metal Substrate 2 Insulating Layer 3 Ti Plating Layer 4 Oxide Film

───────────────────────────────────────────────────── フロントページの続き (72)発明者 木原 敦史 兵庫県加古川市尾上町池田字池田開拓2222 番地1 株式会社神戸製鋼所加古川研究地 区内 (72)発明者 荒賀 邦康 兵庫県加古川市尾上町池田字池田開拓2222 番地1 株式会社神戸製鋼所加古川研究地 区内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Atsushi Kihara 2222 Ikeda, Ikeda, Igami, Onoue-cho, Kakogawa-shi, Hyogo Pref., Kakogawa Research Area, Kobe Steel Co., Ltd. (72) Kuniyasu Araga Oue-cho, Kakogawa-shi, Hyogo Ikeda character Ikeda development 2222 Address 1 Kakogawa Research Area, Kobe Steel, Ltd.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 金属基体上に絶縁層が配され、さらにそ
の上にTiめっき層を有し、該Tiめっき層の最表面が
陽極酸化法により発色されていることを特徴とする着色
Tiめっき材。
1. A colored Ti plating characterized in that an insulating layer is arranged on a metal substrate, and a Ti plating layer is further formed on the insulating layer, and the outermost surface of the Ti plating layer is colored by an anodic oxidation method. Material.
JP11609693A 1993-05-18 1993-05-18 Colored ti plated material Withdrawn JPH06330349A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11609693A JPH06330349A (en) 1993-05-18 1993-05-18 Colored ti plated material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11609693A JPH06330349A (en) 1993-05-18 1993-05-18 Colored ti plated material

Publications (1)

Publication Number Publication Date
JPH06330349A true JPH06330349A (en) 1994-11-29

Family

ID=14678611

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11609693A Withdrawn JPH06330349A (en) 1993-05-18 1993-05-18 Colored ti plated material

Country Status (1)

Country Link
JP (1) JPH06330349A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100288653B1 (en) * 1998-07-16 2001-05-02 이지환 How to color glass using titanium deposition
JP2009132996A (en) * 2007-11-07 2009-06-18 Dainippon Printing Co Ltd Heat resistant insulating substrate, and method for producing the same
CN102540847A (en) * 2010-12-16 2012-07-04 精工电子有限公司 Part, timepiece, and manufacturing method of part
CN115896731A (en) * 2022-12-06 2023-04-04 等离子体装备科技(广州)有限公司 Preparation process and processing equipment for metal shell of electronic equipment

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100288653B1 (en) * 1998-07-16 2001-05-02 이지환 How to color glass using titanium deposition
JP2009132996A (en) * 2007-11-07 2009-06-18 Dainippon Printing Co Ltd Heat resistant insulating substrate, and method for producing the same
CN102540847A (en) * 2010-12-16 2012-07-04 精工电子有限公司 Part, timepiece, and manufacturing method of part
CN115896731A (en) * 2022-12-06 2023-04-04 等离子体装备科技(广州)有限公司 Preparation process and processing equipment for metal shell of electronic equipment
CN115896731B (en) * 2022-12-06 2024-01-12 等离子体装备科技(广州)有限公司 Preparation process and processing equipment for metal shell of electronic equipment

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