JPS57186330A - Removing method for photoresist - Google Patents
Removing method for photoresistInfo
- Publication number
- JPS57186330A JPS57186330A JP7107581A JP7107581A JPS57186330A JP S57186330 A JPS57186330 A JP S57186330A JP 7107581 A JP7107581 A JP 7107581A JP 7107581 A JP7107581 A JP 7107581A JP S57186330 A JPS57186330 A JP S57186330A
- Authority
- JP
- Japan
- Prior art keywords
- film
- resist
- mask
- short time
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7107581A JPS57186330A (en) | 1981-05-12 | 1981-05-12 | Removing method for photoresist |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7107581A JPS57186330A (en) | 1981-05-12 | 1981-05-12 | Removing method for photoresist |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57186330A true JPS57186330A (en) | 1982-11-16 |
JPS6222263B2 JPS6222263B2 (ja) | 1987-05-16 |
Family
ID=13450033
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7107581A Granted JPS57186330A (en) | 1981-05-12 | 1981-05-12 | Removing method for photoresist |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57186330A (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0294911A (ja) * | 1988-09-30 | 1990-04-05 | Toshiba Corp | 弾性表面波素子の製造方法 |
JP2003151951A (ja) * | 2001-11-15 | 2003-05-23 | Tokyo Electron Ltd | 基板処理方法および基板処理装置 |
CN110571138A (zh) * | 2018-06-05 | 2019-12-13 | 中芯国际集成电路制造(上海)有限公司 | 半导体器件的制作方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4914682A (ja) * | 1972-06-05 | 1974-02-08 | ||
JPS5021681A (ja) * | 1973-05-24 | 1975-03-07 | ||
JPS52100234A (en) * | 1976-02-19 | 1977-08-23 | Sony Corp | Stripping solution of photosolubilizable light sensitive resin |
JPS5336363A (en) * | 1976-09-14 | 1978-04-04 | Matsushita Electric Works Ltd | Electric razor |
-
1981
- 1981-05-12 JP JP7107581A patent/JPS57186330A/ja active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4914682A (ja) * | 1972-06-05 | 1974-02-08 | ||
JPS5021681A (ja) * | 1973-05-24 | 1975-03-07 | ||
JPS52100234A (en) * | 1976-02-19 | 1977-08-23 | Sony Corp | Stripping solution of photosolubilizable light sensitive resin |
JPS5336363A (en) * | 1976-09-14 | 1978-04-04 | Matsushita Electric Works Ltd | Electric razor |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0294911A (ja) * | 1988-09-30 | 1990-04-05 | Toshiba Corp | 弾性表面波素子の製造方法 |
JP2003151951A (ja) * | 2001-11-15 | 2003-05-23 | Tokyo Electron Ltd | 基板処理方法および基板処理装置 |
JP4678665B2 (ja) * | 2001-11-15 | 2011-04-27 | 東京エレクトロン株式会社 | 基板処理方法および基板処理装置 |
CN110571138A (zh) * | 2018-06-05 | 2019-12-13 | 中芯国际集成电路制造(上海)有限公司 | 半导体器件的制作方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6222263B2 (ja) | 1987-05-16 |
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