JPS57155381A - Wet etching method - Google Patents
Wet etching methodInfo
- Publication number
- JPS57155381A JPS57155381A JP4144081A JP4144081A JPS57155381A JP S57155381 A JPS57155381 A JP S57155381A JP 4144081 A JP4144081 A JP 4144081A JP 4144081 A JP4144081 A JP 4144081A JP S57155381 A JPS57155381 A JP S57155381A
- Authority
- JP
- Japan
- Prior art keywords
- resist film
- etching
- film
- pattern
- minute
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- ing And Chemical Polishing (AREA)
- Weting (AREA)
Abstract
PURPOSE: To enable to etch precisely a minute pattern, by activating the resist film with alcoholic gas plasma before immersing it in an etching liquid when wet-etching the insulation film on the semiconductor substrate using the resist film.
CONSTITUTION: A insulation film 2 is formed in the principal face of a semiconductor substrate 1 and covered with a resist film 3 having a window 3a. Then, the surface activation of the resist film 3 is performed by exposing to alcoholic gas plasma. Differently from the surface activation which is performed by immersion in the surface activating agent the resist film is formed by the positive type resist agent which forms easily a minute pattern. Also, by performing wet-etching, immersing the resist film in the etching liquid 5 after the surface activating treatment, the bubble does not generate even at the minute window part and the precise etching treatment can be done after the pattern.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4144081A JPS57155381A (en) | 1981-03-19 | 1981-03-19 | Wet etching method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4144081A JPS57155381A (en) | 1981-03-19 | 1981-03-19 | Wet etching method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57155381A true JPS57155381A (en) | 1982-09-25 |
Family
ID=12608426
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4144081A Pending JPS57155381A (en) | 1981-03-19 | 1981-03-19 | Wet etching method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57155381A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0304068A2 (en) * | 1987-08-19 | 1989-02-22 | Fujitsu Limited | Removing resist layers |
-
1981
- 1981-03-19 JP JP4144081A patent/JPS57155381A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0304068A2 (en) * | 1987-08-19 | 1989-02-22 | Fujitsu Limited | Removing resist layers |
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