JPS54142077A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS54142077A JPS54142077A JP5042078A JP5042078A JPS54142077A JP S54142077 A JPS54142077 A JP S54142077A JP 5042078 A JP5042078 A JP 5042078A JP 5042078 A JP5042078 A JP 5042078A JP S54142077 A JPS54142077 A JP S54142077A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- side wall
- ion
- substrate
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electrodes Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Weting (AREA)
Abstract
PURPOSE: To ensure a uniform thickness of the electrode metal layer provided on the side wall of the substrate by drilling a window on the semiconductor substrate after coating the insulator film and accelerating the etching speed for the side wall of the window by irradiation of the inactive atom ion on the entire surface in order to secure a smooth side wall by etching.
CONSTITUTION: SiO2 film 8 is coated on Si substrate 7 and then covered with photo resist layer 9, and layer 9 is given patterning with a fixed width. Then layer 9 is used as the mask to etch exposed film 8 via the plasma using the Freon gas, and a right-angled and sharp window is drilled to substrate 7. Afrer this, layer 9 is removed with irradiation of Ar+ ion over the entire surface, and then an etching is applied with the mixture solution of hydrofluoric acid, ammonium fluoride and water. As a result, the etching speed is accelerated for film 7 owing to irradiation of the ion and the ion splash. As a result, the side wall is rounded. After this, Al layer 12 for electrode wiring is coated on the entire surface, thus ensuring a uniform thickness for layer 12.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5042078A JPS54142077A (en) | 1978-04-27 | 1978-04-27 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5042078A JPS54142077A (en) | 1978-04-27 | 1978-04-27 | Manufacture of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS54142077A true JPS54142077A (en) | 1979-11-05 |
Family
ID=12858364
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5042078A Pending JPS54142077A (en) | 1978-04-27 | 1978-04-27 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54142077A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5789243A (en) * | 1980-11-26 | 1982-06-03 | Seiko Epson Corp | Fabrication of semiconductor device |
JPS57204151A (en) * | 1981-06-09 | 1982-12-14 | Nec Corp | Manufacture of semiconductor device |
JP2006043141A (en) * | 2004-08-04 | 2006-02-16 | Katsushika:Kk | Applicator for makeup |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5494281A (en) * | 1978-01-10 | 1979-07-25 | Toshiba Corp | Production of semiconductor device |
-
1978
- 1978-04-27 JP JP5042078A patent/JPS54142077A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5494281A (en) * | 1978-01-10 | 1979-07-25 | Toshiba Corp | Production of semiconductor device |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5789243A (en) * | 1980-11-26 | 1982-06-03 | Seiko Epson Corp | Fabrication of semiconductor device |
JPS57204151A (en) * | 1981-06-09 | 1982-12-14 | Nec Corp | Manufacture of semiconductor device |
JPS6312382B2 (en) * | 1981-06-09 | 1988-03-18 | Nippon Electric Co | |
JP2006043141A (en) * | 2004-08-04 | 2006-02-16 | Katsushika:Kk | Applicator for makeup |
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