JPS57186330A - Removing method for photoresist - Google Patents

Removing method for photoresist

Info

Publication number
JPS57186330A
JPS57186330A JP7107581A JP7107581A JPS57186330A JP S57186330 A JPS57186330 A JP S57186330A JP 7107581 A JP7107581 A JP 7107581A JP 7107581 A JP7107581 A JP 7107581A JP S57186330 A JPS57186330 A JP S57186330A
Authority
JP
Japan
Prior art keywords
film
resist
mask
short time
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7107581A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6222263B2 (enExample
Inventor
Seiji Ueda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp, Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electronics Corp
Priority to JP7107581A priority Critical patent/JPS57186330A/ja
Publication of JPS57186330A publication Critical patent/JPS57186330A/ja
Publication of JPS6222263B2 publication Critical patent/JPS6222263B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP7107581A 1981-05-12 1981-05-12 Removing method for photoresist Granted JPS57186330A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7107581A JPS57186330A (en) 1981-05-12 1981-05-12 Removing method for photoresist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7107581A JPS57186330A (en) 1981-05-12 1981-05-12 Removing method for photoresist

Publications (2)

Publication Number Publication Date
JPS57186330A true JPS57186330A (en) 1982-11-16
JPS6222263B2 JPS6222263B2 (enExample) 1987-05-16

Family

ID=13450033

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7107581A Granted JPS57186330A (en) 1981-05-12 1981-05-12 Removing method for photoresist

Country Status (1)

Country Link
JP (1) JPS57186330A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0294911A (ja) * 1988-09-30 1990-04-05 Toshiba Corp 弾性表面波素子の製造方法
JP2003151951A (ja) * 2001-11-15 2003-05-23 Tokyo Electron Ltd 基板処理方法および基板処理装置
CN110571138A (zh) * 2018-06-05 2019-12-13 中芯国际集成电路制造(上海)有限公司 半导体器件的制作方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4914682A (enExample) * 1972-06-05 1974-02-08
JPS5021681A (enExample) * 1973-05-24 1975-03-07
JPS52100234A (en) * 1976-02-19 1977-08-23 Sony Corp Stripping solution of photosolubilizable light sensitive resin
JPS5336363A (en) * 1976-09-14 1978-04-04 Matsushita Electric Works Ltd Electric razor

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4914682A (enExample) * 1972-06-05 1974-02-08
JPS5021681A (enExample) * 1973-05-24 1975-03-07
JPS52100234A (en) * 1976-02-19 1977-08-23 Sony Corp Stripping solution of photosolubilizable light sensitive resin
JPS5336363A (en) * 1976-09-14 1978-04-04 Matsushita Electric Works Ltd Electric razor

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0294911A (ja) * 1988-09-30 1990-04-05 Toshiba Corp 弾性表面波素子の製造方法
JP2003151951A (ja) * 2001-11-15 2003-05-23 Tokyo Electron Ltd 基板処理方法および基板処理装置
CN110571138A (zh) * 2018-06-05 2019-12-13 中芯国际集成电路制造(上海)有限公司 半导体器件的制作方法

Also Published As

Publication number Publication date
JPS6222263B2 (enExample) 1987-05-16

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