JPS57177144A - Method and device for exposure - Google Patents

Method and device for exposure

Info

Publication number
JPS57177144A
JPS57177144A JP56154059A JP15405981A JPS57177144A JP S57177144 A JPS57177144 A JP S57177144A JP 56154059 A JP56154059 A JP 56154059A JP 15405981 A JP15405981 A JP 15405981A JP S57177144 A JPS57177144 A JP S57177144A
Authority
JP
Japan
Prior art keywords
photoresist
gas
moisture
objective lens
space
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56154059A
Other languages
English (en)
Inventor
Yasuhiro Koizumi
Soichi Tsuuzawa
Gerutonaa Buarutaa
Deiitsu Gudourun
Rechike Buorufugangu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jenoptik AG
Hitachi Ltd
Original Assignee
Carl Zeiss Jena GmbH
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to DD81229475A priority Critical patent/DD160756A3/de
Application filed by Carl Zeiss Jena GmbH, Hitachi Ltd filed Critical Carl Zeiss Jena GmbH
Priority to JP56154059A priority patent/JPS57177144A/ja
Priority to DE19823214325 priority patent/DE3214325A1/de
Priority to GB8211674A priority patent/GB2100453B/en
Priority to FR8206998A priority patent/FR2504696B1/fr
Priority to CH2488/82A priority patent/CH651423A5/de
Priority to SU823431330A priority patent/SU1238274A1/ru
Priority to KR8201833A priority patent/KR860000158B1/ko
Priority to NL8201726A priority patent/NL8201726A/nl
Priority to IT8267548A priority patent/IT8267548A0/it
Publication of JPS57177144A publication Critical patent/JPS57177144A/ja
Priority to US06/779,832 priority patent/US4704348A/en
Pending legal-status Critical Current

Links

Classifications

    • A—HUMAN NECESSITIES
    • A44—HABERDASHERY; JEWELLERY
    • A44C—PERSONAL ADORNMENTS, e.g. JEWELLERY; COINS
    • A44C11/00—Watch chains; Ornamental chains
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
JP56154059A 1981-04-23 1981-09-30 Method and device for exposure Pending JPS57177144A (en)

Priority Applications (11)

Application Number Priority Date Filing Date Title
DD81229475A DD160756A3 (de) 1981-04-24 1981-04-24 Anordnung zur verbesserung fotochemischer umsetzungsprozesse in fotoresistschichten
JP56154059A JPS57177144A (en) 1981-04-24 1981-09-30 Method and device for exposure
DE19823214325 DE3214325A1 (de) 1981-04-24 1982-04-19 Verfahren und vorrichtung zur belichtung von fotoresists
GB8211674A GB2100453B (en) 1981-04-24 1982-04-22 Controlled exposure
CH2488/82A CH651423A5 (de) 1981-04-24 1982-04-23 Verfahren und vorrichtung zur belichtung von fotoresists.
FR8206998A FR2504696B1 (fr) 1981-04-24 1982-04-23 Procede et dispositif pour l'exposition a la lumiere de substances photosensibles, appelees photoresists
SU823431330A SU1238274A1 (ru) 1981-04-24 1982-04-23 Способ экспонировани фоторезиста и устройство дл его осуществлени
KR8201833A KR860000158B1 (ko) 1981-04-23 1982-04-23 감광성 내식막에 균일한 정제 패턴을 노출시키는 방법 및 장치
NL8201726A NL8201726A (nl) 1981-04-24 1982-04-26 Werkwijze en inrichting voor het belichten van een lichtgevoelige laag.
IT8267548A IT8267548A0 (it) 1981-04-24 1982-04-26 Procedimento ed apparecchiatura per l esposizione di uno strato di gelatina fotosensibile depositate su un substrato particolarmente per la fabbricazione di dispositivi elettronici a semiconduttori
US06/779,832 US4704348A (en) 1981-04-24 1985-09-25 Exposure of uniform fine pattern on photoresist

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DD81229475A DD160756A3 (de) 1981-04-24 1981-04-24 Anordnung zur verbesserung fotochemischer umsetzungsprozesse in fotoresistschichten
JP56154059A JPS57177144A (en) 1981-04-24 1981-09-30 Method and device for exposure

Publications (1)

Publication Number Publication Date
JPS57177144A true JPS57177144A (en) 1982-10-30

Family

ID=25747719

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56154059A Pending JPS57177144A (en) 1981-04-23 1981-09-30 Method and device for exposure

Country Status (11)

Country Link
US (1) US4704348A (ja)
JP (1) JPS57177144A (ja)
KR (1) KR860000158B1 (ja)
CH (1) CH651423A5 (ja)
DD (1) DD160756A3 (ja)
DE (1) DE3214325A1 (ja)
FR (1) FR2504696B1 (ja)
GB (1) GB2100453B (ja)
IT (1) IT8267548A0 (ja)
NL (1) NL8201726A (ja)
SU (1) SU1238274A1 (ja)

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JP2006528431A (ja) * 2003-07-21 2006-12-14 インテグリス・インコーポレーテッド リソグラフ投影装置、パージガス供給システムおよびガスパージ

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JPS5999722A (ja) * 1982-11-29 1984-06-08 Canon Inc 半導体焼付露光制御方法
DE3344280A1 (de) * 1982-12-21 1984-07-05 Texas Instruments Inc., Dallas, Tex. Verfahren zur herstellung einer halbleitervorrichtung und vorrichtung zur durchfuehrung des verfahrens
US4897337A (en) * 1983-01-19 1990-01-30 Tokyo Shibaura Denki Kabushiki Kaisha Method and apparatus for forming resist pattern
JPS59140451A (ja) * 1983-02-01 1984-08-11 Yutaka Mori 製版カメラに依る各種印刷版または明室用フイルム等の直接製版方法
DE3447488A1 (de) * 1984-10-19 1986-05-07 Canon K.K., Tokio/Tokyo Projektionseinrichtung
JPS63259663A (ja) * 1987-04-17 1988-10-26 Fuji Photo Film Co Ltd 画像記録装置
US4864356A (en) * 1987-04-21 1989-09-05 Brother Kogyo Kabushiki Kaisha Exposure device for image recording apparatus
US5073796A (en) * 1987-08-31 1991-12-17 Kabushiki Kaisha Toshiba Cooling system for an apparatus with a heat generating element therein
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EP0357423B1 (en) * 1988-09-02 1995-03-15 Canon Kabushiki Kaisha An exposure apparatus
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JPH03139634A (ja) * 1989-10-26 1991-06-13 Brother Ind Ltd 画像形成装置
US4989031A (en) * 1990-01-29 1991-01-29 Nikon Corporation Projection exposure apparatus
US5452052A (en) * 1992-03-25 1995-09-19 Matsushita Electric Industrial Co., Ltd. Apparatus for exposing chemically amplified resist
JPH0636993A (ja) * 1992-05-21 1994-02-10 Canon Inc 露光装置及び半導体素子の製造方法
US5696623A (en) * 1993-08-05 1997-12-09 Fujitsu Limited UV exposure with elongated service lifetime
JP3387075B2 (ja) * 1994-12-12 2003-03-17 株式会社ニコン 走査露光方法、露光装置、及び走査型露光装置
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US6645701B1 (en) * 1995-11-22 2003-11-11 Nikon Corporation Exposure method and exposure apparatus
JP4011643B2 (ja) * 1996-01-05 2007-11-21 キヤノン株式会社 半導体製造装置
JPH09218519A (ja) * 1996-02-09 1997-08-19 Nikon Corp 露光装置の環境制御方法及び装置
US6545746B1 (en) * 1996-03-04 2003-04-08 Nikon Corporation Projection exposure apparatus
KR100542414B1 (ko) * 1996-03-27 2006-05-10 가부시키가이샤 니콘 노광장치및공조장치
JP3689510B2 (ja) * 1996-11-15 2005-08-31 キヤノン株式会社 露光装置およびデバイス製造方法
US6714278B2 (en) 1996-11-25 2004-03-30 Nikon Corporation Exposure apparatus
US6882403B1 (en) 1997-04-07 2005-04-19 Nikon Corporation Lithography system and method
WO1998057213A1 (fr) 1997-06-10 1998-12-17 Nikon Corporation Dispositif optique, son procede de nettoyage, dispositif d'alignement de projection et son procede de fabrication
JP4026943B2 (ja) * 1997-09-04 2007-12-26 キヤノン株式会社 露光装置およびデバイス製造方法
JPH11224839A (ja) 1998-02-04 1999-08-17 Canon Inc 露光装置とデバイス製造方法、ならびに該露光装置の光学素子クリーニング方法
KR100685697B1 (ko) * 1998-03-31 2007-02-23 가부시키가이샤 니콘 광학장치 및 동 장치를 구비한 노광장치
AU5529499A (en) * 1998-09-14 2000-04-03 Nikon Corporation Exposure apparatus and its manufacturing method, and device producing method
AU4653999A (en) 1999-07-16 2001-02-05 Nikon Corporation Exposure method and system
JP2001118783A (ja) * 1999-10-21 2001-04-27 Nikon Corp 露光方法及び装置、並びにデバイス製造方法
JP2001274054A (ja) * 2000-03-24 2001-10-05 Canon Inc 露光装置、半導体デバイス製造方法および半導体デバイス製造工場
JP3869999B2 (ja) 2000-03-30 2007-01-17 キヤノン株式会社 露光装置および半導体デバイス製造方法
JP2002158170A (ja) * 2000-09-08 2002-05-31 Nikon Corp 露光装置及びデバイス製造方法
DE10211611A1 (de) * 2002-03-12 2003-09-25 Zeiss Carl Smt Ag Verfahren und Vorrichtung zur Dekontamination optischer Oberflächen
JP2004128213A (ja) * 2002-10-02 2004-04-22 Canon Inc 温調システム及びそれを組み込んだ露光装置
WO2004057589A1 (en) * 2002-12-19 2004-07-08 Koninklijke Philips Electronics N.V. Method and device for irradiating spots on a layer
KR101345474B1 (ko) 2003-03-25 2013-12-27 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
US7329308B2 (en) * 2003-07-09 2008-02-12 Entegris, Inc. Air handling and chemical filtration system and method
US20060285091A1 (en) * 2003-07-21 2006-12-21 Parekh Bipin S Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system related application
US7352433B2 (en) * 2003-10-28 2008-04-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2005142382A (ja) * 2003-11-07 2005-06-02 Canon Inc 露光装置
US20050153424A1 (en) * 2004-01-08 2005-07-14 Derek Coon Fluid barrier with transparent areas for immersion lithography
JP2005353762A (ja) 2004-06-09 2005-12-22 Matsushita Electric Ind Co Ltd 半導体製造装置及びパターン形成方法
US7304715B2 (en) * 2004-08-13 2007-12-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2006093428A (ja) * 2004-09-24 2006-04-06 Canon Inc 温調チャンバおよびこれを用いた露光装置
JP4891538B2 (ja) 2004-11-04 2012-03-07 株式会社日立ハイテクノロジーズ ロードポート
MY139184A (en) * 2004-12-06 2009-08-28 Novartis Ag Method of drying molds
US8692973B2 (en) 2005-01-31 2014-04-08 Nikon Corporation Exposure apparatus and method for producing device
US20090262316A1 (en) * 2005-01-31 2009-10-22 Nikon Corporation Exposure apparatus and method for producing device
US8018573B2 (en) 2005-02-22 2011-09-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2007281142A (ja) * 2006-04-05 2007-10-25 Canon Inc 露光装置及び方法、並びに、デバイス製造方法
WO2008024263A1 (en) * 2006-08-18 2008-02-28 Entegris, Inc System and method for vortex condensation trapping in purge gas humidification
US7572976B1 (en) * 2008-02-06 2009-08-11 Victor Merrill Quick connect electrical box
NL1036596A1 (nl) * 2008-02-21 2009-08-24 Asml Holding Nv Re-flow and buffer system for immersion lithography.
EP3832391A1 (en) * 2019-12-03 2021-06-09 ASML Netherlands B.V. Clamp assembly
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JP2006528431A (ja) * 2003-07-21 2006-12-14 インテグリス・インコーポレーテッド リソグラフ投影装置、パージガス供給システムおよびガスパージ
JP2008160080A (ja) * 2003-07-21 2008-07-10 Entegris Inc リソグラフ投影装置、パージガス供給システムおよびガスパージ
US7879137B2 (en) 2003-07-21 2011-02-01 Entegris, Inc. Lithographic projection apparatus, purge gas supply system and gas purging method

Also Published As

Publication number Publication date
IT8267548A0 (it) 1982-04-26
DE3214325A1 (de) 1983-01-27
KR840000074A (ko) 1984-01-30
KR860000158B1 (ko) 1986-02-27
US4704348A (en) 1987-11-03
FR2504696B1 (fr) 1985-11-22
SU1238274A1 (ru) 1986-06-15
GB2100453A (en) 1982-12-22
GB2100453B (en) 1985-03-20
NL8201726A (nl) 1982-11-16
CH651423A5 (de) 1985-09-13
FR2504696A1 (fr) 1982-10-29
DD160756A3 (de) 1984-02-29

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