KR840000074A - 감광성 내식막에 균일한 정제 패턴을 노출시키는 방법 및 장치 - Google Patents

감광성 내식막에 균일한 정제 패턴을 노출시키는 방법 및 장치 Download PDF

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Publication number
KR840000074A
KR840000074A KR1019820001833A KR820001833A KR840000074A KR 840000074 A KR840000074 A KR 840000074A KR 1019820001833 A KR1019820001833 A KR 1019820001833A KR 820001833 A KR820001833 A KR 820001833A KR 840000074 A KR840000074 A KR 840000074A
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KR
South Korea
Prior art keywords
photoresist
gas
exposing
contact
humidity
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KR1019820001833A
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English (en)
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KR860000158B1 (ko
Inventor
야스히로 고이즈미 (외 4)
Original Assignee
미다 가쓰시게루 (외 1)
가부시기 가이샤 히다찌 세이사꾸쇼
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Application filed by 미다 가쓰시게루 (외 1), 가부시기 가이샤 히다찌 세이사꾸쇼 filed Critical 미다 가쓰시게루 (외 1)
Publication of KR840000074A publication Critical patent/KR840000074A/ko
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Publication of KR860000158B1 publication Critical patent/KR860000158B1/ko

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    • A—HUMAN NECESSITIES
    • A44—HABERDASHERY; JEWELLERY
    • A44C—PERSONAL ADORNMENTS, e.g. JEWELLERY; COINS
    • A44C11/00—Watch chains; Ornamental chains
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

내용 없음

Description

감광성 내식막에 균일한 정제 패턴을 노출시키는 방법 및 장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제2도는 본 발명의 실시예에 관한 축소 노출장치를 나타낸 도식적 다이아그램, 제3도는 제2도의 장치에 사용된 가습기의 확대 단면도.

Claims (7)

  1. 적어도 설정된 전지역과 노출기간에 감광성내식막의 수분 함량을 균일하게 만들기 위해 주위대기와 격리되어 감광성내식막과 접촉하는 가스의 습도를 설정범위의 값으로 조절하는 스텝과 상기한 조절상태하에 감광성 내식막을 설정 지역에서 노출시키도록 기공판에 피복된 감광성 내식막 위에 빛을 방사하는 스텝등을 포함하고 있는 가공판에 피복된 감광성 내식막을 노출시키는 방법.
  2. 제1항에 있어서 감광성 내식막과 접촉하는 가스가 설정온도의 범위으로 조절되는 감광성 내식막을 노출시키는 방법.
  3. 제1항 및 2항에 있어서 감광성 내식막과 접촉하는 가스의 상대습도가 약 10% 또는 그 이상으로 하는 감광성 내식막을 노출시키는 방법.
  4. 감광성 내식막에 패턴을 형성하도록 감광성 내식막을 노출시키기 위한 대물렌즐를 가지는 광학계와 상기 대물렌즈와 감광성 내식막 사이의 공간으로 가스를 공급하는 가스공급부와, 가스의 습도를 설정범위 이내로 유지시키기 위해 가스 공급부에 연결된 습도조절기 등을 포함하고 있는 가공판에 피복된 감광성 내식막을 노출시키는 장치.
  5. 제4항에 있어서 가스 공급부는 가스 공급원과, 감광성 내식막에 가스를 분출하기 위한 가스분출 노즐과 광학계의 촛점을 조정하는 공기 측미계등을 구비하고, 습도조절기가 가스 공급원과 가스 분출노즐 사이에 설치되게 한 감광성 내식막을 노출시키는 장치.
  6. 제4항에 있어서, 가스 공급부는 광학계의 가공판의 대물렌즈를 적어도 부분적으로 밀폐하고 있는 케이징을 가지고 있으며, 가스가 케이징으로 분출되어 감광성 내식막의 표면과 접촉되게 한 감광성 내식막을 노출시키는 장치.
  7. 제4항, 제5항 및 6항에 있어서 가습조절기가 가스를 가습하기 위해 물을 담고 있는 용기을 갖고 있어 그 용기 내부가, 가스가 통과하는 통로의 일부로 형성되게 한 감광성 내식막을 노출시키는 장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR8201833A 1981-04-23 1982-04-23 감광성 내식막에 균일한 정제 패턴을 노출시키는 방법 및 장치 KR860000158B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DD81229475A DD160756A3 (de) 1981-04-24 1981-04-24 Anordnung zur verbesserung fotochemischer umsetzungsprozesse in fotoresistschichten
DEWPG02B/229475/3 1981-04-24
JP56154059A JPS57177144A (en) 1981-04-24 1981-09-30 Method and device for exposure

Publications (2)

Publication Number Publication Date
KR840000074A true KR840000074A (ko) 1984-01-30
KR860000158B1 KR860000158B1 (ko) 1986-02-27

Family

ID=25747719

Family Applications (1)

Application Number Title Priority Date Filing Date
KR8201833A KR860000158B1 (ko) 1981-04-23 1982-04-23 감광성 내식막에 균일한 정제 패턴을 노출시키는 방법 및 장치

Country Status (11)

Country Link
US (1) US4704348A (ko)
JP (1) JPS57177144A (ko)
KR (1) KR860000158B1 (ko)
CH (1) CH651423A5 (ko)
DD (1) DD160756A3 (ko)
DE (1) DE3214325A1 (ko)
FR (1) FR2504696B1 (ko)
GB (1) GB2100453B (ko)
IT (1) IT8267548A0 (ko)
NL (1) NL8201726A (ko)
SU (1) SU1238274A1 (ko)

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Also Published As

Publication number Publication date
JPS57177144A (en) 1982-10-30
CH651423A5 (de) 1985-09-13
DD160756A3 (de) 1984-02-29
NL8201726A (nl) 1982-11-16
KR860000158B1 (ko) 1986-02-27
IT8267548A0 (it) 1982-04-26
FR2504696A1 (fr) 1982-10-29
SU1238274A1 (ru) 1986-06-15
US4704348A (en) 1987-11-03
FR2504696B1 (fr) 1985-11-22
GB2100453A (en) 1982-12-22
GB2100453B (en) 1985-03-20
DE3214325A1 (de) 1983-01-27

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