JPS57204039A - Spray developing method - Google Patents

Spray developing method

Info

Publication number
JPS57204039A
JPS57204039A JP8918781A JP8918781A JPS57204039A JP S57204039 A JPS57204039 A JP S57204039A JP 8918781 A JP8918781 A JP 8918781A JP 8918781 A JP8918781 A JP 8918781A JP S57204039 A JPS57204039 A JP S57204039A
Authority
JP
Japan
Prior art keywords
developer
chamber
concentration
blown
development
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8918781A
Other languages
Japanese (ja)
Other versions
JPH0348494B2 (en
Inventor
Katsuyuki Arii
Shinya Kato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP8918781A priority Critical patent/JPS57204039A/en
Publication of JPS57204039A publication Critical patent/JPS57204039A/en
Publication of JPH0348494B2 publication Critical patent/JPH0348494B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03D—APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
    • G03D5/00—Liquid processing apparatus in which no immersion is effected; Washing apparatus in which no immersion is effected
    • G03D5/04—Liquid processing apparatus in which no immersion is effected; Washing apparatus in which no immersion is effected using liquid sprays

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photographic Processing Devices Using Wet Methods (AREA)

Abstract

PURPOSE:To prevent an increase in the concentration of a developer by blowing high-humidity air into a chamber wherein development is carried out and keeping the steam pressure in the chamber to a saturated state, and then performing the development. CONSTITUTION:A high-humidity air blow-off opening 7 and a pump 8 are added to a conventional device. Air having high humidity is blown into a chamber 1 and thus the steam pressure is held in a saturated state to prevent the vaporing of the water in a developer, thereby stabilizing the concentration of the developer. Consequently, the developer having the stable concentration is blown, so while variance of pattern size is reduced, the drying of the developer remaining near a spray nozzle 3 is prevented, preventing the generation of pinholes.
JP8918781A 1981-06-10 1981-06-10 Spray developing method Granted JPS57204039A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8918781A JPS57204039A (en) 1981-06-10 1981-06-10 Spray developing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8918781A JPS57204039A (en) 1981-06-10 1981-06-10 Spray developing method

Publications (2)

Publication Number Publication Date
JPS57204039A true JPS57204039A (en) 1982-12-14
JPH0348494B2 JPH0348494B2 (en) 1991-07-24

Family

ID=13963721

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8918781A Granted JPS57204039A (en) 1981-06-10 1981-06-10 Spray developing method

Country Status (1)

Country Link
JP (1) JPS57204039A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6452232U (en) * 1987-09-29 1989-03-31

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57173839A (en) * 1981-04-21 1982-10-26 Oki Electric Ind Co Ltd Resist coating device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57173839A (en) * 1981-04-21 1982-10-26 Oki Electric Ind Co Ltd Resist coating device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6452232U (en) * 1987-09-29 1989-03-31
JPH0452989Y2 (en) * 1987-09-29 1992-12-14

Also Published As

Publication number Publication date
JPH0348494B2 (en) 1991-07-24

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