JPS6452232U - - Google Patents
Info
- Publication number
- JPS6452232U JPS6452232U JP14882987U JP14882987U JPS6452232U JP S6452232 U JPS6452232 U JP S6452232U JP 14882987 U JP14882987 U JP 14882987U JP 14882987 U JP14882987 U JP 14882987U JP S6452232 U JPS6452232 U JP S6452232U
- Authority
- JP
- Japan
- Prior art keywords
- processing chamber
- sample stage
- mist
- spraying
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007788 liquid Substances 0.000 claims description 3
- 239000003595 mist Substances 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
- 238000005507 spraying Methods 0.000 claims 2
- 238000007599 discharging Methods 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
- 239000007921 spray Substances 0.000 description 1
Landscapes
- Weting (AREA)
Description
第１図は本考案の実施例による処理装置を示す
構成図、及び第２図は従来の処理装置を示す構成
図である。
１ａ……処理室、２……試料台、３……ノズル
、４……被処理物、５……処理液、８……霧状物
、９……噴射ノズル、１１……純水。
FIG. 1 is a block diagram showing a processing apparatus according to an embodiment of the present invention, and FIG. 2 is a block diagram showing a conventional processing apparatus. 1a...Processing chamber, 2...Sample stand, 3...Nozzle, 4...Processing object, 5...Processing liquid, 8...Mist, 9...Spray nozzle, 11...Pure water.
Claims (1)
よつて回転する試料台と、この試料台上に載置し
た被処理物に向けて処理液を吐出する吐出手段と
、水を主成分とする液体からなる霧状物を噴射す
る噴射手段とを備え、前記処理室内には前記霧状
物が発生していることを特徴とする処理装置。 A processing chamber, a sample stage arranged in the processing chamber and rotated by a drive device, a discharge means for discharging a processing liquid toward an object to be processed placed on the sample stage, and a method comprising water as a main component. and a spraying means for spraying a mist made of a liquid, wherein the mist is generated within the processing chamber.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987148829U JPH0452989Y2 (en) | 1987-09-29 | 1987-09-29 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987148829U JPH0452989Y2 (en) | 1987-09-29 | 1987-09-29 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6452232U true JPS6452232U (en) | 1989-03-31 |
| JPH0452989Y2 JPH0452989Y2 (en) | 1992-12-14 |
Family
ID=31420507
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987148829U Expired JPH0452989Y2 (en) | 1987-09-29 | 1987-09-29 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0452989Y2 (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57152129A (en) * | 1981-03-13 | 1982-09-20 | Sanyo Electric Co Ltd | Developing method of resist |
| JPS57204039A (en) * | 1981-06-10 | 1982-12-14 | Fujitsu Ltd | Spray developing method |
-
1987
- 1987-09-29 JP JP1987148829U patent/JPH0452989Y2/ja not_active Expired
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57152129A (en) * | 1981-03-13 | 1982-09-20 | Sanyo Electric Co Ltd | Developing method of resist |
| JPS57204039A (en) * | 1981-06-10 | 1982-12-14 | Fujitsu Ltd | Spray developing method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0452989Y2 (en) | 1992-12-14 |
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