JPS645437U - - Google Patents
Info
- Publication number
- JPS645437U JPS645437U JP9727087U JP9727087U JPS645437U JP S645437 U JPS645437 U JP S645437U JP 9727087 U JP9727087 U JP 9727087U JP 9727087 U JP9727087 U JP 9727087U JP S645437 U JPS645437 U JP S645437U
- Authority
- JP
- Japan
- Prior art keywords
- processing chamber
- processing
- cleaning liquid
- discharge means
- sample stage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007788 liquid Substances 0.000 claims description 7
- 238000004140 cleaning Methods 0.000 claims description 5
- 238000007599 discharging Methods 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Weting (AREA)
Description
第１図は本考案をスプレイプロセス装置に適用
した場合の一実施例を示す構成図、第２図は洗浄
液吐出手段の平面図、第３図は従来のスプレイプ
ロセス装置の要部構成図である。
２……処理室、３……試料台、４……ノズル、
５……処理液、６……被処理物、１２……洗浄液
吐出手段、１３……洗浄液、１４……パイプ、１
５……ノズル、１７……容器。
Fig. 1 is a block diagram showing an embodiment of the present invention applied to a spray process device, Fig. 2 is a plan view of a cleaning liquid discharging means, and Fig. 3 is a block diagram of main parts of a conventional spray process device. . 2...processing chamber, 3...sample stand, 4...nozzle,
5... Processing liquid, 6... Processing object, 12... Cleaning liquid discharge means, 13... Cleaning liquid, 14... Pipe, 1
5... Nozzle, 17... Container.
Claims (1)
よつて回転される試料台と、この試料台上に載置
された被処理物に向けて処理液を吐出する吐出手
段と、前記処理室の内壁に沿つて洗浄液を流下さ
せる洗浄液吐出手段とを備えたことを特徴とする
処理装置。 a processing chamber, a sample stage arranged in the processing chamber and rotated by a drive device, a discharge means for discharging a processing liquid toward an object to be processed placed on the sample stage, and the processing chamber. a cleaning liquid discharge means for causing the cleaning liquid to flow down along the inner wall of the processing apparatus.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9727087U JPS645437U (en) | 1987-06-26 | 1987-06-26 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9727087U JPS645437U (en) | 1987-06-26 | 1987-06-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS645437U true JPS645437U (en) | 1989-01-12 |
Family
ID=31322584
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9727087U Pending JPS645437U (en) | 1987-06-26 | 1987-06-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS645437U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0334887U (en) * | 1989-08-17 | 1991-04-05 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5599725A (en) * | 1979-01-26 | 1980-07-30 | Matsushita Electric Ind Co Ltd | Method and device for manufacturing semiconductor device |
| JPS5745237A (en) * | 1980-09-01 | 1982-03-15 | Fujitsu Ltd | Rotary processing device |
| JPS6294931A (en) * | 1985-10-21 | 1987-05-01 | Mitsubishi Electric Corp | Developing device |
| JPS63187630A (en) * | 1987-01-30 | 1988-08-03 | Toshiba Corp | Liquid processor for semiconductor wafer |
-
1987
- 1987-06-26 JP JP9727087U patent/JPS645437U/ja active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5599725A (en) * | 1979-01-26 | 1980-07-30 | Matsushita Electric Ind Co Ltd | Method and device for manufacturing semiconductor device |
| JPS5745237A (en) * | 1980-09-01 | 1982-03-15 | Fujitsu Ltd | Rotary processing device |
| JPS6294931A (en) * | 1985-10-21 | 1987-05-01 | Mitsubishi Electric Corp | Developing device |
| JPS63187630A (en) * | 1987-01-30 | 1988-08-03 | Toshiba Corp | Liquid processor for semiconductor wafer |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0334887U (en) * | 1989-08-17 | 1991-04-05 |