GB1534450A - Exposure apparatus - Google Patents
Exposure apparatusInfo
- Publication number
- GB1534450A GB1534450A GB34360/77A GB3436077A GB1534450A GB 1534450 A GB1534450 A GB 1534450A GB 34360/77 A GB34360/77 A GB 34360/77A GB 3436077 A GB3436077 A GB 3436077A GB 1534450 A GB1534450 A GB 1534450A
- Authority
- GB
- United Kingdom
- Prior art keywords
- stencil
- cooled
- mounting
- thermostat
- aug
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B17/00—Details of cameras or camera bodies; Accessories therefor
- G03B17/55—Details of cameras or camera bodies; Accessories therefor with provision for heating or cooling, e.g. in aircraft
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
Abstract
1534450 Cooling exposing apparatus ELEKTROMAT VEB 16 Aug 1977 [17 Aug 1976] 34360/77 Heading G2A Exposing apparatus especially for use in the production of microelectronics has a stencil 3 located between a light source and a mounting 1 for a photo-sensitive substrate (not shown), both the stencil 3 and the mounting 1 being cooled by a thermostatically controlled device. As shown, mounting 1 is cooled by circulating fluid under the control of a thermostat 5. Stencil 3 is cooled by gas supplied by a nozzle 14. The temperature of the gas is controlled by a thermostat 9 and by a control unit 7. Unit 7 receives an input from a sensor 6 and from a shutter 13, since the temperature rises when the shutter opens.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DD19435876A DD127137B1 (en) | 1976-08-17 | 1976-08-17 | DEVICE FOR COMPENSATING THE HEAT EFFECT ON ADJUSTING AND EXPOSURE DEVICES |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1534450A true GB1534450A (en) | 1978-12-06 |
Family
ID=5505450
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB34360/77A Expired GB1534450A (en) | 1976-08-17 | 1977-08-16 | Exposure apparatus |
Country Status (6)
Country | Link |
---|---|
CS (1) | CS206603B1 (en) |
DD (1) | DD127137B1 (en) |
DE (1) | DE2735043A1 (en) |
FR (1) | FR2362419A1 (en) |
GB (1) | GB1534450A (en) |
SU (1) | SU664245A1 (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2204705A (en) * | 1987-04-21 | 1988-11-16 | Brother Ind Ltd | Exposure device for an image recording apparatus |
US5063582A (en) * | 1988-09-02 | 1991-11-05 | Canon Kabushiki Kaisha | Liquid cooled x-ray lithographic exposure apparatus |
US5093579A (en) * | 1989-07-13 | 1992-03-03 | Canon Kabushiki Kaisha | Exposure apparatus with a substrate holding mechanism |
US5138643A (en) * | 1989-10-02 | 1992-08-11 | Canon Kabushiki Kaisha | Exposure apparatus |
US10048602B2 (en) | 2004-02-04 | 2018-08-14 | Nikon Corporation | Exposure apparatus, exposure method, and method for producing device |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1578259A (en) * | 1977-05-11 | 1980-11-05 | Philips Electronic Associated | Methods of manufacturing solid-state devices apparatus for use therein and devices manufactured thereby |
DE2922642C2 (en) * | 1979-06-02 | 1981-10-01 | Kernforschungszentrum Karlsruhe Gmbh, 7500 Karlsruhe | Process for the manufacture of plates for the construction of separation nozzle elements |
DD150263A1 (en) * | 1980-05-02 | 1981-08-19 | Schneider Hans Joachim | TEMPERATING DEVICE, ESPECIALLY FOR LITHOGRAPHIC DEVICES |
US4391034A (en) * | 1980-12-22 | 1983-07-05 | Ibm Corporation | Thermally compensated shadow mask |
JPS57169244A (en) * | 1981-04-13 | 1982-10-18 | Canon Inc | Temperature controller for mask and wafer |
DD160756A3 (en) * | 1981-04-24 | 1984-02-29 | Gudrun Dietz | ARRANGEMENT FOR IMPROVING PHOTOCHEMICAL IMPLEMENTATION PROCESSES IN PHOTORESIS LAYERS |
DE3306999A1 (en) * | 1982-03-31 | 1983-10-06 | Censor Patent Versuch | Fixture for clamping a workpiece |
KR910002215A (en) * | 1988-06-27 | 1991-01-31 | 하라 레이노스께 | Image forming apparatus and method |
JPH0276212A (en) * | 1988-09-13 | 1990-03-15 | Canon Inc | Multiple exposure |
IT1235478B (en) * | 1989-09-26 | 1992-08-19 | Achille Fiorentini | BACK WITH HEATING ELEMENTS FOR IMMEDIATE DEVELOPMENT FILM. |
DE29704681U1 (en) * | 1997-03-14 | 1998-07-16 | Wuendsch Dieter | Cooling device for film projectors |
-
1976
- 1976-08-17 DD DD19435876A patent/DD127137B1/en unknown
-
1977
- 1977-08-03 DE DE19772735043 patent/DE2735043A1/en not_active Withdrawn
- 1977-08-16 GB GB34360/77A patent/GB1534450A/en not_active Expired
- 1977-08-16 SU SU772510857A patent/SU664245A1/en active
- 1977-08-17 CS CS775407A patent/CS206603B1/en unknown
- 1977-08-17 FR FR7725193A patent/FR2362419A1/en active Granted
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2204705A (en) * | 1987-04-21 | 1988-11-16 | Brother Ind Ltd | Exposure device for an image recording apparatus |
US4864356A (en) * | 1987-04-21 | 1989-09-05 | Brother Kogyo Kabushiki Kaisha | Exposure device for image recording apparatus |
GB2204705B (en) * | 1987-04-21 | 1991-06-19 | Brother Ind Ltd | Exposure device for an image recording apparatus |
US5063582A (en) * | 1988-09-02 | 1991-11-05 | Canon Kabushiki Kaisha | Liquid cooled x-ray lithographic exposure apparatus |
US5093579A (en) * | 1989-07-13 | 1992-03-03 | Canon Kabushiki Kaisha | Exposure apparatus with a substrate holding mechanism |
US5138643A (en) * | 1989-10-02 | 1992-08-11 | Canon Kabushiki Kaisha | Exposure apparatus |
US10048602B2 (en) | 2004-02-04 | 2018-08-14 | Nikon Corporation | Exposure apparatus, exposure method, and method for producing device |
Also Published As
Publication number | Publication date |
---|---|
DD127137B1 (en) | 1979-11-28 |
FR2362419A1 (en) | 1978-03-17 |
DE2735043A1 (en) | 1978-02-23 |
CS206603B1 (en) | 1981-06-30 |
SU664245A1 (en) | 1979-05-25 |
FR2362419B3 (en) | 1980-07-11 |
DD127137A1 (en) | 1977-09-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PCNP | Patent ceased through non-payment of renewal fee |