DD127137B1 - Device for compensating the heat effect on adjusting and exposure devices - Google Patents

Device for compensating the heat effect on adjusting and exposure devices

Info

Publication number
DD127137B1
DD127137B1 DD19435876A DD19435876A DD127137B1 DD 127137 B1 DD127137 B1 DD 127137B1 DD 19435876 A DD19435876 A DD 19435876A DD 19435876 A DD19435876 A DD 19435876A DD 127137 B1 DD127137 B1 DD 127137B1
Authority
DD
German Democratic Republic
Prior art keywords
compensating
adjusting
device
heat effect
exposure devices
Prior art date
Application number
DD19435876A
Other languages
German (de)
Other versions
DD127137A1 (en
Inventor
Sieghard Dipl Phys Landgraf
Ulf Dipl Phys Weber
Michael Dipl Ing Stapf
Martin Dipl Ing Wenzel
Michael Dipl Ing Heyne
Original Assignee
Elektromat Veb
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Elektromat Veb filed Critical Elektromat Veb
Priority to DD19435876A priority Critical patent/DD127137B1/en
Publication of DD127137A1 publication Critical patent/DD127137A1/en
Publication of DD127137B1 publication Critical patent/DD127137B1/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B17/00Details of cameras or camera bodies; Accessories therefor
    • G03B17/55Details of cameras or camera bodies; Accessories therefor with provision for heating or cooling, e.g. in aircraft
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/708Construction of apparatus, e.g. environment, hygiene aspects or materials
    • G03F7/70858Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
DD19435876A 1976-08-17 1976-08-17 Device for compensating the heat effect on adjusting and exposure devices DD127137B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DD19435876A DD127137B1 (en) 1976-08-17 1976-08-17 Device for compensating the heat effect on adjusting and exposure devices

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
DD19435876A DD127137B1 (en) 1976-08-17 1976-08-17 Device for compensating the heat effect on adjusting and exposure devices
DE19772735043 DE2735043A1 (en) 1976-08-17 1977-08-03 An apparatus for compensating the adjustment and exposure devices at waermeeinwirkung
GB34360/77A GB1534450A (en) 1976-08-17 1977-08-16 Exposure apparatus
SU772510857A SU664245A1 (en) 1976-08-17 1977-08-16 System for compensating for heat effect in devices for illumination of photo lacquer-coated substrates
FR7725193A FR2362419B3 (en) 1976-08-17 1977-08-17
CS775407A CS206603B1 (en) 1976-08-17 1977-08-17 Device for heat influence compensation in the adjusting and illuminating apparatus

Publications (2)

Publication Number Publication Date
DD127137A1 DD127137A1 (en) 1977-09-07
DD127137B1 true DD127137B1 (en) 1979-11-28

Family

ID=5505450

Family Applications (1)

Application Number Title Priority Date Filing Date
DD19435876A DD127137B1 (en) 1976-08-17 1976-08-17 Device for compensating the heat effect on adjusting and exposure devices

Country Status (6)

Country Link
CS (1) CS206603B1 (en)
DD (1) DD127137B1 (en)
DE (1) DE2735043A1 (en)
FR (1) FR2362419B3 (en)
GB (1) GB1534450A (en)
SU (1) SU664245A1 (en)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1578259A (en) * 1977-05-11 1980-11-05 Philips Electronic Associated Methods of manufacturing solid-state devices apparatus for use therein and devices manufactured thereby
DE2922642C2 (en) * 1979-06-02 1981-10-01 Kernforschungszentrum Karlsruhe Gmbh, 7500 Karlsruhe, De
DE3306999C2 (en) * 1982-03-31 1988-11-17 Perkin-Elmer Censor Anstalt, Vaduz, Li
DD150263A1 (en) * 1980-05-02 1981-08-19 Schneider Hans Joachim Temperating device, especially for lithographic devices
US4391034A (en) * 1980-12-22 1983-07-05 Ibm Corporation Thermally compensated shadow mask
JPS57169244A (en) * 1981-04-13 1982-10-18 Canon Inc Temperature controller for mask and wafer
DD160756A3 (en) * 1981-04-24 1984-02-29 Gudrun Dietz Arrangement for improving photochemical implementation processes in photoresis layers
US4864356A (en) * 1987-04-21 1989-09-05 Brother Kogyo Kabushiki Kaisha Exposure device for image recording apparatus
EP0349208A3 (en) * 1988-06-27 1991-01-16 Seiko Instruments Inc. Image forming apparatus
EP0357423B1 (en) * 1988-09-02 1995-03-15 Canon Kabushiki Kaisha An exposure apparatus
JPH0276212A (en) * 1988-09-13 1990-03-15 Canon Inc Multiple exposure
JP2731950B2 (en) * 1989-07-13 1998-03-25 キヤノン株式会社 Exposure method
IT1235478B (en) * 1989-09-26 1992-08-19 Achille Fiorentini Back with heating elements for instant development film.
US5138643A (en) * 1989-10-02 1992-08-11 Canon Kabushiki Kaisha Exposure apparatus
DE29704681U1 (en) * 1997-03-14 1998-07-16 Wuendsch Dieter Cooler for movie projectors
KR20120003511A (en) 2004-02-04 2012-01-10 가부시키가이샤 니콘 Exposure apparatus, exposure method, and device producing method

Also Published As

Publication number Publication date
FR2362419B3 (en) 1980-07-11
FR2362419A1 (en) 1978-03-17
DE2735043A1 (en) 1978-02-23
GB1534450A (en) 1978-12-06
CS206603B1 (en) 1981-06-30
SU664245A1 (en) 1979-05-25
DD127137A1 (en) 1977-09-07

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