JPS52117567A - Electronic beam exposure unit - Google Patents
Electronic beam exposure unitInfo
- Publication number
- JPS52117567A JPS52117567A JP3417376A JP3417376A JPS52117567A JP S52117567 A JPS52117567 A JP S52117567A JP 3417376 A JP3417376 A JP 3417376A JP 3417376 A JP3417376 A JP 3417376A JP S52117567 A JPS52117567 A JP S52117567A
- Authority
- JP
- Japan
- Prior art keywords
- exposure unit
- beam exposure
- electronic beam
- mask
- making
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: To prevent fluctuation of pattern measurement caused by temperature variation for mask formation device, etc., by making the temperature constant directly for mask fixing board or mask substrate.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3417376A JPS52117567A (en) | 1976-03-30 | 1976-03-30 | Electronic beam exposure unit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3417376A JPS52117567A (en) | 1976-03-30 | 1976-03-30 | Electronic beam exposure unit |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS52117567A true JPS52117567A (en) | 1977-10-03 |
Family
ID=12406803
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3417376A Pending JPS52117567A (en) | 1976-03-30 | 1976-03-30 | Electronic beam exposure unit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52117567A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5615041A (en) * | 1979-07-17 | 1981-02-13 | Fujitsu Ltd | Electron beam exposing method |
US5428203A (en) * | 1992-10-12 | 1995-06-27 | Mitsubishi Denki Kabushiki Kaisha | Electron beam exposing apparatus with a stencil mask kept at a constant temperature |
US7109484B2 (en) | 2000-07-27 | 2006-09-19 | Ebara Corporation | Sheet beam-type inspection apparatus |
US7135676B2 (en) | 2000-06-27 | 2006-11-14 | Ebara Corporation | Inspection system by charged particle beam and method of manufacturing devices using the system |
US7241993B2 (en) | 2000-06-27 | 2007-07-10 | Ebara Corporation | Inspection system by charged particle beam and method of manufacturing devices using the system |
-
1976
- 1976-03-30 JP JP3417376A patent/JPS52117567A/en active Pending
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5615041A (en) * | 1979-07-17 | 1981-02-13 | Fujitsu Ltd | Electron beam exposing method |
US5428203A (en) * | 1992-10-12 | 1995-06-27 | Mitsubishi Denki Kabushiki Kaisha | Electron beam exposing apparatus with a stencil mask kept at a constant temperature |
US7411191B2 (en) | 2000-06-27 | 2008-08-12 | Ebara Corporation | Inspection system by charged particle beam and method of manufacturing devices using the system |
US7135676B2 (en) | 2000-06-27 | 2006-11-14 | Ebara Corporation | Inspection system by charged particle beam and method of manufacturing devices using the system |
US7241993B2 (en) | 2000-06-27 | 2007-07-10 | Ebara Corporation | Inspection system by charged particle beam and method of manufacturing devices using the system |
US7297949B2 (en) | 2000-06-27 | 2007-11-20 | Ebara Corporation | Inspection system by charged particle beam and method of manufacturing devices using the system |
US7601972B2 (en) | 2000-06-27 | 2009-10-13 | Ebara Corporation | Inspection system by charged particle beam and method of manufacturing devices using the system |
US8053726B2 (en) | 2000-06-27 | 2011-11-08 | Ebara Corporation | Inspection system by charged particle beam and method of manufacturing devices using the system |
US8368031B2 (en) | 2000-06-27 | 2013-02-05 | Ebara Corporation | Inspection system by charged particle beam and method of manufacturing devices using the system |
US8803103B2 (en) | 2000-06-27 | 2014-08-12 | Ebara Corporation | Inspection system by charged particle beam and method of manufacturing devices using the system |
US9368314B2 (en) | 2000-06-27 | 2016-06-14 | Ebara Corporation | Inspection system by charged particle beam and method of manufacturing devices using the system |
US7109484B2 (en) | 2000-07-27 | 2006-09-19 | Ebara Corporation | Sheet beam-type inspection apparatus |
US7417236B2 (en) | 2000-07-27 | 2008-08-26 | Ebara Corporation | Sheet beam-type testing apparatus |
US7829871B2 (en) | 2000-07-27 | 2010-11-09 | Ebara Corporation | Sheet beam-type testing apparatus |
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