JPS52117567A - Electronic beam exposure unit - Google Patents

Electronic beam exposure unit

Info

Publication number
JPS52117567A
JPS52117567A JP3417376A JP3417376A JPS52117567A JP S52117567 A JPS52117567 A JP S52117567A JP 3417376 A JP3417376 A JP 3417376A JP 3417376 A JP3417376 A JP 3417376A JP S52117567 A JPS52117567 A JP S52117567A
Authority
JP
Japan
Prior art keywords
exposure unit
beam exposure
electronic beam
mask
making
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3417376A
Other languages
Japanese (ja)
Inventor
Mamoru Nakasuji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP3417376A priority Critical patent/JPS52117567A/en
Publication of JPS52117567A publication Critical patent/JPS52117567A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To prevent fluctuation of pattern measurement caused by temperature variation for mask formation device, etc., by making the temperature constant directly for mask fixing board or mask substrate.
COPYRIGHT: (C)1977,JPO&Japio
JP3417376A 1976-03-30 1976-03-30 Electronic beam exposure unit Pending JPS52117567A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3417376A JPS52117567A (en) 1976-03-30 1976-03-30 Electronic beam exposure unit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3417376A JPS52117567A (en) 1976-03-30 1976-03-30 Electronic beam exposure unit

Publications (1)

Publication Number Publication Date
JPS52117567A true JPS52117567A (en) 1977-10-03

Family

ID=12406803

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3417376A Pending JPS52117567A (en) 1976-03-30 1976-03-30 Electronic beam exposure unit

Country Status (1)

Country Link
JP (1) JPS52117567A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5615041A (en) * 1979-07-17 1981-02-13 Fujitsu Ltd Electron beam exposing method
US5428203A (en) * 1992-10-12 1995-06-27 Mitsubishi Denki Kabushiki Kaisha Electron beam exposing apparatus with a stencil mask kept at a constant temperature
US7109484B2 (en) 2000-07-27 2006-09-19 Ebara Corporation Sheet beam-type inspection apparatus
US7135676B2 (en) 2000-06-27 2006-11-14 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US7241993B2 (en) 2000-06-27 2007-07-10 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5615041A (en) * 1979-07-17 1981-02-13 Fujitsu Ltd Electron beam exposing method
US5428203A (en) * 1992-10-12 1995-06-27 Mitsubishi Denki Kabushiki Kaisha Electron beam exposing apparatus with a stencil mask kept at a constant temperature
US7411191B2 (en) 2000-06-27 2008-08-12 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US7135676B2 (en) 2000-06-27 2006-11-14 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US7241993B2 (en) 2000-06-27 2007-07-10 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US7297949B2 (en) 2000-06-27 2007-11-20 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US7601972B2 (en) 2000-06-27 2009-10-13 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US8053726B2 (en) 2000-06-27 2011-11-08 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US8368031B2 (en) 2000-06-27 2013-02-05 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US8803103B2 (en) 2000-06-27 2014-08-12 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US9368314B2 (en) 2000-06-27 2016-06-14 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US7109484B2 (en) 2000-07-27 2006-09-19 Ebara Corporation Sheet beam-type inspection apparatus
US7417236B2 (en) 2000-07-27 2008-08-26 Ebara Corporation Sheet beam-type testing apparatus
US7829871B2 (en) 2000-07-27 2010-11-09 Ebara Corporation Sheet beam-type testing apparatus

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