JPS52113768A - Mask matching shift measuring pattern - Google Patents

Mask matching shift measuring pattern

Info

Publication number
JPS52113768A
JPS52113768A JP2993276A JP2993276A JPS52113768A JP S52113768 A JPS52113768 A JP S52113768A JP 2993276 A JP2993276 A JP 2993276A JP 2993276 A JP2993276 A JP 2993276A JP S52113768 A JPS52113768 A JP S52113768A
Authority
JP
Japan
Prior art keywords
measuring pattern
mask matching
shift measuring
matching shift
shifts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2993276A
Other languages
Japanese (ja)
Inventor
Mitsumasa Koyanagi
Kikuji Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP2993276A priority Critical patent/JPS52113768A/en
Publication of JPS52113768A publication Critical patent/JPS52113768A/en
Pending legal-status Critical Current

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Landscapes

  • Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)

Abstract

PURPOSE: To easily perform high accuracy measurements of shifts in pattern mask matching by converting the shifts in the pattern mask mactching to electrical quantites such as resitance capacitance, etc.
COPYRIGHT: (C)1977,JPO&Japio
JP2993276A 1976-03-22 1976-03-22 Mask matching shift measuring pattern Pending JPS52113768A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2993276A JPS52113768A (en) 1976-03-22 1976-03-22 Mask matching shift measuring pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2993276A JPS52113768A (en) 1976-03-22 1976-03-22 Mask matching shift measuring pattern

Publications (1)

Publication Number Publication Date
JPS52113768A true JPS52113768A (en) 1977-09-24

Family

ID=12289751

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2993276A Pending JPS52113768A (en) 1976-03-22 1976-03-22 Mask matching shift measuring pattern

Country Status (1)

Country Link
JP (1) JPS52113768A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5749247A (en) * 1980-07-11 1982-03-23 Western Electric Co Semiconductor wafer and method of producing same
JPS5850747A (en) * 1981-09-19 1983-03-25 Toshiba Corp Pattern for detecting connection
JPS5893326A (en) * 1981-11-30 1983-06-03 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション Method of measuring performance of exposure device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5749247A (en) * 1980-07-11 1982-03-23 Western Electric Co Semiconductor wafer and method of producing same
JPH0241172B2 (en) * 1980-07-11 1990-09-14 Ei Teii Ando Teii Tekunorojiizu Inc
JPS5850747A (en) * 1981-09-19 1983-03-25 Toshiba Corp Pattern for detecting connection
JPS5893326A (en) * 1981-11-30 1983-06-03 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション Method of measuring performance of exposure device
JPS6253946B2 (en) * 1981-11-30 1987-11-12 Intaanashonaru Bijinesu Mashiinzu Corp

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