JPS54149586A - Mask aligner - Google Patents

Mask aligner

Info

Publication number
JPS54149586A
JPS54149586A JP5762278A JP5762278A JPS54149586A JP S54149586 A JPS54149586 A JP S54149586A JP 5762278 A JP5762278 A JP 5762278A JP 5762278 A JP5762278 A JP 5762278A JP S54149586 A JPS54149586 A JP S54149586A
Authority
JP
Japan
Prior art keywords
temperature
mask
jacket
shift
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5762278A
Other languages
Japanese (ja)
Inventor
Yoshimitsu Tanaka
Yasushi Asami
Katsumi Taira
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP5762278A priority Critical patent/JPS54149586A/en
Publication of JPS54149586A publication Critical patent/JPS54149586A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature

Landscapes

  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To decrease the position shift of a pattern to its minimum by reducing the temperature variation of a mask and a wafer without requiring much facility cost.
CONSTITUTION: Temperature varying method 9 is provided into passage 8 in frame-shaped jacket 7. For a change in temperature, a liquid, gas, an electric-heating coil, etc., are used and the temperature is detected 11 at one part of the jacket to perform temperature control 10. This jacket 7 is fitted onto the top surface of mask holder 1 and a temperature, especially, at the mask 3 side greater than semiconductor wafer 5 in terms of thermal expansion is controlled so as to reduce a shift in position caused by temperature by variation, thereby reducing the pitch shift of the pattern of a product. In addition, the abovementioned constitution allows the relaxation of the precision of the air-conditioning temperature and the facility cost also lessens.
COPYRIGHT: (C)1979,JPO&Japio
JP5762278A 1978-05-17 1978-05-17 Mask aligner Pending JPS54149586A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5762278A JPS54149586A (en) 1978-05-17 1978-05-17 Mask aligner

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5762278A JPS54149586A (en) 1978-05-17 1978-05-17 Mask aligner

Publications (1)

Publication Number Publication Date
JPS54149586A true JPS54149586A (en) 1979-11-22

Family

ID=13060969

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5762278A Pending JPS54149586A (en) 1978-05-17 1978-05-17 Mask aligner

Country Status (1)

Country Link
JP (1) JPS54149586A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56112732A (en) * 1980-02-12 1981-09-05 Chiyou Lsi Gijutsu Kenkyu Kumiai Exposure device
JPS57112022A (en) * 1980-12-29 1982-07-12 Fujitsu Ltd Mask positioning unit
JPS5950439U (en) * 1982-09-27 1984-04-03 キヤノン株式会社 semiconductor exposure equipment
JPS5961027A (en) * 1982-09-29 1984-04-07 Toshiba Corp Semiconductor substrate heating apparatus
JPS6050935A (en) * 1983-08-31 1985-03-22 Agency Of Ind Science & Technol Inspecting device for semiconductor wafer
JPH0273624U (en) * 1988-11-25 1990-06-05
JP2009116307A (en) * 2007-11-07 2009-05-28 Samsung Electro-Mechanics Co Ltd Substrate manufacturing apparatus and method therefor

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56112732A (en) * 1980-02-12 1981-09-05 Chiyou Lsi Gijutsu Kenkyu Kumiai Exposure device
JPS57112022A (en) * 1980-12-29 1982-07-12 Fujitsu Ltd Mask positioning unit
JPS5950439U (en) * 1982-09-27 1984-04-03 キヤノン株式会社 semiconductor exposure equipment
JPS5961027A (en) * 1982-09-29 1984-04-07 Toshiba Corp Semiconductor substrate heating apparatus
JPS6050935A (en) * 1983-08-31 1985-03-22 Agency Of Ind Science & Technol Inspecting device for semiconductor wafer
JPH0317217B2 (en) * 1983-08-31 1991-03-07 Kogyo Gijutsuin
JPH0273624U (en) * 1988-11-25 1990-06-05
JP2009116307A (en) * 2007-11-07 2009-05-28 Samsung Electro-Mechanics Co Ltd Substrate manufacturing apparatus and method therefor

Similar Documents

Publication Publication Date Title
JPS57169244A (en) Temperature controller for mask and wafer
JPS53149041A (en) Production of thermal head of thick type
JPS54149586A (en) Mask aligner
JPS5332759A (en) Precision coordinate position detection and position control unit by composite diffration grating method
JPS5396843A (en) Heater
JPS55123131A (en) Exposer for mask alignment
JPS5543844A (en) Method and apparatus for photoresist sensitizing process
JPS53108287A (en) Manufacture of semiconductor device
JPS5767166A (en) Mask supporting frame
JPS53108389A (en) Manufacture for semiconductor device
JPS5638131A (en) Contact method betweeen solid and liquid
JPS5216041A (en) Reducing process of liquid temperature and its apparatus
JPS53133A (en) Thermal fixing device
JPS54136174A (en) Automatic semiconductor thermal processor
JPS5543843A (en) Semiconductor wafer and exposure mask for process thereof
JPS5536913A (en) Semiconductor device
JPS5299065A (en) Production of semiconductor device
JPS51132642A (en) Method for controlling temperatures in an air conditioner
JPS5315768A (en) Production of semiconductor device
JPS5339890A (en) Semiconductor device for thermal recording
JPS5220007A (en) Locating method
JPS5536921A (en) Pressure sensitive element
JPS5217232A (en) High-frequency heating method
JPS5379189A (en) Temperature control device
JPS5589464A (en) Diffusion furnace temperature controller