JPS5767166A - Mask supporting frame - Google Patents

Mask supporting frame

Info

Publication number
JPS5767166A
JPS5767166A JP14061580A JP14061580A JPS5767166A JP S5767166 A JPS5767166 A JP S5767166A JP 14061580 A JP14061580 A JP 14061580A JP 14061580 A JP14061580 A JP 14061580A JP S5767166 A JPS5767166 A JP S5767166A
Authority
JP
Japan
Prior art keywords
temperature
supporting frame
substrate
mask supporting
controller
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14061580A
Other languages
Japanese (ja)
Other versions
JPS613872B2 (en
Inventor
Hitoshi Kubota
Minoru Tanaka
Susumu Aiuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP14061580A priority Critical patent/JPS5767166A/en
Publication of JPS5767166A publication Critical patent/JPS5767166A/en
Publication of JPS613872B2 publication Critical patent/JPS613872B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)

Abstract

PURPOSE:To form a high-precision thin-film pattern by controlling the temperature of the mask supporting frame, so that thermal expansion of the mask supporting frame will become equal to that of the thin-film forming substrate. CONSTITUTION:A substrate temperature setter 18 is adjusted before-hand at a temperature favorable for thin-film formation. A substrate temperature comparative controller 17 controls a substrate heating meand 5', while receiving substrate temperature signals from a substrate temperature sensor 6', and thus maintains the substrate temperature at the said favorable temperature. Signals generated by the sensor 6 is also inputted to a mask supporting frame temperatrure comparative controller 19, and at the same time signals generated by the mask supporting frame, temperature sensor 16 is also inputted to the controller 19. Since the mask supporting frame employs materials having a thermal expansion coefficient identical or almost equal to that of the substrate, the setter 20 is adjusted beforehand, so that the temperature difference indicated by sensors 16 and 6' will become 0. Then the controller 19 controls conduction of the sheath heater for the mask supporting frame according to the instructions of the controller 19 and setter 20, thereby equilizing the temperature of the supporting frame and the substrate temperature.
JP14061580A 1980-10-09 1980-10-09 Mask supporting frame Granted JPS5767166A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14061580A JPS5767166A (en) 1980-10-09 1980-10-09 Mask supporting frame

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14061580A JPS5767166A (en) 1980-10-09 1980-10-09 Mask supporting frame

Publications (2)

Publication Number Publication Date
JPS5767166A true JPS5767166A (en) 1982-04-23
JPS613872B2 JPS613872B2 (en) 1986-02-05

Family

ID=15272820

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14061580A Granted JPS5767166A (en) 1980-10-09 1980-10-09 Mask supporting frame

Country Status (1)

Country Link
JP (1) JPS5767166A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001323364A (en) * 2000-05-15 2001-11-22 Canon Inc System and method for vacuum deposition with masking
KR100497088B1 (en) * 2001-08-31 2005-06-23 산요덴키가부시키가이샤 Method of fabricating electro-luminescence display panel and deposition mask
JP2007065439A (en) * 2005-09-01 2007-03-15 Seiko Epson Corp Manufacturing device for electrooptical device, manufacturing method for electrooptical device, electrooptical device, and mask member for electrooptical device
JP2008024956A (en) * 2006-07-18 2008-02-07 Ulvac Japan Ltd Alignment device and alignment method
JP2011046971A (en) * 2009-08-25 2011-03-10 Canon Anelva Corp Mask positioning mechanism, mask positioning method, and vacuum processing apparatus
JP2014088626A (en) * 2013-12-25 2014-05-15 Semiconductor Energy Lab Co Ltd Deposition mask, and deposition method using the deposition mask
JP2019104952A (en) * 2017-12-11 2019-06-27 株式会社アルバック Vapor evaporation device

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001323364A (en) * 2000-05-15 2001-11-22 Canon Inc System and method for vacuum deposition with masking
KR100497088B1 (en) * 2001-08-31 2005-06-23 산요덴키가부시키가이샤 Method of fabricating electro-luminescence display panel and deposition mask
JP2007065439A (en) * 2005-09-01 2007-03-15 Seiko Epson Corp Manufacturing device for electrooptical device, manufacturing method for electrooptical device, electrooptical device, and mask member for electrooptical device
JP2008024956A (en) * 2006-07-18 2008-02-07 Ulvac Japan Ltd Alignment device and alignment method
JP2011046971A (en) * 2009-08-25 2011-03-10 Canon Anelva Corp Mask positioning mechanism, mask positioning method, and vacuum processing apparatus
JP2014088626A (en) * 2013-12-25 2014-05-15 Semiconductor Energy Lab Co Ltd Deposition mask, and deposition method using the deposition mask
JP2019104952A (en) * 2017-12-11 2019-06-27 株式会社アルバック Vapor evaporation device
TWI718446B (en) * 2017-12-11 2021-02-11 日商愛發科股份有限公司 Vapor deposition apparatus

Also Published As

Publication number Publication date
JPS613872B2 (en) 1986-02-05

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