JPS5494882A - X-ray exposure apparatus - Google Patents

X-ray exposure apparatus

Info

Publication number
JPS5494882A
JPS5494882A JP151378A JP151378A JPS5494882A JP S5494882 A JPS5494882 A JP S5494882A JP 151378 A JP151378 A JP 151378A JP 151378 A JP151378 A JP 151378A JP S5494882 A JPS5494882 A JP S5494882A
Authority
JP
Japan
Prior art keywords
alignment controller
wafers
mask
stage
high accuracy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP151378A
Other languages
Japanese (ja)
Other versions
JPS5950216B2 (en
Inventor
Masao Sadamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP53001513A priority Critical patent/JPS5950216B2/en
Publication of JPS5494882A publication Critical patent/JPS5494882A/en
Publication of JPS5950216B2 publication Critical patent/JPS5950216B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To enable high accuracy and processing ability to be obtained by simultaneously exposing plural sheets of wafers with one set of X-ray light source, mark detector and alignment controller.
CONSTITUTION: A turntable 31 rotates about its shaft 32 and its X.Y.θ stages 33 which have masks are disposed 4 or more on the concentrical circle, facing an X- ray source 35 positioned on the extension line of the center shaft 32 of the table 31. An alignment controller 37, fixed to the outside of the table 31, opposes to one set of the stage 33 and mask 34. The table 31 is rotated at a specified angle in the direction of the arrow 41 to a position 42 so that the mask 34 is opposed to the mark detecting position 36 and the stage 33 to the alignment controller. These enable plural sheets of wafers to be exposed simultaneously and high accuracy and processing ability to be obtained.
COPYRIGHT: (C)1979,JPO&Japio
JP53001513A 1978-01-12 1978-01-12 X-ray exposure device Expired JPS5950216B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP53001513A JPS5950216B2 (en) 1978-01-12 1978-01-12 X-ray exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP53001513A JPS5950216B2 (en) 1978-01-12 1978-01-12 X-ray exposure device

Publications (2)

Publication Number Publication Date
JPS5494882A true JPS5494882A (en) 1979-07-26
JPS5950216B2 JPS5950216B2 (en) 1984-12-07

Family

ID=11503554

Family Applications (1)

Application Number Title Priority Date Filing Date
JP53001513A Expired JPS5950216B2 (en) 1978-01-12 1978-01-12 X-ray exposure device

Country Status (1)

Country Link
JP (1) JPS5950216B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5767927A (en) * 1980-10-15 1982-04-24 Nec Corp X-ray exposure device
JPS5940533A (en) * 1982-08-30 1984-03-06 ザ・パ−キン−エルマ−・コ−ポレイシヨン X-ray lithographic method and system for executing same method
JPH07209876A (en) * 1995-01-30 1995-08-11 Canon Inc X-ray transfer device and method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5767927A (en) * 1980-10-15 1982-04-24 Nec Corp X-ray exposure device
JPS5940533A (en) * 1982-08-30 1984-03-06 ザ・パ−キン−エルマ−・コ−ポレイシヨン X-ray lithographic method and system for executing same method
JPH07209876A (en) * 1995-01-30 1995-08-11 Canon Inc X-ray transfer device and method

Also Published As

Publication number Publication date
JPS5950216B2 (en) 1984-12-07

Similar Documents

Publication Publication Date Title
JPS57106031A (en) Transferring device for fine pattern
JPS5332759A (en) Precision coordinate position detection and position control unit by composite diffration grating method
JPS5517119A (en) Variable magnifying power copying apparatus
JPS5494882A (en) X-ray exposure apparatus
JPS56111218A (en) Projection and exposuring device
JPS5227372A (en) Photo mask processing system and its device
JPS559588A (en) Enlarging method of photograph and enlarging device
JPS51124920A (en) Method for preparing photographic light sensitive materials
JPS53105381A (en) X-ray copying mask
JPS5491183A (en) Production of semiconductor device
JPS5222882A (en) Vacuum tight printing unit
JPS551107A (en) Exposure device
JPS5240072A (en) Atmosphere gas substitution method at exposure of photoresist
JPS52143773A (en) Reduction projecting and printing apparatus
JPS569742A (en) Developing method of photosensitive resin
JPS5347825A (en) Photoresist exposure
JPS5742129A (en) Detector for position of mark in electron ray exposure
JPS5279877A (en) Mask inspection device
JPS5255867A (en) Exposure method
JPS5359372A (en) Mask alignment
JPS5429976A (en) Manufacture of semiconductor device
JPS5616126A (en) Exposing method
JPS57153432A (en) Reducing projecting exposing device
JPS5534481A (en) Detector for no-good mark of semiconductor pellet
JPS51115789A (en) Sheet film tipe x-ray photo apparatus