JPS5742129A - Detector for position of mark in electron ray exposure - Google Patents

Detector for position of mark in electron ray exposure

Info

Publication number
JPS5742129A
JPS5742129A JP11821180A JP11821180A JPS5742129A JP S5742129 A JPS5742129 A JP S5742129A JP 11821180 A JP11821180 A JP 11821180A JP 11821180 A JP11821180 A JP 11821180A JP S5742129 A JPS5742129 A JP S5742129A
Authority
JP
Japan
Prior art keywords
signal
output
mark
detector
computer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11821180A
Other languages
Japanese (ja)
Inventor
Eitaro Enokido
Takao Namae
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP11821180A priority Critical patent/JPS5742129A/en
Publication of JPS5742129A publication Critical patent/JPS5742129A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Measurement Of Radiation (AREA)

Abstract

PURPOSE:To obtain the central positions of the marks by selecting the output of circuits each processing a signal approximating to the mark that the unevenness of a surface to be exposed generates and a signal approximating to the mark generated at a boundary with the quality of material different from the circumference by the output of an electronic detector. CONSTITUTION:A sample is extracted 23 through an HPF 9a by an output signal of the detector 7a, the extracted signal is A/D-converted 24, a waveform is analyzed by means of a computer 2, and the signal is selected 22. When a supply signal to the computer has positive and negative peaks, the difference of the absolute values is smaller than a fixed value and there is a value close to zero in the vicinity of the middle point of the signal, the output of a substracter 10 is passed. When the supply signal has only the positive peak, the difference of the absolute values of the positive and negative peaks is larger than the fixed value and there is no value close to zero in the vicinity of the middle point of the signal, output 18 which adds 19, clips 20 and differentiates 21 the output of HPFs 9a, 9b is passed, the waveform is converted 14, pulse output is given to the computer 2 and the central position of the marks can be computed without errors.
JP11821180A 1980-08-27 1980-08-27 Detector for position of mark in electron ray exposure Pending JPS5742129A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11821180A JPS5742129A (en) 1980-08-27 1980-08-27 Detector for position of mark in electron ray exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11821180A JPS5742129A (en) 1980-08-27 1980-08-27 Detector for position of mark in electron ray exposure

Publications (1)

Publication Number Publication Date
JPS5742129A true JPS5742129A (en) 1982-03-09

Family

ID=14730952

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11821180A Pending JPS5742129A (en) 1980-08-27 1980-08-27 Detector for position of mark in electron ray exposure

Country Status (1)

Country Link
JP (1) JPS5742129A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60249008A (en) * 1984-05-25 1985-12-09 Hitachi Ltd Charged particle microprobe instrument
JPS62109446U (en) * 1985-12-27 1987-07-13
US5243941A (en) * 1991-07-29 1993-09-14 Asmo Co., Ltd. Actuator for engine idling control mechanism
JP2008268132A (en) * 2007-04-24 2008-11-06 Seiko Precision Inc Reference scale, manufacturing method thereof, and machining device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60249008A (en) * 1984-05-25 1985-12-09 Hitachi Ltd Charged particle microprobe instrument
JPS62109446U (en) * 1985-12-27 1987-07-13
US5243941A (en) * 1991-07-29 1993-09-14 Asmo Co., Ltd. Actuator for engine idling control mechanism
JP2008268132A (en) * 2007-04-24 2008-11-06 Seiko Precision Inc Reference scale, manufacturing method thereof, and machining device
JP4671988B2 (en) * 2007-04-24 2011-04-20 セイコープレシジョン株式会社 Reference scale, manufacturing method thereof, and processing apparatus

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