JPS57176777A - Semiconductor device and manufacture thereof - Google Patents

Semiconductor device and manufacture thereof

Info

Publication number
JPS57176777A
JPS57176777A JP6209881A JP6209881A JPS57176777A JP S57176777 A JPS57176777 A JP S57176777A JP 6209881 A JP6209881 A JP 6209881A JP 6209881 A JP6209881 A JP 6209881A JP S57176777 A JPS57176777 A JP S57176777A
Authority
JP
Japan
Prior art keywords
gate electrode
electrode
semiconductor material
mesfet
high frequency
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6209881A
Other languages
Japanese (ja)
Other versions
JPS6410953B2 (en
Inventor
Toshiki Ehata
Kenichi Kikuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP6209881A priority Critical patent/JPS57176777A/en
Publication of JPS57176777A publication Critical patent/JPS57176777A/en
Publication of JPS6410953B2 publication Critical patent/JPS6410953B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/80Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Junction Field-Effect Transistors (AREA)

Abstract

PURPOSE:To improve high frequency characteristics in an MESFET wherein the gate electrode on the semiconductor material layer on a substrate and both sides of the gate electrode have an insulating compound film for themselves and two ohmic electrodes are provided. CONSTITUTION:A gate electrode 5 is directly provided on the semiconductor material operation layer 2 on a substrate 1. The metallic compound film 5' for the gate electrode is provided on the gate electrode 5. A source electrode 3 and a drain electrode 4 are provided on the semiconductor material operation layer 2. Thus the MESFET is obtained. In this structure, the distance between the source electrode and the gate electrode, the distance between the drain electrode and the gate electrode, and the width of the gate electrode are minutely controlled in the submicron range. Thus the excellent high frequency characteristics can be obtained.
JP6209881A 1981-04-23 1981-04-23 Semiconductor device and manufacture thereof Granted JPS57176777A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6209881A JPS57176777A (en) 1981-04-23 1981-04-23 Semiconductor device and manufacture thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6209881A JPS57176777A (en) 1981-04-23 1981-04-23 Semiconductor device and manufacture thereof

Publications (2)

Publication Number Publication Date
JPS57176777A true JPS57176777A (en) 1982-10-30
JPS6410953B2 JPS6410953B2 (en) 1989-02-22

Family

ID=13190228

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6209881A Granted JPS57176777A (en) 1981-04-23 1981-04-23 Semiconductor device and manufacture thereof

Country Status (1)

Country Link
JP (1) JPS57176777A (en)

Also Published As

Publication number Publication date
JPS6410953B2 (en) 1989-02-22

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