JPS57162460A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS57162460A
JPS57162460A JP56047471A JP4747181A JPS57162460A JP S57162460 A JPS57162460 A JP S57162460A JP 56047471 A JP56047471 A JP 56047471A JP 4747181 A JP4747181 A JP 4747181A JP S57162460 A JPS57162460 A JP S57162460A
Authority
JP
Japan
Prior art keywords
region
film
layer
type
emitter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56047471A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0420256B2 (enrdf_load_stackoverflow
Inventor
Katsuyuki Inayoshi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP56047471A priority Critical patent/JPS57162460A/ja
Publication of JPS57162460A publication Critical patent/JPS57162460A/ja
Publication of JPH0420256B2 publication Critical patent/JPH0420256B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D48/00Individual devices not covered by groups H10D1/00 - H10D44/00
    • H10D48/30Devices controlled by electric currents or voltages
    • H10D48/32Devices controlled by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H10D48/34Bipolar devices
    • H10D48/345Bipolar transistors having ohmic electrodes on emitter-like, base-like, and collector-like regions

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Bipolar Transistors (AREA)
JP56047471A 1981-03-31 1981-03-31 Manufacture of semiconductor device Granted JPS57162460A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56047471A JPS57162460A (en) 1981-03-31 1981-03-31 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56047471A JPS57162460A (en) 1981-03-31 1981-03-31 Manufacture of semiconductor device

Publications (2)

Publication Number Publication Date
JPS57162460A true JPS57162460A (en) 1982-10-06
JPH0420256B2 JPH0420256B2 (enrdf_load_stackoverflow) 1992-04-02

Family

ID=12776052

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56047471A Granted JPS57162460A (en) 1981-03-31 1981-03-31 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS57162460A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS609163A (ja) * 1983-06-29 1985-01-18 Fujitsu Ltd 半導体装置の製造方法
JPS60119775A (ja) * 1983-12-02 1985-06-27 Hitachi Ltd 半導体装置の製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52117554A (en) * 1976-03-30 1977-10-03 Toshiba Corp Manufacturing method of semiconductor device
JPS54144176A (en) * 1978-05-01 1979-11-10 Ibm Method of forming semiconductor junction
JPS564268A (en) * 1979-06-22 1981-01-17 Ibm Method of forming semiconductor device
JPS56146274A (en) * 1980-03-24 1981-11-13 Ibm Method of manufacturing bipolar transistor

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52117554A (en) * 1976-03-30 1977-10-03 Toshiba Corp Manufacturing method of semiconductor device
JPS54144176A (en) * 1978-05-01 1979-11-10 Ibm Method of forming semiconductor junction
JPS564268A (en) * 1979-06-22 1981-01-17 Ibm Method of forming semiconductor device
JPS56146274A (en) * 1980-03-24 1981-11-13 Ibm Method of manufacturing bipolar transistor

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS609163A (ja) * 1983-06-29 1985-01-18 Fujitsu Ltd 半導体装置の製造方法
JPS60119775A (ja) * 1983-12-02 1985-06-27 Hitachi Ltd 半導体装置の製造方法

Also Published As

Publication number Publication date
JPH0420256B2 (enrdf_load_stackoverflow) 1992-04-02

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