JPS5715514A - Manufacture for reed screen electrode for elastic surface wave - Google Patents
Manufacture for reed screen electrode for elastic surface waveInfo
- Publication number
- JPS5715514A JPS5715514A JP8981280A JP8981280A JPS5715514A JP S5715514 A JPS5715514 A JP S5715514A JP 8981280 A JP8981280 A JP 8981280A JP 8981280 A JP8981280 A JP 8981280A JP S5715514 A JPS5715514 A JP S5715514A
- Authority
- JP
- Japan
- Prior art keywords
- film
- substrate
- manufacture
- electrode
- screen electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8981280A JPS5715514A (en) | 1980-07-01 | 1980-07-01 | Manufacture for reed screen electrode for elastic surface wave |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8981280A JPS5715514A (en) | 1980-07-01 | 1980-07-01 | Manufacture for reed screen electrode for elastic surface wave |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5715514A true JPS5715514A (en) | 1982-01-26 |
JPH0154883B2 JPH0154883B2 (ja) | 1989-11-21 |
Family
ID=13981136
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8981280A Granted JPS5715514A (en) | 1980-07-01 | 1980-07-01 | Manufacture for reed screen electrode for elastic surface wave |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5715514A (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61502930A (ja) * | 1984-08-01 | 1986-12-11 | エイ・ティ・アンド・ティ・コーポレーション | 改良された表面音波フィルタ |
JPH02149114A (ja) * | 1988-11-30 | 1990-06-07 | Nippon Dempa Kogyo Co Ltd | 弾性表面波装置 |
JPH02288609A (ja) * | 1989-04-28 | 1990-11-28 | Murata Mfg Co Ltd | 表面波装置 |
WO1996004713A1 (fr) * | 1994-08-05 | 1996-02-15 | Japan Energy Corporation | Dispositif a ondes acoustiques de surface et procede de production |
JPH08204483A (ja) * | 1995-01-27 | 1996-08-09 | Nec Corp | 弾性表面波装置の製造方法、および、これを用いて製造された弾性表面波装置 |
-
1980
- 1980-07-01 JP JP8981280A patent/JPS5715514A/ja active Granted
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61502930A (ja) * | 1984-08-01 | 1986-12-11 | エイ・ティ・アンド・ティ・コーポレーション | 改良された表面音波フィルタ |
JPH02149114A (ja) * | 1988-11-30 | 1990-06-07 | Nippon Dempa Kogyo Co Ltd | 弾性表面波装置 |
JPH02288609A (ja) * | 1989-04-28 | 1990-11-28 | Murata Mfg Co Ltd | 表面波装置 |
WO1996004713A1 (fr) * | 1994-08-05 | 1996-02-15 | Japan Energy Corporation | Dispositif a ondes acoustiques de surface et procede de production |
US5923231A (en) * | 1994-08-05 | 1999-07-13 | Kinseki Limited | Surface acoustic wave device with an electrode insulating film and method for fabricating the same |
JPH08204483A (ja) * | 1995-01-27 | 1996-08-09 | Nec Corp | 弾性表面波装置の製造方法、および、これを用いて製造された弾性表面波装置 |
Also Published As
Publication number | Publication date |
---|---|
JPH0154883B2 (ja) | 1989-11-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0020776A4 (en) | METHOD OF FORMING PATTERNS. | |
JPS5715514A (en) | Manufacture for reed screen electrode for elastic surface wave | |
JPS5619030A (en) | Production of liquid crystal display element | |
JPS5432143A (en) | Etching process | |
JPS52119172A (en) | Forming method of fine pattern | |
JPS57155539A (en) | Mask | |
JPS5727029A (en) | Formation of mo pattern | |
JPS56115534A (en) | Formation of pattern | |
JPS56140345A (en) | Formation of pattern | |
JPS5799738A (en) | Charged beam exposure method | |
JPS55144246A (en) | Preparation of photomask | |
JPS56101745A (en) | Formation of microminiature electrode | |
JPS55144247A (en) | Preparation of photomask | |
JPS563679A (en) | Formation of metallic pattern | |
JPS5533035A (en) | Forming of resist pattern shaped like inverted truncated pyramid | |
JPS55158635A (en) | Mask | |
JPS5452473A (en) | Forming method for coating for fine pattern | |
JPS56158334A (en) | Manufacture of hard mask | |
JPS57208143A (en) | Method for forming fine pattern | |
JPS5711344A (en) | Dry developing method | |
JPS5516459A (en) | Taper etching method | |
JPS5612736A (en) | Formation of fine chromium pattern | |
JPS57185713A (en) | Manufacture for surface acoustic wave reed screen shaped converter | |
JPS5496371A (en) | Mask forming method | |
JPS57154833A (en) | Etching method by reactive ion |