JPS57118645A - Liquid processing equipment for semiconductor - Google Patents

Liquid processing equipment for semiconductor

Info

Publication number
JPS57118645A
JPS57118645A JP569881A JP569881A JPS57118645A JP S57118645 A JPS57118645 A JP S57118645A JP 569881 A JP569881 A JP 569881A JP 569881 A JP569881 A JP 569881A JP S57118645 A JPS57118645 A JP S57118645A
Authority
JP
Japan
Prior art keywords
etching
wafers
observed
windows
condition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP569881A
Other languages
Japanese (ja)
Inventor
Noriyoshi Takase
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP569881A priority Critical patent/JPS57118645A/en
Publication of JPS57118645A publication Critical patent/JPS57118645A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching

Abstract

PURPOSE:To prevent etching solution from remaining like drops of water and observe the etching condition accurately by a method wherein tge observation windows through which the processing condition is observed are attached aslant to an etching equipment of wafers. CONSTITUTION:The films on wafers 8 transferred into the etching region are etched by etching solution sprayed from nozzles 12. The etching condition is observed through slanted observation windows. As the windows are slanted, even if some of the etching solution sprayed from the nozzles scatters and wets the windows, the solution does not remain on the observation windows and drops downward, so that the processing condition of the wafers can be observed clearly. With this constitution, the processing condition of the films on the wafers can be observed accurately.
JP569881A 1981-01-16 1981-01-16 Liquid processing equipment for semiconductor Pending JPS57118645A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP569881A JPS57118645A (en) 1981-01-16 1981-01-16 Liquid processing equipment for semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP569881A JPS57118645A (en) 1981-01-16 1981-01-16 Liquid processing equipment for semiconductor

Publications (1)

Publication Number Publication Date
JPS57118645A true JPS57118645A (en) 1982-07-23

Family

ID=11618316

Family Applications (1)

Application Number Title Priority Date Filing Date
JP569881A Pending JPS57118645A (en) 1981-01-16 1981-01-16 Liquid processing equipment for semiconductor

Country Status (1)

Country Link
JP (1) JPS57118645A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6090834U (en) * 1983-11-28 1985-06-21 シグマ技術工業株式会社 Processing tank

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6090834U (en) * 1983-11-28 1985-06-21 シグマ技術工業株式会社 Processing tank

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