JPS5414678A - Processing method for surface of semiconductor device - Google Patents

Processing method for surface of semiconductor device

Info

Publication number
JPS5414678A
JPS5414678A JP7987877A JP7987877A JPS5414678A JP S5414678 A JPS5414678 A JP S5414678A JP 7987877 A JP7987877 A JP 7987877A JP 7987877 A JP7987877 A JP 7987877A JP S5414678 A JPS5414678 A JP S5414678A
Authority
JP
Japan
Prior art keywords
semiconductor device
processing method
dipping
substrate
minites
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7987877A
Other languages
Japanese (ja)
Inventor
Koichi Nagasawa
Norio Anzai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP7987877A priority Critical patent/JPS5414678A/en
Publication of JPS5414678A publication Critical patent/JPS5414678A/en
Pending legal-status Critical Current

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  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE: To prevent the contamination after the process by removing a corrosion-resisting resin film for a mask provided onto a semiconductor substrate while dipping the substrate into chemicals such as sulfuric acid after dipping it in water of 60 to 100°C for 15 to 25 minites to obtain the hydrophilic resin surface.
COPYRIGHT: (C)1979,JPO&Japio
JP7987877A 1977-07-06 1977-07-06 Processing method for surface of semiconductor device Pending JPS5414678A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7987877A JPS5414678A (en) 1977-07-06 1977-07-06 Processing method for surface of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7987877A JPS5414678A (en) 1977-07-06 1977-07-06 Processing method for surface of semiconductor device

Publications (1)

Publication Number Publication Date
JPS5414678A true JPS5414678A (en) 1979-02-03

Family

ID=13702479

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7987877A Pending JPS5414678A (en) 1977-07-06 1977-07-06 Processing method for surface of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5414678A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5006415A (en) * 1987-01-16 1991-04-09 Kyowa Gas Chemical Industry Co., Ltd. Molded article of methacrylic resin

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5006415A (en) * 1987-01-16 1991-04-09 Kyowa Gas Chemical Industry Co., Ltd. Molded article of methacrylic resin

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