JPS56152970A - Etching device - Google Patents

Etching device

Info

Publication number
JPS56152970A
JPS56152970A JP5429780A JP5429780A JPS56152970A JP S56152970 A JPS56152970 A JP S56152970A JP 5429780 A JP5429780 A JP 5429780A JP 5429780 A JP5429780 A JP 5429780A JP S56152970 A JPS56152970 A JP S56152970A
Authority
JP
Japan
Prior art keywords
tank
liquid
etching
etchant
jig
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5429780A
Other languages
Japanese (ja)
Other versions
JPS587709B2 (en
Inventor
Koichi Kushibiki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP5429780A priority Critical patent/JPS587709B2/en
Publication of JPS56152970A publication Critical patent/JPS56152970A/en
Publication of JPS587709B2 publication Critical patent/JPS587709B2/en
Expired legal-status Critical Current

Links

Abstract

PURPOSE: To obain an etching device which maintains a uniform etching rate irrespectively of time and by which desired working shapes are obained with high accuracy by so constituting the device that etchant is circulated and objects are oscillated under controlled temperature.
CONSTITUTION: Etchant 12 is controlled to a desired temp. in a temp. control tank 15, and this liquid 12 is sent by a pump 18 into an etching tank 11 through a liquid feed pipe 19. The liquid 12 overflowed from the tank 11 is returned through a reflux pipe 17 into the tank 15. Namely, the liquid 12 is circulated between the tank 15 and the tank 11. In such a state, a jig 20 housing semiconductor substrates 21 is fixed to a driving part 22, and is immersed in the liquid 12 in the tank 11. Further, the jig 20 and the substrates 21 are oscillated in the liquid 12 by the driving part 22, whereby the substrate 21 is etched.
COPYRIGHT: (C)1981,JPO&Japio
JP5429780A 1980-04-25 1980-04-25 Etching device Expired JPS587709B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5429780A JPS587709B2 (en) 1980-04-25 1980-04-25 Etching device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5429780A JPS587709B2 (en) 1980-04-25 1980-04-25 Etching device

Publications (2)

Publication Number Publication Date
JPS56152970A true JPS56152970A (en) 1981-11-26
JPS587709B2 JPS587709B2 (en) 1983-02-10

Family

ID=12966628

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5429780A Expired JPS587709B2 (en) 1980-04-25 1980-04-25 Etching device

Country Status (1)

Country Link
JP (1) JPS587709B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5996735A (en) * 1982-11-26 1984-06-04 Nippon Telegr & Teleph Corp <Ntt> Wet etching device and wet etching vessel thereof
JPS62258735A (en) * 1986-05-01 1987-11-11 Nec Kyushu Ltd Apparatus for recirculating chemical liquid
EP0453520A1 (en) * 1989-11-13 1991-10-30 Allan Berman Quartz integrated trough/sump recirculating filtered high-purity chemical bath.

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5996735A (en) * 1982-11-26 1984-06-04 Nippon Telegr & Teleph Corp <Ntt> Wet etching device and wet etching vessel thereof
JPH0413850B2 (en) * 1982-11-26 1992-03-11 Nippon Telegraph & Telephone
JPS62258735A (en) * 1986-05-01 1987-11-11 Nec Kyushu Ltd Apparatus for recirculating chemical liquid
EP0453520A1 (en) * 1989-11-13 1991-10-30 Allan Berman Quartz integrated trough/sump recirculating filtered high-purity chemical bath.

Also Published As

Publication number Publication date
JPS587709B2 (en) 1983-02-10

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