JPS56152970A - Etching device - Google Patents
Etching deviceInfo
- Publication number
- JPS56152970A JPS56152970A JP5429780A JP5429780A JPS56152970A JP S56152970 A JPS56152970 A JP S56152970A JP 5429780 A JP5429780 A JP 5429780A JP 5429780 A JP5429780 A JP 5429780A JP S56152970 A JPS56152970 A JP S56152970A
- Authority
- JP
- Japan
- Prior art keywords
- tank
- liquid
- etching
- etchant
- jig
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To obain an etching device which maintains a uniform etching rate irrespectively of time and by which desired working shapes are obained with high accuracy by so constituting the device that etchant is circulated and objects are oscillated under controlled temperature.
CONSTITUTION: Etchant 12 is controlled to a desired temp. in a temp. control tank 15, and this liquid 12 is sent by a pump 18 into an etching tank 11 through a liquid feed pipe 19. The liquid 12 overflowed from the tank 11 is returned through a reflux pipe 17 into the tank 15. Namely, the liquid 12 is circulated between the tank 15 and the tank 11. In such a state, a jig 20 housing semiconductor substrates 21 is fixed to a driving part 22, and is immersed in the liquid 12 in the tank 11. Further, the jig 20 and the substrates 21 are oscillated in the liquid 12 by the driving part 22, whereby the substrate 21 is etched.
COPYRIGHT: (C)1981,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5429780A JPS587709B2 (en) | 1980-04-25 | 1980-04-25 | Etching device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5429780A JPS587709B2 (en) | 1980-04-25 | 1980-04-25 | Etching device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56152970A true JPS56152970A (en) | 1981-11-26 |
JPS587709B2 JPS587709B2 (en) | 1983-02-10 |
Family
ID=12966628
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5429780A Expired JPS587709B2 (en) | 1980-04-25 | 1980-04-25 | Etching device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS587709B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5996735A (en) * | 1982-11-26 | 1984-06-04 | Nippon Telegr & Teleph Corp <Ntt> | Wet etching device and wet etching vessel thereof |
JPS62258735A (en) * | 1986-05-01 | 1987-11-11 | Nec Kyushu Ltd | Apparatus for recirculating chemical liquid |
EP0453520A1 (en) * | 1989-11-13 | 1991-10-30 | Allan Berman | Quartz integrated trough/sump recirculating filtered high-purity chemical bath. |
-
1980
- 1980-04-25 JP JP5429780A patent/JPS587709B2/en not_active Expired
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5996735A (en) * | 1982-11-26 | 1984-06-04 | Nippon Telegr & Teleph Corp <Ntt> | Wet etching device and wet etching vessel thereof |
JPH0413850B2 (en) * | 1982-11-26 | 1992-03-11 | Nippon Telegraph & Telephone | |
JPS62258735A (en) * | 1986-05-01 | 1987-11-11 | Nec Kyushu Ltd | Apparatus for recirculating chemical liquid |
EP0453520A1 (en) * | 1989-11-13 | 1991-10-30 | Allan Berman | Quartz integrated trough/sump recirculating filtered high-purity chemical bath. |
Also Published As
Publication number | Publication date |
---|---|
JPS587709B2 (en) | 1983-02-10 |
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