JPS5443469A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS5443469A JPS5443469A JP10884377A JP10884377A JPS5443469A JP S5443469 A JPS5443469 A JP S5443469A JP 10884377 A JP10884377 A JP 10884377A JP 10884377 A JP10884377 A JP 10884377A JP S5443469 A JPS5443469 A JP S5443469A
- Authority
- JP
- Japan
- Prior art keywords
- inorganic ion
- methanol
- corrosion
- semiconductor device
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Abstract
PURPOSE: To prevent the corrosion of the element wiring and electrode by removing completely the contamination due to the oil or the inorganic ion before sealing, and also to avoid the lowering of the characteristics caused by the inorganic ion.
CONSTITUTION: The semiconductor device assembled on the lead frame is cleansed in the Freon vapor bath to remove chiefly the floating matters in the air or the oil strains caused by the worker's hand. Then the inorganic ion contamination is removed through the spray washing with pure water. Immediately the device is soacked into methanol, and then methanol is removed by the Freon vapor. Then the device is sealed with the resin. Thus, the corrosion of the electrode and the wiring can be avoided with no deterioration of the characteristics.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10884377A JPS5443469A (en) | 1977-09-12 | 1977-09-12 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10884377A JPS5443469A (en) | 1977-09-12 | 1977-09-12 | Manufacture of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5443469A true JPS5443469A (en) | 1979-04-06 |
Family
ID=14494975
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10884377A Pending JPS5443469A (en) | 1977-09-12 | 1977-09-12 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5443469A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5726103A (en) * | 1980-07-23 | 1982-02-12 | Seiko Epson Corp | Magnetic powder with lubricating layer |
JPS5856340A (en) * | 1981-09-30 | 1983-04-04 | Toshiba Corp | Purification of semiconductor wafer |
JPS58113301A (en) * | 1981-12-28 | 1983-07-06 | Shinku Yakin Kk | Slow oxidizing device for ultrafine metallic particles |
JPH05160097A (en) * | 1991-12-06 | 1993-06-25 | Mitsubishi Electric Corp | Cleaning method of substrate |
-
1977
- 1977-09-12 JP JP10884377A patent/JPS5443469A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5726103A (en) * | 1980-07-23 | 1982-02-12 | Seiko Epson Corp | Magnetic powder with lubricating layer |
JPS5856340A (en) * | 1981-09-30 | 1983-04-04 | Toshiba Corp | Purification of semiconductor wafer |
JPS58113301A (en) * | 1981-12-28 | 1983-07-06 | Shinku Yakin Kk | Slow oxidizing device for ultrafine metallic particles |
JPH05160097A (en) * | 1991-12-06 | 1993-06-25 | Mitsubishi Electric Corp | Cleaning method of substrate |
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